An electro-optic device includes a substrate structure, a first layer, a second layer on the first layer, and a third layer on the second layer. The first layer includes a first thin film lithium-containing (TFLC) electro-optic material and having a first thickness. The second layer includes a second TFLC electro-optic material and has a second thickness. The third layer includes a third TFLC electro-optic material and having a third thickness. Electro-optic structure(s) of the electro-optic device includes the first layer, the second layer, and the third layer. In the electro-optic structure(s), the first layer has a first width, the second layer has a second width, and the third layer has a third width.

An electro-optic device includes a substrate structure, a first layer, a second layer on the first layer, and a third layer on the second layer. The first layer includes a first thin film lithium-containing (TFLC) electro-optic material and having a first thickness. The second layer includes a second TFLC electro-optic material and has a second thickness. The third layer includes a third TFLC electro-optic material and having a third thickness. Electro-optic structure(s) of the electro-optic device includes the first layer, the second layer, and the third layer. In the electro-optic structure(s), the first layer has a first width, the second layer has a second width, and the third layer has a third width.

The optical device includes: a substrate; a waveguide layer which is formed on the substrate and which has an optical waveguide for propagating light; a protective layer provided on the waveguide layer; and a groove which extends from the protective layer to the waveguide layer, wherein the groove includes a first side surface and a second side surface which opposes the first side surface, the first side surface and the second side surface expose end surfaces of the waveguide layer and the protective layer, and the second side surface has a rough surface.

Provided in the present invention is a thermo-optic phase shifter array, including at least one first waveguide and at least one second waveguide, where the first waveguide extends in a first direction, the second waveguide extends in a second direction, the first waveguides and the second waveguides are alternately arranged in a third direction, the first waveguide includes a first waveguide section, the second waveguide includes a second waveguide section, the first waveguide sections and the second waveguide sections are alternately arranged in the third direction, the first waveguide section is integrated with a heater, and a thermo-optic coefficient of the second waveguide section is smaller than that of the first waveguide sections. The thermo-optic phase shifter array provided by the present invention has lower thermal crosstalk, and has a compact structure, facilitating high-density integration. The present invention further provides an interferometer array and an optical phased array.

Structures for a photonic chip that include a grating and a light source, as well as methods of forming such structures. The structure comprises a grating that includes segments. The grating comprises a material having a refractive index that is variable in response to a stimulus, such as an applied bias voltage. The structure further comprises a waveguide core that includes a section adjacent to the segments of the grating. The structure may further include a light source adjacent to the grating.