The present disclosure provides an apparatus for a semiconductor lithography process. The apparatus includes a mask defining a circuit pattern to be transferred. The apparatus further includes a pellicle including a pattern formed in a first surface, wherein the pellicle is attached to the mask at the first surface. The apparatus also includes an adhesive material layer disposed between the mask and the first surface. The pattern may include a plurality of capillaries. Each capillary of the plurality of capillaries may have a dimension in a plane of the first surface between about 1 .Math.m and about 500 .Math.m. Each capillary of the plurality of capillaries may have a ratio of depth to width greater than or equal to about 100. The adhesive material layer may include an adhesive having a glass transition temperature (T.sub.g) greater than room temperature.

A photolithographic mask assembly according to the present disclosure accompanies a photolithographic mask. The photolithographic mask includes a capping layer over a substrate and an absorber layer disposed over the capping layer. The absorber layer includes a first main feature area, a second main feature area, and a venting feature area disposed between the first main feature area and the second main feature area. The venting feature area includes a plurality of venting features.

A photolithographic mask assembly according to the present disclosure accompanies a photolithographic mask. The photolithographic mask includes a capping layer over a substrate and an absorber layer disposed over the capping layer. The absorber layer includes a first main feature area, a second main feature area, and a venting feature area disposed between the first main feature area and the second main feature area. The venting feature area includes a plurality of venting features.

The present disclosure is directed to a membrane cleaning system and a membrane cleaning process, the membrane cleaning system including: a membrane; a membrane holder accommodating the membrane in a cut-out section within the membrane holder, wherein the cut-out section allows access to the membrane from two opposing sides; and a speaker configured to emit sound waves of a resonant frequency of the membrane for a predetermined duration and at a predetermined amplitude, wherein the sound waves are directed to one side of the membrane.

The present disclosure is directed to a membrane cleaning system and a membrane cleaning process, the membrane cleaning system including: a membrane; a membrane holder accommodating the membrane in a cut-out section within the membrane holder, wherein the cut-out section allows access to the membrane from two opposing sides; and a speaker configured to emit sound waves of a resonant frequency of the membrane for a predetermined duration and at a predetermined amplitude, wherein the sound waves are directed to one side of the membrane.

The present disclosure is directed to a reinforcement system including: a framed pellicle including: a center part of a pellicle surrounded by a peripheral part of the pellicle, wherein the peripheral part is adhered to a pellicle frame; and an edge reinforcement for reinforcing the framed pellicle, positioned at a boundary between the center part of the framed pellicle and the pellicle frame.

The present disclosure is directed to a reinforcement system including: a framed pellicle including: a center part of a pellicle surrounded by a peripheral part of the pellicle, wherein the peripheral part is adhered to a pellicle frame; and an edge reinforcement for reinforcing the framed pellicle, positioned at a boundary between the center part of the framed pellicle and the pellicle frame.

An apparatus and method are described herein for providing tension to carbon nanotube films. An apparatus and method are described herein for transferring carbon nanotube films from a first frame to a second frame. An example method includes deforming a frame by one of a thermal method or a physical method, allowing the frame to return to an original shape, and providing tension to the carbon nanotube film.

An apparatus and method are described herein for providing tension to carbon nanotube films. An apparatus and method are described herein for transferring carbon nanotube films from a first frame to a second frame. An example method includes deforming a frame by one of a thermal method or a physical method, allowing the frame to return to an original shape, and providing tension to the carbon nanotube film.

Disclosed is a pellicle including a pellicle membrane including a carbon-based membrane having a carbon content of 40% by mass or more and a support frame that supports the pellicle membrane, in which the pellicle membrane and the support frame are in contact with each other, and at least one of the following conditions 1 and 2 is satisfied. [Condition 1] In the support frame, a surface in contact with the pellicle membrane has a roughness Ra of 1.0 μm or less. [Condition 2] The support frame has a width of unevenness of 10 μm or less at an edge portion on a surface side in contact with the pellicle membrane and on an inner side of the pellicle.