G03F7/0007

PHOTOSENSITIVE COMPOSITION, NEGATIVE PHOTOSENSITIVE COMPOSITION, PIXEL DIVISION LAYER AND ORGANIC EL DISPLAY DEVICE

The present invention provides a photosensitive composition which can suppress the generation of a development residue on the surface of an electrode and the corrosion of the electrode to form a black pixel division layer, and also can suppress the generation of off-pixel in an organic EL display device comprising the pixel division layer. Disclosed is a photosensitive composition comprising (a) a pigment, (b) a resin having two or more tertiary amino groups in the molecule, and (c) a photosensitive agent, wherein the component (b) contains a resin having a structure represented by the general formula (1).

NEGATIVE RESIST COMPOSITION

It is an object of the present invention to provide a negative resist composition that is useful for producing a color filter with a high transmittance of light at a wavelength of 440 nm. A negative resist composition of the present invention comprises a colorant and a resin, wherein the colorant contains a xanthene dye, and a cured film formed from the negative resist composition exhibits a spectrum that satisfies the following condition 1: [condition 1] a maximum absorption wavelength is present in a wavelength range of 500 to 580 nm, and based on a transmittance at the maximum absorption wavelength being 5%, a transmittance at a wavelength of 440 nm is 80% or more and a transmittance at a wavelength of 620 nm is 80% or more.

COLORING COMPOSITION, FILM, OPTICAL FILTER, SOLID-STATE IMAGING ELEMENT AND IMAGE DISPLAY DEVICE

A coloring composition includes at least one compound S selected from a compound S-1 represented by Formula (1) or a compound S-2 in which the compound S-1 is coordinated to a metal atom, a pigment, a resin, and a solvent

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COLORING COMPOSITION, FILM, OPTICAL FILTER, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, AND COMPOUND

A coloring composition includes at least one compound S selected from a compound S-1 represented by Formula (1) or a compound S-2 in which the compound S-1 is coordinated to a metal atom, a pigment, a resin P, and a solvent, in which the resin P includes at least one selected from a graft resin P-1 having a specific graft chain, a block copolymer P-2 including a specific structure, or a resin P-3 in which at least one terminal of a polymer chain including a specific structure is capped with an acid group.

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Compound, ink, resist composition for color filter, sheet for heat-sensitive transfer recording, and toner

An object of the present invention is to provide a compound exhibiting a cyan color having properties such as high chroma, high light fastness, and high solubility. The compound is represented by the following General Formula (1). ##STR00001##
In Formula (1), R.sub.1 and R.sub.2 each independently represent a linear, branched, or cyclic alkyl group having 6 or more and 12 or fewer carbon atoms, R.sub.3 represents a 4-alkylphenyl group, a 4-halogenated phenyl group, or a 3-alkoxyphenyl group, R.sub.4 represents a linear, branched, or cyclic alkyl group having 1 or more and 8 or fewer carbon atoms, and R.sub.5 represents a linear, branched, or cyclic alkyl group having 1 or more and 8 or fewer carbon atoms or a benzyl group.

Colored resin composition, colored film, color filter and liquid crystal display device

A colored resin composition containing an alkali-soluble resin (A), a colorant (B), an organic solvent (C), and a photosensitizer (D), the colored resin composition containing at least a zirconia compound particle as the colorant (B), wherein the zirconia compound particle contains zirconium nitride having a crystallite size of 10 nm or more and 60 nm or less, and the crystallite size is determined from a half width of a peak derived from a (111) plane in an X-ray diffraction spectrum using a CuKα ray as an X-ray source. The present invention provides a highly sensitive colored resin composition by improving light transmissivity in the ultraviolet region (wavelength 365 nm) generally used in photolithography and by improving a light shielding property in the visible region.

High-resolution shadow masks

A shadow mask for patterned vapor deposition of an organic light-emitting diode (OLED) material includes a ceramic membrane under tensile stress with a plurality of through-apertures forming an aperture array through which a vaporized deposition material can pass. A multilayer peripheral support is attached to a rear surface with a hollow portion beneath the aperture array. A compressively-stressed interlayer balances the tensile stress of the ceramic membrane. A shadow mask module with multiple shadow masks is also provided and includes a rigid carrier having plural windows with a shadow mask positioned in each window. To make the module, shadow mask blanks are affixed to each carrier window followed by etching of apertures and support layers. In this way extremely flat masks with precise aperture patterns are formed.

Quantum dots, composites, and device including the same

A quantum dot, and a quantum dot composite and a device including the same, wherein the quantum dot includes a seed including a first semiconductor nanocrystal, a quantum well layer disposed on the seed and a shell disposed on the quantum well layer, the shell including a second semiconductor nanocrystal, and wherein the quantum dot does not include cadmium, wherein the first semiconductor nanocrystal includes a first zinc chalcogenide, wherein the second semiconductor nanocrystal includes a second zinc chalcogenide, and the quantum well layer includes an alloy semiconductor nanocrystal including indium (In), phosphorus (P), and gallium (Ga), and wherein a bandgap energy of the alloy semiconductor nanocrystal is less than a bandgap energy of the first semiconductor nanocrystal and less than a bandgap energy of the second semiconductor nanocrystal.

COLOR FILTER SUBSTRATE, MANUFACTURING METHOD THEREOF, AND LIQUID CRYSTAL DISPLAY PANEL

A color filter substrate and a display panel are provided. A photoresist layer is provided in a peripheral region of the color filter substrate. A plurality of photoresist layers are stacked on each other to optimize a film structure of the color filter substrate, enhance a support of a film, and reduce a degree of depression in the peripheral region in an ODF process. The color filter substrate with optimized film structure has simple manufacturing process, and quality of the display panel can be improved without changing a structural design of a display region of an original film.

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM PREPARED USING SAME, AND DISPLAY DEVICE
20230122600 · 2023-04-20 ·

Provided are a photosensitive resin composition including (A) a binder resin including a first binder resin and a second binder resin, (B) a photopolymerizable monomer, (C) a photopolymerization initiator, (D) a black inorganic pigment, (E) an inorganic scatterer, and (F) a solvent, wherein the first binder resin has a higher refractive index than the second binder resin, the first binder resin is included in an amount equal to or less than that of the second binder resin, and a primary particle diameter of the black inorganic pigment is less than or equal to 45 nm, a photosensitive resin layer using the same, and a display device including the photosensitive resin layer.