A pellicle assembly for large-size photomasks including a frame member configured to be affixed to a large-size photomask substrate, a substantially rigid and transparent pellicle membrane affixed to the frame member so as to protect at least a portion of the large-size photomask substrate from contamination during usage, storage and/or transport, and a coating on at least one of top and bottom surfaces of the pellicle membrane that binds the pellicle membrane to prevent separation of pellicle membrane material in the event of breakage.

Proposed is a pellicle for extreme ultraviolet (EUV) lithography based on a nanotube and having good optical properties, thermal stability, mechanical stability and chemical durability. The pellicle may include a frame having an opening formed in a central portion, and a pellicle membrane supported by the frame and covering the opening. The pellicle membrane may be formed in a reticular structure based on nanotubes, and include a coating layer formed by coating at least part of the nanotubes with a metal or metal compound. The metal or metal compound may be based on at least one of Mo, Si, Zr, Nb, Ru, Y, La, or Ce, or any alloy thereof.

Proposed is a pellicle for extreme ultraviolet (EUV) lithography based on a nanotube and having good optical properties, thermal stability, mechanical stability and chemical durability. The pellicle may include a frame having an opening formed in a central portion, and a pellicle membrane supported by the frame and covering the opening. The pellicle membrane may be formed in a reticular structure based on nanotubes, and include a coating layer formed by coating at least part of the nanotubes with a metal or metal compound. The metal or metal compound may be based on at least one of Mo, Si, Zr, Nb, Ru, Y, La, or Ce, or any alloy thereof.

A method for forming a structure of a pellicle-mask structure is provided. The method includes forming a mask pattern on a mask substrate. The method also includes bonding a pellicle frame to the mask pattern through a pellicle frame adhesive. The method further includes forming a vent structure in the pellicle frame. In addition, the method includes bonding a pellicle membrane to the pellicle frame. The pellicle membrane includes a peripheral portion over the pellicle frame and a top membrane portion over the peripheral portion, and a lateral width of the peripheral portion of the pellicle membrane is greater than a lateral width of the pellicle frame adhesive.

A method for forming a structure of a pellicle-mask structure is provided. The method includes forming a mask pattern on a mask substrate. The method also includes bonding a pellicle frame to the mask pattern through a pellicle frame adhesive. The method further includes forming a vent structure in the pellicle frame. In addition, the method includes bonding a pellicle membrane to the pellicle frame. The pellicle membrane includes a peripheral portion over the pellicle frame and a top membrane portion over the peripheral portion, and a lateral width of the peripheral portion of the pellicle membrane is greater than a lateral width of the pellicle frame adhesive.

A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.

A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.

A pellicle for a reflective photo mask includes a frame, a core layer having a front surface and a rear surface, and disposed over the frame, a first capping layer disposed on the front surface of the core layer, an anti-reflection layer disposed on the first capping layer, a barrier layer disposed on the anti-reflection layer, and a heat emissive layer disposed on the barrier layer.

A pellicle for a reflective photo mask includes a frame, a core layer having a front surface and a rear surface, and disposed over the frame, a first capping layer disposed on the front surface of the core layer, an anti-reflection layer disposed on the first capping layer, a barrier layer disposed on the anti-reflection layer, and a heat emissive layer disposed on the barrier layer.

A robust, high-transmission pellicle for extreme ultraviolet lithography systems is disclosed. In one example, the present disclosure provides a pellicle that includes a membrane and a frame supporting the membrane. The membrane may be formed from at least one of a transparent carbon-based film and a transparent silicon based film. The at least one of the transparent carbon-based film and the transparent silicon based film may further be coated with a protective shell. The frame may include at least one aperture to allow for a flow of air through a portion of the pellicle.