A manufacturing system performs a lithographic patterning of a resist formed on a substrate to create a first optical grating including a plurality of structures at a first slant angle relative to the substrate. The manufacturing system performs a tunable shrinkage of the plurality of structures to adjust the first slant angle to a target slant angle different from the first slant angle. In some embodiments, the manufacturing system performs a post-processing of the plurality of structures to create a second optical grating from the first optical grating. The post-processing may adjust at least one of: a refractive index, a height, and a volume of the first optical grating.

The invention concerns a method of manufacturing a master plate for fabrication of diffractive structures, and a corresponding master plate. The method comprises providing a substrate comprising a stack of selective etch layers and providing an etch mask layer on the substrate. Further, the method comprises etching the substrate in a multi-step etching process by exposing the substrate piecewise at different mask zones of the mask layer and using said selective etch layers to produce to the substrate a height-modulated surface profile defined by the mask zones in lateral dimensions and by said stack in height dimension of the substrate, and, finally, providing a height-modulated master grating onto the surface profile, the height modulation of the master grating being at least partly defined by said surface profile of the substrate.

A diffractive optical element may include sub-wavelength period stack-and-gap structured layers providing transmissive phase delay at a wavelength. The sub-wavelength period stack-and-gap structured layers may include a set of thin anti-reflection layers that are index matched to an environment or a substrate over a range of fill factors of the sub-wavelength period.

The invention relates to a protective layer comprising a photopolymer layer B and and an at least partly cured protective layer C, to a process for producing the layer construction according to the invention, to a kit of parts, to the use of an at least partly cured protective layer C for protection of a photopolymer layer B and to optical displays and security documents comprising the layer construction according to the invention.

A method for forming a color filter array includes the step of forming a first color filter array by forming a first color filter film on a surface of a base member using a coating method and by patterning the first color filter film and the step of forming a second color filter array by forming a second color filter film on the surface so as to cover the first color filter array using a coating method and by patterning the second color filter film. The color filters in the first color filter array are uneven in the width of the clearance between the color filters and/or the widths of the color filters.

Provided are a pattern formation method and a method for manufacturing a polarizing plate using the pattern formation method, the pattern formation method having: a step for forming, on a substrate, a linear guide pattern which is arranged at a predetermined pitch and is compatible with a portion of block chains of a block copolymer, and a neutral pattern embedded in the pattern of the guide pattern; a step for forming a layer including a block copolymer on the guide pattern and the neutral pattern; a step for heat-treating the layer including the block copolymer and forming a lamellar structure in which lamellar boundaries are arranged perpendicular to the substrate by microphase separation of the block copolymer; and a step for selectively removing a portion of the block chains of the block copolymer and thereby forming a line-and-space-shaped fine pattern having a smaller pitch than the guide pattern.

A holographic recording medium composition comprising component (e): a compound having an isocyanate group or an isocyanate-reactive functional group and further having a nitroxyl radical group, wherein component (e) contains component (e-1) below: component (e-1): a compound having a heterobicyclic ring structure or a heterotricyclic ring structure, the heterobicyclic ring structure or the heterotricyclic ring structure being obtained by replacing a carbon atom in a bicyclic ring structure or a tricyclic ring structure by the nitroxyl radical group.

A diffractive optical element and method for fabricating the diffractive optical element are provided. The diffractive optical element includes a substrate, a first diffractive structure layer and a second diffractive structure layer. The substrate has a first surface and a second surface opposite to the first surface. The first diffractive structure layer is disposed on the first surface of the substrate. The second diffractive structure layer is disposed on the second surface of the substrate. In the method for fabricating the diffractive optical element, at first, the substrate is provided. Then, a first glue material layer/first semiconductor layer is formed and patterned on the first surface of the substrate. Thereafter, a second glue material layer/second semiconductor layer is formed and patterned on the second surface of the substrate.

A lithographic patterning of a resist is performed to create a mandrel over a substrate. A deposition of one or more functional materials on the mandrel is performed. And each functional material has a respective refractive index. A selective removal of the mandrel is performed to create a plurality of grating elements formed from the one or more functional materials. The plurality of grating elements are self-aligned and form a diffraction grating. Each grating element may have a heterogenous refractive index (e.g., substantial normal to and/or parallel to a surface of the substrate). The diffraction grating may be used in a near-eye display.

A diffractive optical element and method for fabricating the diffractive optical element are provided. The diffractive optical element includes a substrate, a first diffractive structure layer and a second diffractive structure layer. The substrate has a first surface and a second surface opposite to the first surface. The first diffractive structure layer is disposed on the first surface of the substrate. The second diffractive structure layer is disposed on the second surface of the substrate. In the method for fabricating the diffractive optical element, at first, the substrate is provided. Then, a first glue material layer/first semiconductor layer is formed and patterned on the first surface of the substrate. Thereafter, a second glue material layer/second semiconductor layer is formed and patterned on the second surface of the substrate.