Provided herein is a process for preparing triaryl organoborates of the formula 1/n K.sup.n+R.sub.3.sup.4B.sup.−—R.sup.1 (IV), where one equivalent of organoboronic ester of the formula B—R.sup.1(OR.sup.2)(OR.sup.3) (I) is initially charged together with 1/n equivalents of salt K.sup.n+ nX.sup.− (II) and 3 equivalents of metal M in a solvent or a solvent mixture S1, 3 equivalents of a haloaromatic R.sup.4—Y (III) are added, an auxiliary L and optionally a second organic solvent or solvent mixture S2 is added and the compound 1/n K.sup.n+ R.sub.3.sup.4B.sup.−—R.sup.1 (IV) is separated off with the organic phase, and to the use of these substances as co-initiator in photopolymer formulations.

Provided herein is a process for preparing triaryl organoborates proceeding from alkyl or cycloalkyl boronates in the presence of an n-valent cation 1/n K.sup.n+ to obtain organoborates of the formula 1/n K.sup.n+R.sub.3.sup.4B.sup.−—R.sup.1 (IV), where one equivalent of organoboronic ester of the formula B—R.sup.1(OR.sup.2)(OR.sup.3) (I) is initially charged together with 1/n equivalents of salt K.sup.n+ nX.sup.− (II) and 3 equivalents of metal M in a solvent or a solvent mixture, 3 equivalents of a haloaromatic R.sup.4—Y (III) are added, and optionally a second organic solvent water is added and the compound 1/n K.sup.n+ R.sub.2.sup.4B.sup.−—R.sup.1 (IV) is separated off with the organic phase, and to the use of these substances as co-initiator in photopolymer formulations.

The present invention, in one aspect, relates to monomers and photopolymers that exhibit a high refractive index. The photopolymers of the invention have properties suitable for fabricating holographic optical elements (HOEs).

A photopolymer composition comprising a polymer matrix or a precursor thereof including a reaction product between (i) a (meth)acrylate-based (co)polymer in which a silane-based functional group is located in a branched chain and an equivalent weight of the silane-based functional group is 300 g/eq to 2000 g/eq, and (ii) a linear silane crosslinking agent; a photoreactive monomer; and a photoinitiator, a hologram recording medium using the same, an optical element using the hologram recording medium, and a holographic recording method. The photopolymer composition can more easily provide a photopolymer layer having improved durability against temperature and humidity while having a large refractive index modulation value.

The present invention relates to a compound having a novel structure, a photopolymer composition including the compound as a dye, a hologram recording medium produced from the photopolymer composition, an optical element including the hologram recording medium, and a holographic recording method using the hologram recording medium.

The present disclosure relates to a hologram recording medium having one surface with a higher surface energy than a polymer resin layer containing at least one polymer selected from the group consisting of triacetyl cellulose, alicyclic olefin polymer and polyethylene terephthalate, a hologram recording medium wherein the surface energy of any one surface is 50 mN/m or more, and an optical element comprising the hologram medium.

A template includes: a base material having a surface including a first pattern, a second pattern and a third pattern, the first pattern including a first recess, the second pattern including a second recess. The base material containing a first material having a first refractive index; a first layer disposed in the first recess and containing a second material, the second material having a second refractive index different from the first refractive index; and a second layer disposed in the second recess, containing the second material, and being thicker than the first layer.

The present invention belongs to the field of functional materials, and particularly relates to a directly printable image recording material, a preparation method and application thereof. The image recording material comprises 25 to 78.8 parts by mass of a photopolymerizable monomer, 0.2 to 5 parts by mass of a photoinitiator, 20 to 70 parts by mass of an inert component, and 0.05 to 2 parts by mass of a thermal polymerization inhibitor, and has an initial viscosity of 200 to 800 mPa.Math.s. The photopolymerizable monomer includes a thiol monomer and an olefin monomer, at least one of which is a silicon-based monomer with polyhedral oligomeric silsesquioxane as a silicon core. By introducing a POSS-based thiol or olefin monomer into the photopolymerizable monomer in combination with other material components, the recording material is allowed to have an initial viscosity of 200 to 800 mPa.Math.s, and meanwhile, the low thermal conductivity characteristic of the POSS-based photopolymerizable monomer is utilized, so that image storage quality is ensured, continuous industrial production of the image recording material is achieved, the process cost is reduced and the production efficiency is improved.

A display device includes a light emitting layer and color filter arrays. The color filter arrays comprise a first color filter array of a first color, and a second color filter array of a second color. The first color filter array comprises a first pair of color filters adjacent to each other with a first clearance therebetween and a second pair of color filters adjacent to each other with a second clearance therebetween. The second color filter array comprises a first color filter positioned between the first pair of color filters and a second color filter positioned between the second pair of color filters. A width of the first clearance is larger than a width of the second clearance. A width of the first color filter is larger than a width of the second color filter. The second color filter partially overlaps with the second pair of color filters.

The embodiments of the present disclosure propose a negative refraction imaging lithographic method and equipment. The lithographic method includes: coating photoresist on a device substrate; fabricating a negative refraction imaging structure, wherein the negative refraction imaging structure exhibits optical negative refraction in response to beam emitted by exposure source; pressing a mask to be close to the negative refraction imaging structure; disposing the mask and the negative refraction imaging structure above the device substrate at a projection distance; and light emitted by the exposure source passes through the mask, the negative refraction imaging structure, the projection gap and is sequentially projected onto the photoresist for exposure.