A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack having a planar substrate and at least one membrane layer, wherein the planar substrate includes an inner region and a border region around the inner region; and selectively removing the inner region of the planar substrate. The membrane assembly includes: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate. The stack is provided with a mechanical protection material configured to mechanically protect the border region during the selectively removing the inner region of the planar substrate.

Provided are: a frame-shaped pellicle frame 1 having a pellicle frame main body 1a and an insulation layer 1b covering the pellicle frame main body; a pellicle comprising a pellicle film that is provided on the pellicle frame 1 and a top end surface 13 of the pellicle frame with an adhesive or pressure-sensitive adhesive therebetween; a pellicle-equipped exposure original plate; an exposure method; a method for manufacturing a semiconductor; and a method for manufacturing a liquid crystal display board. The pellicle frame can reduce falling of a foreign matter adhered to the surface thereof.

Provided are: a frame-shaped pellicle frame 1 having a pellicle frame main body 1a and an insulation layer 1b covering the pellicle frame main body; a pellicle comprising a pellicle film that is provided on the pellicle frame 1 and a top end surface 13 of the pellicle frame with an adhesive or pressure-sensitive adhesive therebetween; a pellicle-equipped exposure original plate; an exposure method; a method for manufacturing a semiconductor; and a method for manufacturing a liquid crystal display board. The pellicle frame can reduce falling of a foreign matter adhered to the surface thereof.

A technique that enables production of pellicle membranes that are better resistant to breakage when subjected to force exerted thereon in the thickness direction thereof and that have high transmittance to light. A pellicle membrane of the present invention includes a plurality of laminated layers, where at least one of the layers is provided with at least one hole having a width or diameter of 10 nm to 500 nm.

A technique that enables production of pellicle membranes that are better resistant to breakage when subjected to force exerted thereon in the thickness direction thereof and that have high transmittance to light. A pellicle membrane of the present invention includes a plurality of laminated layers, where at least one of the layers is provided with at least one hole having a width or diameter of 10 nm to 500 nm.

Methods for removing a catalyst particle from a nanotube film used in a photolithographic patterning process are disclosed. The catalyst particle is identified based on its size in the nanotube film. This identification can be done using an inspection device such as a confocal microscope, which permits comparison of images taken in two or more separate focal planes to determine the size of particles. The catalyst particle is then exposed to a first absorption wavelength using a laser, which is selectively absorbed by the catalyst particle and which heats the catalyst particle to remove the catalyst particle from the nanotube film. Optionally, the catalyst particle-free nanotube film can be further exposed to a second absorption wavelength which is selectively absorbed by the film and promotes repair of the film. The resulting nanotube film can be used in a pellicle membrane.

Methods for removing a catalyst particle from a nanotube film used in a photolithographic patterning process are disclosed. The catalyst particle is identified based on its size in the nanotube film. This identification can be done using an inspection device such as a confocal microscope, which permits comparison of images taken in two or more separate focal planes to determine the size of particles. The catalyst particle is then exposed to a first absorption wavelength using a laser, which is selectively absorbed by the catalyst particle and which heats the catalyst particle to remove the catalyst particle from the nanotube film. Optionally, the catalyst particle-free nanotube film can be further exposed to a second absorption wavelength which is selectively absorbed by the film and promotes repair of the film. The resulting nanotube film can be used in a pellicle membrane.

A pellicle assembly for large-size photomasks including a frame member configured to be affixed to a large-size photomask substrate, a substantially rigid and transparent pellicle membrane affixed to the frame member so as to protect at least a portion of the large-size photomask substrate from contamination during usage, storage and/or transport, and a coating on at least one of top and bottom surfaces of the pellicle membrane that binds the pellicle membrane to prevent separation of pellicle membrane material in the event of breakage.

A pellicle assembly for large-size photomasks including a frame member configured to be affixed to a large-size photomask substrate, a substantially rigid and transparent pellicle membrane affixed to the frame member so as to protect at least a portion of the large-size photomask substrate from contamination during usage, storage and/or transport, and a coating on at least one of top and bottom surfaces of the pellicle membrane that binds the pellicle membrane to prevent separation of pellicle membrane material in the event of breakage.

The present invention provides: a lightweight optical member which can be produced at relatively low cost and which provides low reflectance, stability upon exposure to light, and abrasion resistance; and an efficient method for producing such an optical member. An optical member according to the present invention is characterized by comprising: a metallic base material; a low-reflective treatment layer formed on the surface of the metallic base material; and a silica layer formed on the surface of the low-reflective treatment layer. It is preferable for the silica layer to have a layer thickness of 0.1-10 μM.