A laser system for generating secondary radiation through interaction of a focused primary laser beam with a target material includes a laser beam source for providing a raw laser beam, and a beam guidance device for forming the focused primary laser beam from the raw laser beam. The focused primary laser beam is directed towards a target region in order to interact with the target material arranged in the target region. The beam guidance device includes a beam focusing device configured to form the primary laser beam by focusing a laser beam entering the beam focusing device, which corresponds to the raw laser beam. The beam focusing device includes at least two mirror elements spaced apart from one another. The beam focusing device has a numerical aperture between 0.001 and 0.01 provided that the primary laser beam propagates in a medium with a refractive index of less than 1.01.

An amplified laser device is provided with one or more Micro-Electro-Mechanical System (MEMS) Micro-Mirror Arrays (MMAs) having tip, tilt and piston capability positioned on either side of the optical amplifier to correct the profile of the beam to improve the gain performance of the optical amplifier or to compensate for atmospheric distortion while steering the amplified beam over a FOR. The MEMS MMAs may be positioned in front of, behind or on both sides of the amplifier. The MEMS MMAs can be configured to optimize the combined amplifier performance, static and time varying, and compensation for atmospheric distortion together or separately.

An apparatus for focusing a beam of a high-power laser includes an optical configuration of two or more curved plasma mirrors configured to focus the beam of the high-power laser. When the optical configuration is arranged with respect to a main axis of the beam of the high-power laser, a first curved plasma mirror of the two or more curved plasma mirrors is arranged on the main axis of the beam of the high-power laser, and a second curved plasma mirror of the two or more curved plasma mirrors is arranged off-axis with respect to the main axis of the beam of the high-power laser, wherein the first curved plasma mirror is configured to reflect the beam of the high-power laser in the direction of the second curved plasma mirror of the two or more curved plasma mirrors.

Electrical energy generation system with an assembly comprising: a light concentrating funnel; a multilayer photovoltaic cell; a thermos-electric layer: and a thermal stabilization device, wherein each layer of the multilayer photovoltaic cell contains: 5 semiconductor nanoparticles complexed with perovskite, an electrolyte, and a catalyst. The system assembly is arranged so as light can enter at a range of incidence angles at the light concentrating funnel, is directed and concentrated, then exits the light concentrating funnel and irradiates the multilayer photovoltaic cell where a voltage is generated, and the residual heat from these processes is stabilized with a thermal stabilization device.

The illumination optical device comprises a collimator, a light source, and an aperture. The collimator comprises a primary mirror, a secondary mirror, a tertiary mirror and a quaternary mirror mutually tilted so as to form a collimator optical path extending between the light source and the aperture and formed, in succession, by the light source, the quaternary mirror, the tertiary mirror, the secondary mirror, the primary mirror and the aperture. The light source is configured to emit light rays, along respective directions, which form a main beam propagating along directions intercepting the quaternary mirror so as to follow the collimator optical path; and a secondary beam propagating along directions not intercepting the quaternary mirror. The illumination optical device is characterised in that the collimator comprises a shielding structure configured to prevent illumination of the aperture by the secondary light beam.