An integrated optical modulator array useful for modulating light at different wavelengths in the same optical band includes multiple GeSi waveguides on a substrate. Each GeSi waveguide has a different width and is coupled to electrodes to form an electro-absorption modulator. A stressor material, such as SiN, disposed between the GeSi waveguides in the optical modulators applies a strain to the GeSi waveguides. Because each GeSi waveguide has a different width, it experiences a different strain. This difference can be a difference in magnitude, type (homogeneous v. inhomogeneous, compressive v. tensile), or both. The different strains shift the bandgaps of the Ge in the GeSi waveguides by different amounts, shifting the optical absorption edges for the GeSi waveguides by different amounts. Put differently, the stressor layer strains each GeSi modulator differently, causing each GeSi modulator to operate at a different wavelength.

An electrical-optical modulator may include one or more optical waveguides to propagate one or more optical signals in a direction of propagation. An optical waveguide of the one or more optical waveguides may include a time delay section, a first modulation section preceding the time delay section in the direction of propagation, and a second modulation section following the time delay section in the direction of propagation. The first modulation section and the second modulation section may be configured to be associated with opposite modulation polarities, and the time delay section may be configured to delay a phase of the one more optical signals relative to the first modulation section. The electrical-optical modulator may include one or more signal electrodes to propagate one or more signals in the direction of propagation in order to modulate the one or more optical signals through electrical-optical interaction.

An electrical-optical modulator may include a first section configured for a first electrical-optical interaction between one or more optical waveguides and one or more signal electrodes. The electrical-optical modulator may include a second section configured to increase or decrease a relative velocity of signals of the one or more signal electrodes to optical signals of the one or more optical waveguides relative to the first section. The electrical-optical modulator may include a third section configured for a second electrical-optical interaction between the one or more optical waveguides and the one or more signal electrodes according to an opposite modulation polarity relative to the first section.

An electrical-optical modulator may include a first section configured for a first electrical-optical interaction between one or more optical waveguides and one or more signal electrodes. The electrical-optical modulator may include a second section configured to increase or decrease a relative velocity of signals of the one or more signal electrodes to optical signals of the one or more optical waveguides relative to the first section. The electrical-optical modulator may include a third section configured for a second electrical-optical interaction between the one or more optical waveguides and the one or more signal electrodes according to an opposite modulation polarity relative to the first section.

An active matrix substrate includes a substrate; a plurality of gate bus lines and a plurality of source bus lines; an oxide semiconductor TFT that includes an oxide semiconductor layer, a gate insulating layer, and a gate electrode; a pixel electrode; and an upper insulating layer. The oxide semiconductor layer includes a high resistance region, and a first region and a second region. The high resistance region includes a channel region, a first channel offset region, and a second channel offset region. The upper insulating layer is disposed so as to overlap the channel region, the first channel offset region, and the second channel offset region, and so as not to overlap any of the first region and the second region, when viewed from the normal direction of the main surface of the substrate.

An optoelectronic device and an array comprising a plurality of the same. The device(s) comprising: an optically active region with an electrode arrangement for applying an electric field across the optically active region; a first curved waveguide, arranged to guide light into the optically active region; and a second curved waveguide, arranged to guide light out of the optically active region; wherein the first curved waveguide and the second curved waveguide are formed of a material having a different band-gap from a band-gap of the optically active region, and wherein the overall guided path formed by the first curved waveguide, the optically active region and the second curved waveguide is U-shaped.

The optical response of a metasurface is controlled by actuating it via an electrical or magnetic field, temperature control, optical pumping or electromechanical actuation. The metasurface will therefore control the polarization of the incident light. The metasurface comprises an array of patch antennas. The patch antennas are in the form of asymmetrical elements, including rotated rods, cross-shapes, V-shapes, and L-shapes.

An optical modulator includes a p-type first semiconductor layer (102) formed on a clad layer (101), an insulating layer (103) formed on the first semiconductor layer (102), and an n-type second semiconductor layer (104) formed on the insulating layer (103). The first semiconductor layer (102) is made of silicon or silicon-germanium, and the second semiconductor layer (104) is formed from a III-V compound semiconductor made of three or more materials.

A cadmium free quantum dot including a semiconductor nanocrystal core and a semiconductor nanocrystal shell disposed on the core, wherein the quantum dot does not include cadmium and includes indium and zinc, the quantum dot has a maximum photoluminescence peak in a red light wavelength region, a full width at half maximum (FWHM) of the maximum photoluminescence peak is less than or equal to about 40 nanometers (nm), an ultraviolet-visible (UV-Vis) absorption spectrum of the quantum dot includes a valley between about 450 nm to a center wavelength of a first absorption peak, and a valley depth (VD) defined by the following equation is greater than or equal to about 0.2, a quantum dot polymer composite including the same, and a display device including the quantum dot-polymer composite:

(Abs.sub.firstAbs.sub.valley)/Abs.sub.first=VD.

A superposition circuitry superposes a dither signal on a reference DC bias voltage and outputs a resultant voltage as a bias voltage to an MZ modulator, during control of a driving voltage amplitude. During the control of the driving voltage amplitude to the MZ modulator, an amplitude setter determines, by varying the amplitude of an output voltage from an amplifier, a plurality of amplitudes of output curves from a synchronous detector, each of which is obtained by varying the reference DC bias voltage output from a bias controller, and the amplitude setter sets the amplification factor of the amplifier, based on an amplitude of the output voltage from the amplifier that corresponds to an amplitude satisfying a predetermined condition, out of the plurality of the amplitudes of the output curves from the synchronous detector.