A method and apparatus to generate harmonically related laser wavelengths includes a pair of lenses at opposing faces of a non-linear optical material. The lenses are configured to promote incoming and outgoing beams to be normal to each outer lens surface over a range of acceptance angles of the incoming laser beam. This reduces reflection loss for higher efficiency operation. Additionally, the lenses allow a wider range of wavelengths for lasers for more universal application. Examples of the lenses include plano-cylindrical and plano-spherical form factors.

A method and apparatus to generate harmonically related laser wavelengths includes a pair of lenses at opposing faces of a non-linear optical material. The lenses are configured to promote incoming and outgoing beams to be normal to each outer lens surface over a range of acceptance angles of the incoming laser beam. This reduces reflection loss for higher efficiency operation. Additionally, the lenses allow a wider range of wavelengths for lasers for more universal application. Examples of the lenses include plano-cylindrical and plano-spherical form factors.

Single crystals of a new noncentrosymmetric polar oxysulfide SrZn.sub.2S.sub.2O (s.g. Pmn2.sub.1) grown in a eutectic KF-KCl flux with unusual wurtzite-like slabs consisting of close-packed corrugated double layers of ZnS.sub.3O tetrahedra vertically separated from each other by Sr atoms and methods of making same.

An optical amplifier arrangement has optical parametric amplifiers and white light generations and harmonic generation, in particular frequency doubling, for generating a wide visible to infrared, in any case near-infrared, spectrum of coherent ultra-short light pulses, in particular with a pump laser, and also to a . A method During operation the fundamental is in a wavelength range above 950 nm, and the second signal light and the second idler light of the second optical parametric amplifier together cover a tunability range of wavelengths between 500 nm and 5 μm, in particular between 550 nm and 3 μm, wherein between wavelengths in the tunability range throughout continuous tuning can be carried out, namely through the degeneration range of the second optical parametric amplifier (OPA2) at the fundamental of the pump laser.

An optical amplifier arrangement has optical parametric amplifiers and white light generations and harmonic generation, in particular frequency doubling, for generating a wide visible to infrared, in any case near-infrared, spectrum of coherent ultra-short light pulses, in particular with a pump laser, and also to a . A method During operation the fundamental is in a wavelength range above 950 nm, and the second signal light and the second idler light of the second optical parametric amplifier together cover a tunability range of wavelengths between 500 nm and 5 μm, in particular between 550 nm and 3 μm, wherein between wavelengths in the tunability range throughout continuous tuning can be carried out, namely through the degeneration range of the second optical parametric amplifier (OPA2) at the fundamental of the pump laser.

A system for determining a second-order nonlinear susceptibility of a material includes a laser light source, a polarization modulator, a light collector, a polarization detector and a controller. The controller can obtain the second-order nonlinear susceptibility of the sample to be tested according to the test data. The system for determining the second-order nonlinear susceptibility of a material can directly test a material (block or film) with a thickness of hundreds of nanometers, and draw a second-order nonlinear susceptibility fitting curve of the material according to the test results of the optical system.

A system for determining a second-order nonlinear susceptibility of a material includes a laser light source, a polarization modulator, a light collector, a polarization detector and a controller. The controller can obtain the second-order nonlinear susceptibility of the sample to be tested according to the test data. The system for determining the second-order nonlinear susceptibility of a material can directly test a material (block or film) with a thickness of hundreds of nanometers, and draw a second-order nonlinear susceptibility fitting curve of the material according to the test results of the optical system.

Laser and inspection systems that generate laser output light at sub-200 nm wavelengths using fundamental light at approximately 1064 nm. A second harmonic generator module generates second harmonic light directed to both an optical parametric (OP) module, which generates down-converted signal (idler light), and to a fifth harmonic generator module, which generates fifth harmonic light. The OP module includes an optical parametric oscillator that is configured to generate the idler signal at approximately 0.5 times the fundamental frequency. The idler light and fifth harmonic light are then mixed by a frequency mixing module to generate the laser output light having an output frequency equal to approximately 5.5 times the fundamental frequency.

Laser and inspection systems that generate laser output light at sub-200 nm wavelengths using fundamental light at approximately 1064 nm. A second harmonic generator module generates second harmonic light directed to both an optical parametric (OP) module, which generates down-converted signal (idler light), and to a fifth harmonic generator module, which generates fifth harmonic light. The OP module includes an optical parametric oscillator that is configured to generate the idler signal at approximately 0.5 times the fundamental frequency. The idler light and fifth harmonic light are then mixed by a frequency mixing module to generate the laser output light having an output frequency equal to approximately 5.5 times the fundamental frequency.

A laser source apparatus is for providing a beam path to generate a first laser beam and a second laser beam. The laser source apparatus includes a laser generator, at least one spectrum broadening unit and a beam splitter on the beam path. The laser generator is configured to generate an original laser beam with a pulse duration smaller than 1 ps. The spectrum broadening unit is configured in a following stage of the laser generator. The spectrum broadening unit includes a multiple plate continuum. The multiple plate continuum includes a plurality of thin plates, and the thin plates are configured along the beam path in order. The beam splitter is configured in the following stage of the laser generator to divide the original laser beam into the first laser beam and the second laser beam.