The present disclosure provides an apparatus for a lithography process in accordance with some embodiments. The apparatus includes a pellicle membrane, a pellicle frame including a material selected from the group consisting of boron nitride (BN), boron carbide (BC), and a combination thereof, a mask, a first adhesive layer that secures the pellicle membrane to the pellicle frame, and a second adhesive layer that secures the pellicle frame to the mask.

The present disclosure provides an apparatus for a lithography process in accordance with some embodiments. The apparatus includes a pellicle membrane, a pellicle frame including a material selected from the group consisting of boron nitride (BN), boron carbide (BC), and a combination thereof, a mask, a first adhesive layer that secures the pellicle membrane to the pellicle frame, and a second adhesive layer that secures the pellicle frame to the mask.

A mask frame assembly, including: a hollow frame, which is provided with a hollow area; and a first howling stick, disposed across the hollow area of the hollow frame in a first direction; wherein the mask frame assembly is configured to support a fine metal mask plate which includes a mask pattern area and an invalid mask area surrounding the mask pattern area; in a state of the fine metal mask plate being supported by the mask frame assembly, opposite ends of the fine metal mask plate are fixed on the hollow frame in a second direction; the mask pattern area of the fine metal mask plate is disposed in the hollow area of the hollow frame; and a projection of the first howling stick on the fine metal mask plate is in the invalid mask area. An evaporation device is also disclosed.

A mask frame assembly, including: a hollow frame, which is provided with a hollow area; and a first howling stick, disposed across the hollow area of the hollow frame in a first direction; wherein the mask frame assembly is configured to support a fine metal mask plate which includes a mask pattern area and an invalid mask area surrounding the mask pattern area; in a state of the fine metal mask plate being supported by the mask frame assembly, opposite ends of the fine metal mask plate are fixed on the hollow frame in a second direction; the mask pattern area of the fine metal mask plate is disposed in the hollow area of the hollow frame; and a projection of the first howling stick on the fine metal mask plate is in the invalid mask area. An evaporation device is also disclosed.

A mask protective module is provided. The mask protective module includes a frame and a membrane supported by the frame. The membrane may include regions of which light transmittances, heat conductivities and/or strengths are different from each other.

Provided is a pellicle that can reduce residues stuck onto an exposure original plate when the pellicle is peeled from the exposure original plate after being used in lithography, in particular ArF lithography, and also provided are an exposure original plate with a pellicle, a method for regenerating an exposure original plate, and a peeling residue reduction method.

A pellicle includes a pellicle film, a pellicle frame provided with the pellicle film on one end face thereof, and an agglutinant layer provided on the other end face of the pellicle frame. When the agglutinant layer of the pellicle is bonded to a quartz mask substrate, then a portion to which the agglutinant layer of the pellicle is bonded is irradiated with 193-nm ultraviolet rays at 10 J/cm.sup.2 from a back surface of the substrate, and the pellicle is peeled after the irradiation, an amount of peeling residues of the agglutinant layer remaining on the substrate is 0.5 mg or less.

Provided is a pellicle that can reduce residues stuck onto an exposure original plate when the pellicle is peeled from the exposure original plate after being used in lithography, in particular ArF lithography, and also provided are an exposure original plate with a pellicle, a method for regenerating an exposure original plate, and a peeling residue reduction method.

A pellicle includes a pellicle film, a pellicle frame provided with the pellicle film on one end face thereof, and an agglutinant layer provided on the other end face of the pellicle frame. When the agglutinant layer of the pellicle is bonded to a quartz mask substrate, then a portion to which the agglutinant layer of the pellicle is bonded is irradiated with 193-nm ultraviolet rays at 10 J/cm.sup.2 from a back surface of the substrate, and the pellicle is peeled after the irradiation, an amount of peeling residues of the agglutinant layer remaining on the substrate is 0.5 mg or less.

Provided is an agglutinant for pellicles that can reduce residues stuck onto an exposure original plate when a pellicle is peeled from the exposure original plate after being used in lithography, in particular ArF lithography, and also provided are a pellicle, an exposure original plate with a pellicle, a method for regenerating an exposure original plate, and a peeling residue reduction method.

An agglutinant for pellicles for bonding a pellicle to an exposure original plate, in which the agglutinant includes an acrylic polymer having an SP value of 10.0 or more and 12.0 or less as a base material.

Provided is an agglutinant for pellicles that can reduce residues stuck onto an exposure original plate when a pellicle is peeled from the exposure original plate after being used in lithography, in particular ArF lithography, and also provided are a pellicle, an exposure original plate with a pellicle, a method for regenerating an exposure original plate, and a peeling residue reduction method.

An agglutinant for pellicles for bonding a pellicle to an exposure original plate, in which the agglutinant includes an acrylic polymer having an SP value of 10.0 or more and 12.0 or less as a base material.

Provided is an agglutinant for pellicles that can reduce residues stuck onto an exposure original plate when a pellicle is peeled from the exposure original plate after being used in lithography, in particular ArF lithography, and also provided are a pellicle, an exposure original plate with a pellicle, a method for regenerating an exposure original plate, and a peeling residue reduction method.

An agglutinant for pellicles for bonding a pellicle to an exposure original plate, the agglutinant comprising a polyvinyl ether compound.