A disinfection device includes: a container having a wall that defines a chamber for containing liquid therein; and a light source for transmitting disinfection light to the liquid. The light source is in a spatial relationship with the container so that a distance between the light source and the first light receiving surface of the liquid remains unchanged regardless of a volume of the liquid.

Integrated rotary structure and fabrication method thereof are provided. An integrated rotary structure includes a cylinder material. The cylinder material includes a circular side wall, a third surface at one end of the circular side wall and a fourth surface at another end of the circular side wall opposing to the third surface. The third surface of the cylinder material is machined to form an elliptical reflective surface. The circular side wall of the cylinder material is machined to form a fifth surface and a sixth surface. A central symmetrical axis of the fifth surface and the sixth surface coincides with a first optical axis of the elliptical reflective surface. By using the fifth surface and the sixth surface as holding planes, the third surface is machined to form a curved non-reflective surface surrounding the elliptical reflective surface.

An illumination optical system which is used with a reflective imaging optical system configured to form an image of a pattern arranged on a first plane onto a second plane, and which illuminates an illumination area on the first plane with a light from a light source. The illumination optical system includes one or more reflecting mirrors configured to reflect the light from the light source such that the light from the light source passes between first and second mirrors of a plurality of mirrors provided in the reflective imaging optical system, the first mirror being configured to reflect the light from the pattern first, and the second mirror being configured to reflect the light from the pattern second.

Illumination optical unit for illuminating an object field in a projection exposure apparatus, comprising a first facet mirror with a structure, which has a spatial frequency of at least 0.2 mm.sup.1 in at least one direction, and a second facet mirror, comprising a multiplicity of facets, wherein the facets are respectively provided with a mechanism for damping spatial frequencies of the structure of the first facet mirror.

A light irradiation device includes a light source having a plurality of solid-state elements disposed on a substrate to be defined by a first direction and a second direction in a plurality of rows and irradiate the irradiation target with light from a third direction, an optical element refracting light from the solid-state elements, emitting the light and narrowing a spread angle of light to be emitted from the solid-state elements relative to the third direction, a first reflection portion having at least two first reflection surfaces on a downstream side in the third direction of the irradiation target and reflecting a part of light incident on the first reflection surface to the irradiation target, and a second reflection portion having a pair of second reflection surfaces disposed between the optical element and the first reflection portion and guiding light from the optical element to the first reflection surface.

An EUV collector serves for use in an EUV projection exposure apparatus. The collector guides EUV used light emitted by a plasma source region. An overall impingement surface of the collector is impinged upon by radiation emitted by the plasma source region. A used light portion of the overall impingement surface guides the EUV used light. An extraneous light portion of the overall impingement surface is impinged upon by extraneous light radiation, the wavelength of which differs from that of the used light. The used light portion and the extraneous light portion are not congruent. This EUV collector has increased efficiency can involve reduced production costs.

A light source module includes: laser light sources; parallel light lenses that converts laser beams from the laser light sources to collimated laser beams; a demagnification optical system including that demagnifies the collimated laser beams; an optical fiber; and a condenser lens that converges and couples the laser beams demagnified by the demagnification optical system with the optical fiber; wherein an Abbe number of each of the parallel light lenses is set to a set value suppressing an output fluctuation from the optical fiber to a predetermined value or less, the set value determined based on: a transverse magnification defined by a focal length of a corresponding one of the parallel light lenses, a demagnification of the demagnification optical system, and a focal length of the condenser lens; and a corresponding one of wavelength shifts of the laser beams generated by the laser light source.

The present invention relates to an optical component and a transparent body used in the optical component. The optical component includes at least one optical element that radiates ultraviolet light, and a package that accommodates the optical element. The package includes a mounting substrate on which the optical element is mounted, and a transparent body that is bonded to the mounting substrate with an organic-based adhesive layer therebetween. The package has a structure in which the ultraviolet light is transmitted through the transparent body but not guided to the adhesive layer, and the ultraviolet light does not directly come into contact with the adhesive layer.

A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.

Embodiments disclosed herein relate to a processing chamber having a lens disposed therein. In one embodiment, the processing chamber includes a chamber body, a substrate support assembly, a light source, and a lens. The chamber body defines an interior volume of the processing chamber. The interior volume has a first area and a second area. The substrate support assembly is disposed in the second area. The substrate support assembly is configured to support a substrate. The light source is disposed above the substrate support assembly in the first area. The lens is disposed between the light source and the substrate support assembly. The lens includes a plurality of features formed therein. The plurality of features is configured to preferentially direct light from the light source to an area of interest on the substrate when disposed on the substrate support assembly.