A reflective EUV optic such as a collector mirror configured as an array of facets that are spaced apart to form respective gaps between adjacent facets. The gaps are used as inlets for gas flow across one of the facets such that flow is introduced parallel to the optic surface. The facets can be made with offsets such that loss of reflective area of the EUV optic can be minimized. The gas facilitates removal of target material from the surface of the facets.

A plasma-generated EUV light source uses an EUV-diffracting collection mirror to channel spectrally pure in-band radiation through an intermediate-focus aperture and through EUV illumination optics. Out-of-band radiation is either undiffracted by the collection mirror or is diffractively scattered away from the aperture. The undiffracted portion, plus plasma-emitted radiation that does not intercept the collection mirror, can be efficiently recycled back to the plasma via retroreflecting mirrors, cat's-eye reflectors, or corner-cube reflectors, to enhance generation of in-band EUV radiation by the plasma.

An optical system of a microlithographic projection exposure apparatus designed for an operating wavelength of at least 150 nm. In one disclosed aspect, the optical system includes an element (11, 21) producing an angular distribution for light incident during the operation of the optical system and a fly's eye condenser (200, 400, 500) which includes two arrangements (210, 220, 410, 420, 510, 520) following one another in the light propagation direction and made of beam-deflecting optical elements (211-213, 221-223, 411-413, 421-423, 511-513, 521-523), which produce a multiplicity of optical channels. No optical element with refractive power is arranged in the beam path between the element (11, 21) producing an angular distribution and the fly's eye condenser (200, 400, 500).

The present invention relates to an optical module, in particular facet mirror, comprising an optical element and a supporting structure for supporting the optical element, wherein the supporting structure comprises a positioning device for actively setting a position and/or orientation of the optical element in at least one degree of freedom. The supporting structure comprises a selectively activatable contacting device having at least one contacting unit having a first contact section, wherein the first contact section, in an activated state of the contacting device, contacts a second contact section of the optical element in order to exert a contact force on the optical element, while the first contact section, in a deactivated state of the contacting device is removed from the second contact section.

An extreme ultraviolet generation device, including a chamber with an internal space; a plasma generator to generate plasma in the internal space; a condenser in the internal space to gather light generated from the plasma; and a monitor to monitor the internal space in an omnidirectional manner.

An extreme ultraviolet (EUV) light generator includes a collecting mirror having a first focal point and a second focal point, the first focal point being closer to the collecting mirror than the second focal point, a laser to generate a laser beam and to radiate the laser beam toward the first focal point of the collecting mirror, and a droplet generator to generate a droplet and to discharge the droplet at the first focal point of the collecting mirror, wherein the collecting mirror includes a concave reflective surface, a through hole in a center of the reflective surface, and a drip hole between the through hole and an outer circumferential surface of the reflective surface.

A device for increasing the optical power of a solid state light source in the green and/or yellow bands, is disclosed. The device has an integral body having an ingress surface configured to receive light from an emitting portion of the solid state light source, an egress surface substantially opposite the ingress surface, and a recess formed within the body. The recess has an input opening in the ingress surface, an output opening in the egress surface, and a recess surface within the body extending between the input opening and the output opening. The recess surface is configured to reflect visible light with Lambertian scatter characteristics.

An aspherical lens includes a light entrance plane configured to receive light emitted from a light source and a light exit plane configured to radiate the light received by the light entrance plane. The light exit plane includes semispherical convex portions disposed on an upper surface of the aspherical lens, a concavely depressed portion comprising an overlapping region where the semispherical convex portions partially overlap each other at a central axis, a side portion connected with the semispherical convex portions, and an upper surface of each of the semispherical convex portions having a first flat portion.

The invention relates to an illumination system (10), a luminaire (102), a collimator (30), and a display device (200). The illumination system according to the invention comprises a light source (20) and the collimator. The light source is configured to emit a substantially Lambertian light distribution around an axis of symmetry (22). The refractive collimator is configured to redirect light from the light source so as to at least partially illuminate an illuminating surface (50), in which at least a part of the illuminating surface is substantially parallel to the axis of symmetry. The refractive collimator comprises a concave entrance window (34) and an at least partially convex exit window (40) for refracting light towards the illuminating surface. The illumination system according to the invention has the effect that a height of the illumination system may be reduced by virtue of the use of the refractive collimator.

An extreme ultraviolet (EUV) light generation apparatus includes a source supplying unit in a chamber, the source supplying unit including a source material for generation of extreme ultraviolet light, a plasma generator to generate plasma from the source material, an optical unit in the chamber, and at least one protection film adjacent to the optical unit, the at least one protection film including at least one of graphite or graphene.