A pellicle characterized by having an amount of released aqueous gas of 110.sup.3 Pa.Math.L/s or less per pellicle, an amount of released hydrocarbon-based gas of 110.sup.5 Pa.Math.L/s or less per pellicle in a range of measured mass number of 45 to 100 amu, and an amount of released hydrocarbon-based gas of 410.sup.7 Pa.Math.L/s or less per pellicle in a range of measured mass number of 101 to 200 amu, under vacuum after the pellicle has been left to stand for 10 minutes in an atmosphere of 23 C. and 110.sup.3 Pa or less.

A pellicle characterized by having an amount of released aqueous gas of 110.sup.3 Pa.Math.L/s or less per pellicle, an amount of released hydrocarbon-based gas of 110.sup.5 Pa.Math.L/s or less per pellicle in a range of measured mass number of 45 to 100 amu, and an amount of released hydrocarbon-based gas of 410.sup.7 Pa.Math.L/s or less per pellicle in a range of measured mass number of 101 to 200 amu, under vacuum after the pellicle has been left to stand for 10 minutes in an atmosphere of 23 C. and 110.sup.3 Pa or less.

A pellicle characterized by having an amount of released aqueous gas of 110.sup.3 Pa.Math.L/s or less per pellicle, an amount of released hydrocarbon-based gas of 110.sup.5 Pa.Math.L/s or less per pellicle in a range of measured mass number of 45 to 100 amu, and an amount of released hydrocarbon-based gas of 410.sup.7 Pa.Math.L/s or less per pellicle in a range of measured mass number of 101 to 200 amu, under vacuum after the pellicle has been left to stand for 10 minutes in an atmosphere of 23 C. and 110.sup.3 Pa or less.

A pellicle characterized by having an amount of released aqueous gas of 110.sup.3 Pa.Math.L/s or less per pellicle, an amount of released hydrocarbon-based gas of 110.sup.5 Pa.Math.L/s or less per pellicle in a range of measured mass number of 45 to 100 amu, and an amount of released hydrocarbon-based gas of 410.sup.7 Pa.Math.L/s or less per pellicle in a range of measured mass number of 101 to 200 amu, under vacuum after the pellicle has been left to stand for 10 minutes in an atmosphere of 23 C. and 110.sup.3 Pa or less.

Methods of manufacturing a membrane assembly where, in one arrangement, a stack includes a planar substrate and at least one membrane layer. The planar substrate includes an inner region, a border region around the inner region, a bridge region around the border region and an edge region around the bridge region. The inner region and a first portion of the bridge region are removed. The membrane assembly after removal has: a membrane formed from the at least one membrane layer, a border holding the membrane, the border formed from the border region, an edge section around the border, the edge section formed from the edge region, a bridge between the border and the edge section, the bridge formed from the at least one membrane layer and a second portion of the bridge region. The method further involves separating the edge section from the border by cutting or breaking the bridge.

Methods of manufacturing a membrane assembly where, in one arrangement, a stack includes a planar substrate and at least one membrane layer. The planar substrate includes an inner region, a border region around the inner region, a bridge region around the border region and an edge region around the bridge region. The inner region and a first portion of the bridge region are removed. The membrane assembly after removal has: a membrane formed from the at least one membrane layer, a border holding the membrane, the border formed from the border region, an edge section around the border, the edge section formed from the edge region, a bridge between the border and the edge section, the bridge formed from the at least one membrane layer and a second portion of the bridge region. The method further involves separating the edge section from the border by cutting or breaking the bridge.

A method for manufacturing an extreme ultraviolet (EUV) pellicle structure may include preparing a pellicle membrane that includes an intermediate layer structure in which EUV transmission layers and heat dissipation layers are alternately stacked, a first thin layer disposed on a top surface of the intermediate layer structure, and a second thin layer disposed on a bottom surface of the intermediate layer structure and having a heat emissivity lower than that of the first thin layer, and disposing a cooling structure for absorbing heat from the pellicle membrane on an edge sidewall of the pellicle membrane at which the heat dissipation layers are exposed.

A method for manufacturing an extreme ultraviolet (EUV) pellicle structure may include preparing a pellicle membrane that includes an intermediate layer structure in which EUV transmission layers and heat dissipation layers are alternately stacked, a first thin layer disposed on a top surface of the intermediate layer structure, and a second thin layer disposed on a bottom surface of the intermediate layer structure and having a heat emissivity lower than that of the first thin layer, and disposing a cooling structure for absorbing heat from the pellicle membrane on an edge sidewall of the pellicle membrane at which the heat dissipation layers are exposed.

The present invention provides a pellicle frame which can effectively inhibit deformation of an exposure master plate (8) caused by affixing the pellicle (1), and which does not have a complex shape, and a pellicle which uses said pellicle frame are provided. The pellicle frame with an anodized film on a surface of an aluminum alloy frame is characterized in that: the aluminum alloy frame comprises an aluminum alloy which contains Ca: 5.0 to 10.0% by weight with the remainder aluminum and unavoidable impurities are contained, and has an area (volume) ratio of an Al.sub.4Ca phase, which is a dispersed phase, is greater than or equal to 25%, and a crystal structure of a part of the Al.sub.4Ca phase is monoclinic; wherein the anodized film contains Al.sub.4Ca particles.

The present invention provides a pellicle frame which can effectively inhibit deformation of an exposure master plate (8) caused by affixing the pellicle (1), and which does not have a complex shape, and a pellicle which uses said pellicle frame are provided. The pellicle frame with an anodized film on a surface of an aluminum alloy frame is characterized in that: the aluminum alloy frame comprises an aluminum alloy which contains Ca: 5.0 to 10.0% by weight with the remainder aluminum and unavoidable impurities are contained, and has an area (volume) ratio of an Al.sub.4Ca phase, which is a dispersed phase, is greater than or equal to 25%, and a crystal structure of a part of the Al.sub.4Ca phase is monoclinic; wherein the anodized film contains Al.sub.4Ca particles.