An interference lens and a projection ambient lamp are provided. The interference lens includes: an interference sheet with a first surface and a second surface opposite to the first surface, the first surface being a rough surface; and a reflective film provided at the interference sheet; wherein light is reflected by the reflective film to form an interference pattern. The projection ambient lamp includes the foregoing interference lens, a light source and a focusing lens; light emitted from the light source passes through the interference lens and is reflected by the reflective film to form an interference pattern, which is focused by the focusing lens and projected on a medium. The present disclosure realizes simplification of the structure by providing a reflective film at the interference lens, hence utilization of light energy is higher, power consumption is lower, manufacturing cost is lower, and projection effect is better.

A multispectral harmonisation device intended to align the optical channels of an optronic system that includes at least two directional optical sources emitting respective optical beams of various wavelengths belonging to various spectral bands and comprises a parabolic mirror and means for positioning and orienting each of the optical sources so that each of the optical beams emitted by the optical sources passes through the optical focus of the parabolic mirror before being reflected by said parabolic mirror so that all the optical beams form, by reflection on the parabolic mirror, a multispectral collimated beam.

Provided is a simulator device allowing simplification and cost minimization. A simulator device that generates and emits, to a LiDAR shining a laser light at a plurality of scanning locations, a false light corresponding to said laser light, and comprises: a light focusing unit that focuses the laser light shined at the plurality of scanning locations; and a simulator that, in accordance with the laser light focused by the light focusing unit, generates the false light resembling scattered light that is produced in a prescribed location, and emits the false light to the LiDAR via the light focusing unit.

An observation apparatus includes a case having a transmissive window, an image sensor, an optical system, and a light source housed in the case, and an optical deflection unit. The optical system is configured to condense light incident inside the case to form an image of a sample inside a container. The light source is configured to emit light to the outside of the case without passing through the optical system. The optical deflection unit is configured to deflect light emitted to the outside of the case from the light source to a first direction proceeding toward the transmissive window. An angle of exit between the first direction and an optical axis of the optical system is different from an angle of incidence between a second direction in which light emitted to the outside of the case is incident on the optical deflection unit, and the optical axis.

A light emitting device is provided with a first light emitter and a second light emitter. The first light emitter is provided with a first lens for making the light of the first light source wide-angle, and the second light emitter is provided with a second lens for making the light of the second light source wide-angle. A plurality of first small lenses are arranged on a first incident plane of the first lens. The first small lens has a shape in which a maximum value of an angle formed between the first incident plane and a tangent of the first small lens is larger than an angle formed between the first incident plane and first light. The second lens has substantially the same configuration.

A laser device includes a light source generating a laser beam, a stage, and a lens assembly disposed between the light source and the stage and irradiating the laser beam to a substrate disposed on the stage. The lens assembly includes a first lens assembly making divergent the laser beam provided from the light source, a deflector changing a path of the laser beam provided from the first lens assembly, and a second lens assembly condensing the laser beam provided from the deflector and irradiating the condensed laser beam to the substrate.

A laser beam is condensed in a close position to a target object in underwater so as to generate an air bubble or plasma. The target object is efficiently destroyed by a shock by the air bubble or the plasma.

A wafer processing apparatus includes: a laser apparatus configured to generate a laser beam; a focusing lens optical system configured to focus the laser beam on an inside of a wafer; an arbitrary wave generator configured to supply driving power to the laser apparatus; and a controller configured to control the arbitrary wave generator, wherein the laser beam includes a plurality of pulses sequentially emitted from the laser apparatus, and wherein each of the plurality of pulses is a non-Gaussian pulse, and a full width at half maximum (FWHM) of each of the plurality of pulses ranges from 1 ps to 500 ns.

The present invention provides an optical system for stereolithography apparatus that enables highly accurate manufacturing by a stereolithography apparatus. An optical system 10 for stereolithography apparatus, includes: a light source 11; an optical scanning section 16 configured to reflect light emitted from the light source 11 to scan to a manufacturing surface IM; and a condenser lens 17 arranged between the optical scanning section 16 and the manufacturing surface IM and configured to condense the light reflected by the optical scanning section 16. When the condenser lens 17 has a focal length f and the condenser lens 17 has a normal angle A at a maximum effective diameter on a surface on a side of the manufacturing surface IM, the optical system 10 for stereolithography apparatus satisfies

f≤25 mm,

0.3<cos(A).

In an optical emitter device, when point emitters are placed on the focal plane of a lens system, each individual point emitter will point to a specific free space angle depending on the position of the point emitter relative to the longitudinal central axis of the lens system. Point emitters comprising end-fire tapers combined with both a turning mirror and a micro-lens provide improved performance, because, unlike grating couplers, end-fire tapers enable uniform broadband operation with all possible polarization states. A turning mirror may be added to direct the light emission from the end-fire tapers to vertically upwards, which enables both a two-dimensional point emitter array and a more streamlined assembly process.