Disclosed are a mask assembly, and a method for assembling the same. The mask assembly includes: a frame including a hollow area; a mask arranged across the hollow area, wherein two opposite ends of the mask are fixed on the frame; and first support sheets configured to support the mask, wherein the first support sheets include first sub-support sheets and second sub-support sheets stacked over each other, the first sub-support sheets and the second sub-support sheets are arranged across the hollow area of the frame, and two opposite ends of each of the first sub-support sheets, and two opposite ends of each of the second sub-support sheets are fixed on the frame; wherein orthographic projections of the first sub-support sheets onto the second sub-support sheets lie into the second sub-support sheets; and the thickness of the second sub-support sheets is smaller than the thickness of the first sub-support sheets.

Disclosed are a mask assembly, and a method for assembling the same. The mask assembly includes: a frame including a hollow area; a mask arranged across the hollow area, wherein two opposite ends of the mask are fixed on the frame; and first support sheets configured to support the mask, wherein the first support sheets include first sub-support sheets and second sub-support sheets stacked over each other, the first sub-support sheets and the second sub-support sheets are arranged across the hollow area of the frame, and two opposite ends of each of the first sub-support sheets, and two opposite ends of each of the second sub-support sheets are fixed on the frame; wherein orthographic projections of the first sub-support sheets onto the second sub-support sheets lie into the second sub-support sheets; and the thickness of the second sub-support sheets is smaller than the thickness of the first sub-support sheets.

Provided is a pellicle for exposure to extreme ultraviolet light (EUVL) according to an example embodiment, and the pellicle includes a pellicle membrane; and a frame attached to the pellicle membrane, wherein the pellicle membrane includes a carbon-based main layer that has a first surface and a second surface, which are two surfaces opposite to each other; and a boron-based enhancement layer covering at least one surface selected from the first surface and the second surface. The pellicle according to an example embodiment may be used for an extended period of time in an extreme ultraviolet light exposure environment.

Provided is a pellicle for exposure to extreme ultraviolet light (EUVL) according to an example embodiment, and the pellicle includes a pellicle membrane; and a frame attached to the pellicle membrane, wherein the pellicle membrane includes a carbon-based main layer that has a first surface and a second surface, which are two surfaces opposite to each other; and a boron-based enhancement layer covering at least one surface selected from the first surface and the second surface. The pellicle according to an example embodiment may be used for an extended period of time in an extreme ultraviolet light exposure environment.

The present invention provides a pellicle frame which can effectively inhibit deformation of an exposure master plate (8) caused by affixing the pellicle (1), and which does not have a complex shape, and a pellicle which uses said pellicle frame are provided. The pellicle frame with an anodized film on a surface of an aluminum alloy frame is characterized in that: the aluminum alloy frame comprises an aluminum alloy which contains Ca: 5.0 to 10.0% by weight with the remainder aluminum and unavoidable impurities are contained, and has an area (volume) ratio of an Al.sub.4Ca phase, which is a dispersed phase, is greater than or equal to 25%, and a crystal structure of a part of the Al.sub.4Ca phase is monoclinic; wherein the anodized film contains Al.sub.4Ca particles.

The present invention provides a pellicle frame which can effectively inhibit deformation of an exposure master plate (8) caused by affixing the pellicle (1), and which does not have a complex shape, and a pellicle which uses said pellicle frame are provided. The pellicle frame with an anodized film on a surface of an aluminum alloy frame is characterized in that: the aluminum alloy frame comprises an aluminum alloy which contains Ca: 5.0 to 10.0% by weight with the remainder aluminum and unavoidable impurities are contained, and has an area (volume) ratio of an Al.sub.4Ca phase, which is a dispersed phase, is greater than or equal to 25%, and a crystal structure of a part of the Al.sub.4Ca phase is monoclinic; wherein the anodized film contains Al.sub.4Ca particles.

The present invention relates to a pellicle frame including a frame base, a black anodized film formed on a surface of the frame base and having a thickness of 2.0 to 7.5 m, and a transparent polymer electrodeposition coating film formed on the anodized film, and a production method thereof; and to a pellicle including the pellicle frame and a pellicle film provided on one end face of the pellicle frame.

The present invention relates to a pellicle frame including a frame base, a black anodized film formed on a surface of the frame base and having a thickness of 2.0 to 7.5 m, and a transparent polymer electrodeposition coating film formed on the anodized film, and a production method thereof; and to a pellicle including the pellicle frame and a pellicle film provided on one end face of the pellicle frame.

There is provided a pellicle for lithography which has a unique frame in that it has externally protruding (projecting) portions; to the lower end faces of these protruding portions the photomask-bonding agglutinant layer is applied so as to allow a reduction in the area of the lower end face of the pellicle frame to which conventionally the agglutinant layer was endlessly applied, whereby the pellicle induced deformation to the photomask is mitigated.

There is provided a pellicle for lithography which has a unique frame in that it has externally protruding (projecting) portions; to the lower end faces of these protruding portions the photomask-bonding agglutinant layer is applied so as to allow a reduction in the area of the lower end face of the pellicle frame to which conventionally the agglutinant layer was endlessly applied, whereby the pellicle induced deformation to the photomask is mitigated.