G02B21/0016

Apparatuses, methods, and computer programs for a microscope system for obtaining image data with two fields of view

Examples relate to apparatuses, methods and computer programs for a microscope system, more specifically, but not exclusively, to the use of two optical imaging modules to obtain image data having a first and a second field of view. The apparatus comprises an interface. The interface is suitable for obtaining first image data of a sample from a first optical imaging module. The first image data has a first field of view. The interface is suitable for obtaining second image data of the sample from a second optical imaging module. The second image data has a second field of view. The first field of view comprises the second field of view. The apparatus comprises a processing module. The processing module is configured to generate an image output signal for a display of the microscope system. In some embodiments, the processing module is configured to process the first image data to detect an abnormality outside the second field of view. In this case, information on the abnormality is overlaid over the second image data within the image output signal. Additionally or alternatively, an overview of the first image data is overlaid over the second image data within the image output signal. The processing module is configured to provide the image output signal to the display.

OPTICAL SYSTEM AND METHOD FOR OPERATING AN OPTICAL SYSTEM
20220357550 · 2022-11-10 ·

The disclosure relates to an optical system and to a method for operating an optical system, wherein the optical system includes at least one carrier having at least one optical element, a movement bearing element for supporting the carrier during a movement, at least one first bearing element and at least one further bearing element for statically supporting the carrier, wherein the carrier includes corresponding bearing elements for providing static support, wherein the optical system includes a first and a further end stop element, wherein the carrier is supported movably between the end stop elements, wherein the first end stop element has or forms the first bearing element for providing static support and the further end stop element has or forms the further bearing element for providing static support, wherein the bearing elements define the stop poses of the carrier with repetition accuracy.

LENS LESS IMAGING MICROSCOPY SYSTEM

An arrangement of a lens less imaging microscopy system having an antimicrobial and anti-bacterial surface. The system provides a modular layout, i.e., having exchangeable or interchangeable modules along with autoclave ability of individual modules. The lens less imaging system may include a light engine module, sample containing specific module, camera module, chip dock module that are swappable, respectively. The lens less imaging system may also include a software module that allows recognition of attachments and detachments of the various modules. The lens less imaging system has higher flexibility and affordability due to the swappable modules.

METHOD FOR MEASURING FILM THICKNESS DISTRIBUTION OF WAFER WITH THIN FILMS

A method includes: determining height Z1 of a focus by an optical microscope having autofocus function which uses irradiation light of wavelength λ0 to adjust the focus; determining a wavelength λ1 of irradiation light used for obtaining observation image of second thin film; obtaining observation image of second thin film by using irradiation light of the wavelength λ1, while altering heights of the focus with the Z1 as reference point; calculating standard deviation of reflected-light intensity distribution within the observation image, obtaining height Z2 of the focus corresponding to a peak position where standard deviation is greatest, and calculating a difference ΔZ between Z1 and Z2; correcting the autofocus function with ΔZ as a correction value; and using the corrected autofocus function to adjust the focus, obtaining the observation image of the second thin film, and calculating the film thickness distribution from the reflected-light intensity distribution within the observation image.

HIGH RESOLUTION MULTISPECTRAL MULTI-FIELD-OF-VIEW IMAGING SYSTEM FOR WAFER INSPECTION
20230075747 · 2023-03-09 ·

An optical system and design can image objects under inspection in the ultraviolet (UV) and visible spectrums. This imaging can be used to detect both large defects in the visible spectrum and small defects in the UV spectrum in a single pass while reducing the time and cost of the inspection process. The optical system may include an off-axis reflective focusing system for aberration correction with a beamsplitter to separate the visible spectrum from the UV wavelengths. Cameras may then image visible and UV wavelengths.

Super resolution for magneto-optical microscopy

Sub-diffraction limited magneto-optical microscopy, such as Kerr or Faraday effect microscopy, provide many advantages to fields of science and technology for measuring, or imaging, the magnetization structures and magnetization domains of materials. Disclosed is a method and system for performing sub-diffraction limited magneto-optic microscopy. The method includes positioning a microlens or microlens layer relative to a surface of a sample to image the surface of the sample, forming a photonic nanojet to probe the surface of the sample, and receiving light reflected by the surface of the sample or transmitted through the sample at an imaging sensor. The methods and associated systems and devices enable sub-diffraction limited imaging of magnetic domains at resolutions 2 to 8 times the classical diffraction limit.

Method and device for measuring interfaces of an optical element
11662199 · 2023-05-30 · ·

A method for measuring interfaces of an optical element, forming part of a plurality of similar elements including at least one reference optical element, the method implemented by a device, the method including: relative positioning of each reference optical element and the measurement beam, to allow a measurement of interfaces of each reference optical element; acquisition of a reference image, of each reference element; positioning of the measured optical element to allow acquisition of a measurement image, of the optical element to be measured; determining a difference of position in a field of view of the measured element with respect to each reference optical element, based on the reference and measurement images; adjusting the position of the measured optical element in the field of view to cancel the difference of position; and measuring the interfaces of the measured optical element by the measurement beam.

Fluorescence microscopy inspection systems, apparatus and methods with darkfield channel

A fluorescence microscopy inspection system includes light sources able to emit light that causes a specimen to fluoresce and light that does not cause a specimen to fluoresce. The emitted light is directed through one or more filters and objective channels towards a specimen. A ring of lights projects light at the specimen at an oblique angle through a darkfield channel. One of the filters may modify the light to match a predetermined bandgap energy associated with the specimen and another filter may filter wavelengths of light reflected from the specimen and to a camera. The camera may produce an image from the received light and specimen classification and feature analysis may be performed on the image.

Device for thermocycling biological samples, monitoring instrument comprising the same, and method for thermocycling biological samples using such device

An optical measurement unit for a scanning device, a scanning device, and a method for operating a scanning device, for high throughput sample analysis of biological samples are disclosed. An illumination system is used to emit light of at least two different illumination wavelength ranges, and an imaging system is used to detect light of at least two different detection wavelength ranges, in order to detect electromagnetic radiation within a field of view for determining the positioning of a sample within the field of view.

APPARATUS AND METHOD OF MEASURING UNIFORMITY BASED ON PUPIL IMAGE AND METHOD OF MANUFACTURING MASK BY USING THE METHOD
20230142328 · 2023-05-11 ·

An apparatus and method of measuring pattern uniformity, and a method of manufacturing a mask by using the measurement method are provided. The measurement apparatus includes a light source configured to generate and output light, a stage configured to support a measurement target, an optical system configured to transfer the light, output from the light source, to the measurement target supported on the stage, and a first detector configured to detect light reflected and diffracted by the measurement target, or diffracted by passing through the measurement target, wherein the first detector is configured to detect a pupil image of a pupil plane and to measure pattern uniformity of an array area of the measurement target on the basis of intensity of at least one of zero-order light and 1.sup.st-order light of the pupil image.