An exposure apparatus includes at least one radiation source, a plurality of projection lenses, and a lens switch. The radiation source is operable for providing a radiation beam. The lens switch is operable for selecting one of the projection lenses to focus the radiation beam to a target plane.

An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.

A spatial light modulator imaging system is disclosed. The system comprises an illumination module configured to provide illumination light representing data patterns to be imaged by the spatial light modulator imaging system, a projection module configured to project the illumination light to a substrate, and an illumination-projection beam separator coupled between the illumination module and the projection module, where the illumination-projection beam separator is configured to receive the illumination light along an illumination optical axis and transmit the illumination light received to the projection module along a projection optical axis, and where the illumination optical axis and the projection optical axis are substantially parallel to each other.

A spatial light modulator imaging system is disclosed. The system comprises an illumination module configured to provide illumination light representing data patterns to be imaged by the spatial light modulator imaging system, a projection module configured to project the illumination light to a substrate, and an illumination-projection beam separator coupled between the illumination module and the projection module, where the illumination-projection beam separator is configured to receive the illumination light along an illumination optical axis and transmit the illumination light received to the projection module along a projection optical axis, and where the illumination optical axis and the projection optical axis are substantially parallel to each other.

The present invention provides a measurement apparatus that includes a movable stage and measures a position of a mark on the stage, comprising an imaging device including a plurality of pixels arranged at a pitch and imaging the mark, a driving device changing a relative position between the stage and the imaging device, a measurement device measuring the relative position, and a processor obtaining the position of the mark based on a plurality of images respectively obtained by the imaging device at a plurality of relative positions between the stage and the imaging device that are different from each other and associated with the pitch, wherein the processor is configured to obtain, based on a deviation with respect to one of the plurality of relative positions, a target relative position with respect to another of the plurality of relative positions.

An illumination optical device for illuminating a plane to be illuminated using light from a light source, includes: an optical integrator configured to cause an optical intensity distribution to be uniform on an emission end surface by reflecting light incident from an incident end surface in an inside surface a plurality of times; and a light flux forming unit configured to convert a light flux from a focal position where a condensing mirror condenses light from the light source at a first angle with respect to an optical axis directed from the light source to the plane to be illuminated to a light flux to be incident on the incident end surface of the optical integrator at a second angle greater than the first angle with respect to the optical axis, wherein the plane to be illuminated is illuminated with light from the optical integrator.

An exposure apparatus includes: a projection optical system; an adjusting unit configured to adjust imaging characteristics of the projection optical system; and a controller configured to divide the plurality of shot regions into groups based on data of a shift in the pattern of each shot region and an order of the exposure, determine setting amounts of the imaging characteristics for each group, and control the adjusting unit to set the imaging characteristics to the setting amounts for each group. The setting amount is common to a plurality of shot regions in the group and varies among the groups. The controller performs the division such that the shot regions belonging to the same group have a sequential exposure order and all values of the shift in the shot regions belonging to the same group fall within a predetermined range.

A projection exposure system (10) for microlithography. The system includes projection optics (12) configured to image mask structures into a substrate plane (16), an input diffraction element (28) which is configured to convert irradiated measurement radiation (21) into at least two test waves (30) directed onto the projection optics (12) with differing propagation directions, a detection diffraction element (34; 28) which is disposed in the optical path of the test waves (30) after the latter have passed through the projection optics (12) and is configured to produce a detection beam (36) from the test waves (30) which has a mixture of radiation portions of both test waves (30), a photo detector (38) disposed in the optical path of the detection beam (36) which is configured to record the radiation intensity of the detection beam (36), time resolved, and an evaluation unit which is configured to determine the lateral imaging stability of the projection optics (12) from the radiation intensity recorded.

The invention relates to an optical system of a microlithographic projection exposure apparatus, in particular for operation in the EUV, comprising a mirror arrangement composed of a plurality of mutually independently adjustable mirror elements, and at least one polarization-influencing arrangement arranged upstream of the mirror arrangement relative to the light propagation direction, wherein the polarization-influencing arrangement has a group of first reflection surfaces and a group of second reflection surfaces, wherein the first reflection surfaces are tiltable independently of one another, and wherein, during the operation of the optical system, light reflected at respectively one of the first reflection surfaces can be directed onto the mirror arrangement via respectively a different one of the second reflection surfaces depending on the tilting of the first reflection surface.

A liquid immersion member is used in a liquid immersion exposure apparatus which exposes a substrate by exposure light via a first liquid between an emitting surface of an optical member and the substrate, and is capable of forming a liquid immersion space on an object movable below the optical member. The liquid immersion member includes a first member that is disposed at at least a portion of surrounding of the optical member; a second member that includes at least a portion disposed below the first member, that is capable of being opposite to the object and that is movable outside an optical path of the exposure light; and a protection part that protects the optical member. The protection part decreases a change in pressure which the optical member receives from the liquid in the liquid immersion space.