Provided is a black partition wall pattern film that comprises: a transparent substrate; an electrode layer provided on the transparent substrate; a black partition wall pattern provided on the electrode layer; and a black UV-curable resin layer provided in a region of the electrode layer where no black partition wall pattern is provided.

A mask, a display panel, and an electronic equipment are provided. The mask allows an opening pattern to be moved to a side of a repeat region. Based on this structure, the display panels with the same resolution and different sizes may use the masks with the same size, and differences between these masks are merely different distances between the opening patterns and edges of the repeat regions, thus solving at least one technical problem existing in conventional 8K electronic equipment that the masks with the different sizes require to be manufactured for the display panels with the different sizes.

Provided are: a photosensitive resin composition including a dye containing a mixture of (A-1) a compound represented by a particular chemical formula and a shell surrounding same, (A-2) a compound represented by another particular chemical formula and a shell surrounding same, and (A-3) a compound represented by still another particular chemical formula and a shell surrounding same; a photosensitive resin film prepared using the composition; a color filter including the photosensitive resin film; and a display device including the color filter.

The present disclosure provides a quantum dot color filter, a fabrication method thereof, a display panel and a display device, and belongs to the field of display technology. The quantum dot color filter of the present disclosure includes a quantum dot functional layer configured to emit light of a certain color under excitation of excitation light. The quantum dot functional layer has a hollowed-out portion, which exposes a side surface of the quantum dot functional layer, so that the excitation light is able to arrive at the side surface.

An embodiment of the present disclosure provides a display substrate. The display substrate includes a driver backplane, and a reflective structure and a pixel electrode on the driver backplane. Reflective structure and the pixel electrode are disposed sequentially away from the driver backplane along a thickness direction of the driver backplane. The pixel electrode is connected to the driver backplane through the reflective structure. A surface of the reflective structure away from the driver backplane is a reflective surface comprising a plurality of arc surfaces, and each of the plurality of arc surfaces is convex protruding towards a direction away from the driver backplane. The plurality of the arc surfaces are continuously arranged, and any two adjacent arc surfaces of the plurality of the arc surfaces are connected to each other.

The present specification relates to a compound represented by Chemical Formula 1, a photoresist fluorescent resin composition including the same, and a color conversion film manufactured using the same, a backlight unit and a display apparatus.

The present invention provides a photosensitive composition with which a cured film having excellent patterning properties and excellent electrode anticorrosion properties can be produced. In addition, it also provides a cured film formed of the photosensitive composition, a color filter, a light shielding film, an optical element, a solid-state imaging element, an infrared sensor, and a headlight unit.

The photosensitive composition of the present invention contains a zirconium nitride-based particle containing one or more selected from the group consisting of zirconium nitride and zirconium oxynitride a resin, a polymerizable compound, and a photopolymerization initiator, in which the zirconium nitride-based particle contains 0.001% to 0.400% by mass of a Fe atom with respect to a total mass of the zirconium nitride-based particle.

The invention aims to provide a cured film that is high in sensitivity, able to form a pattern having a small-tapered shape after a development step and after a heat curing step, helpful to depress the difference in the width of patterned openings between before and after the heat curing step, and high in light-shielding capability and also aims to provide a negative type photosensitive resin composition that serves for the production thereof. The negative type photosensitive resin composition includes an alkali-soluble resin (A), a radical polymerizable compound (B), a photo initiator (C1), and a black colorant (Da); the alkali-soluble resin (A) including a first resin (A1) containing one or more selected from the group consisting of polyimide (A1-1), polyimide precursor (A1-2), polybenzoxazole (A1-3), polybenzoxazole precursor (A1-4), and polysiloxane (A1-5); and the radical polymerizable compound (B) including one or more selected from the group consisting of a fluorene backbone-containing radical polymerizable compound (B1) and an indane backbone-containing radical polymerizable compound (B2).

Provided are patterned films comprising nanostructures and one or more UV-cured monomers. Also provide are methods of making the patterned films, and electroluminescent devices comprising the patterned films.

Provided are a photosensitive coloring composition including a pigment and a diketopyrrolopyrrole compound A represented by Formula 1, in which, in a case where molar contents of the diketopyrrolopyrrole compound A and a diketopyrrolopyrrole compound B represented by Formula 1 are each denoted by m.sup.A and m.sup.B, a value of m.sup.A/(m.sup.A+m.sup.B) is 10 mol % to 100 mol %, and a content of the pigment is 35% by mass or more with respect to a total solid content of the photosensitive coloring composition; a cured substance of the photosensitive coloring composition, a color filter including the cured substance, a solid-state imaging element or an image display device, and a novel asymmetric diketopyrrolopyrrole compound.

Diketopyrrolopyrrole compound A: A.sup.1 represents a monovalent organic group having an acidic or a basic functional group, and B.sup.1 represents a monovalent organic group not having an acidic or a basic functional group.

Diketopyrrolopyrrole compound B: A.sup.1 and B.sup.1 represent monovalent organic groups having an acidic or a basic functional group.

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