A substrate for use in manufacture of a production master plate for production of a detection disc for carrying samples in an apparatus for detection of microscopic objects in a fluid, the substrate having a channel and separate focus structure, wherein the focus structure is a groove.

A device may include an input component and a focus control component. The focus control component may receive, from the input component, an input associated with adjusting a focus of a field of view of the device. The focus control component may determine whether an area of interest is present in the field of view. The focus control component may adjust, based on determining that the area of interest is not present in the field of view, the focus of the field of view at a focus speed associated with the input, or, based on determining that the area of interest is present in the field of view, may determine one or more parameters for modifying the focus speed, modify the focus speed based on the one or more parameters, and adjust the focus of the field of view at the modified focus speed.

Provided herein are systems and methods for multi-color imaging using a microscope system. The microscope system can have a relatively small size compared to an average microscope system. The microscope system can comprise various components configured to reduce or eliminate image artifacts such as chromatic aberrations and/or noise from stray light that can occur during multi-color imaging. The components can be configured to reduce or eliminate the image artifacts, and/or noise without substantially changing the size of the microscope system.

The present invention discloses a spatial posture adjusting device for an optical axis of a microscopic monitoring system for a cellular fermentation tank. The adjusting device includes a base frame, where the base frame is fixedly provided with an up/down adjustment table; the up/down adjustment table is slidably connected to a load plate; the load plate is fixedly provided with a microscope adjustment mechanism and an illumination rotation adjustment mechanism in sequence; the illumination rotation adjustment mechanism includes a base; the base is fixedly connected to a first support frame; the first support frame is fixedly provided with an illuminator; the microscope adjustment mechanism includes a second support frame; the second support frame is fixedly provided with a clamping device; the clamping device is fixedly provided with a microscope device; the illumination rotation adjustment mechanism is fixedly connected with a mobile platform.

A lens module includes a printed circuit board, a lens component, and at least two electric conductors. The lens component includes a first lens and a microscope base, the first lens is formed on the microscope base, the microscope base is formed on the printed circuit board, and the first lens is electrically conductive and deforms under voltage. The first lens is electrically connected to the printed circuit board by the electric conductors. The printed circuit board outputs a voltage to the first lens through the electric conductors; the first lens deforms according to the voltage thereby changing a focal distance of light passing through the first lens. The disclosure also relates to an electronic device using the lens module. The lens module can has a zoom function and has a litter volume.

The invention relates to the domain of microscope based imaging. The invention provides methods and apparatuses for providing improved microscope based digital imaging solutions that are capable of providing high quality images with a high level of image detail. The invention additionally provides solutions for artificial intelligence based controlling of a digital microscope's imaging functions to enable bright field/dark field imaging functionality to be combined with spectroscopic functions to obtain higher detail and more meaningful information about a specimen sample.

Examples relate to a surgical microscope system, and to a system, a method, and a computer program for a microscope of a surgical microscope system. The system is configured to the system is configured to obtain imaging sensor data from at least one optical imaging sensor of the microscope. The system is configured to determine information on an area of interest of a user of the surgical microscope system based on an input of the user. The system is configured to determine an anatomical feature of interest within the area of interest. The system is configured to detect a position of the anatomical feature of interest within the imaging sensor data. The system is configured to trigger an autofocus functionality of the microscope to focus on the position of the anatomical feature of interest.

The invention relates to a method for automatedly aligning a stand (12) for a microscope (14), wherein the stand (12) for the microscope (14) comprises controllable positioning means (16) for positioning the microscope (14) and controllable orienting means (18) for orienting the microscope (14). The method comprises defining a target point (24) to be observed by the microscope (14), wherein the target point (24) is located within a coordinate range accessible by the stand (12), stabilizing the microscope (14) at a user determined position in an automated manner by means of the controllable positioning means (16) of the stand, and adjusting an orientation of the microscope (14) at the user determined position to the target point (24) in an automated manner using the controllable orienting means (18) of the stand. The invention further relates to a stand, a microscope assembly (10), a control unit, a computer program and a computer-readable data storage.

The present application relates to a device for determining placements of pattern elements of a reflective photolithographic mask in the operating environment thereof, wherein the device comprises: (a) at least one first means configured for determining surface unevenness data of a rear side of the reflective photolithographic mask and/or surface unevenness data of a mount of the reflective photolithographic mask in a measurement environment that does not correspond to the operating environment; (b) at least one second means configured for determining placement data of the pattern elements in the measurement environment; and (c) at least one computing unit configured for calculating the placements of the pattern elements of the reflective photolithographic mask in the operating environment from the determined surface unevenness data of the rear side and/or of the mount and the determined placement data.

A method for determining a distance of a sample reference plane of a sample carrier from a reference plane of a microscope, the microscope including a sample stage for the sample carrier and a camera, comprises the following steps: taking an overview image of the sample carrier by means of the camera; evaluating the overview image and thus detecting at least one characteristic of the sample carrier; ascertaining contextual data of the characteristic from a data set; and determining the distance of the sample reference plane from the reference plane based on the characteristic and the contextual data of the sample carrier. A microscope configured to determine the distance of the sample reference plane of the sample carrier from the reference plane is also described.