A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group, Va.sup.1 is a divalent hydrocarbon group, n.sub.a1 represents an integer of 0 to 2, Ya.sup.0 is a carbon atom, Xa.sup.0 is a group forming a monocyclic aliphatic hydrocarbon group together with Ya.sup.0, and Ra.sup.00 is an aromatic hydrocarbon group or a specific unsaturated hydrocarbon group. In general formula (b1), R.sup.b1 represents a cyclic hydrocarbon group, Y.sup.b1 represents a divalent linking group containing an ester bond, V.sup.b1 represents an alkylene group, a fluorinated alkylene group, or a single bond, and M.sup.m+ is an m-valent organic cation. ##STR00001##

A radiation-sensitive resin composition includes: a first polymer having a first structural unit which includes a phenolic hydroxyl group, and a second structural unit which includes an acid-labile group and a carboxy group which is protected by the acid-labile group; a second polymer having a third structural unit represented by the following formula (S-1), and a fourth structural unit which is a structural unit other than the third structural unit and is represented by the following formula (S-2); and a radiation-sensitive acid generator, wherein the acid-labile group includes a monocyclic or polycyclic ring structure having no fewer than 3 and no more than 20 ring atoms.

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A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R.sup.1, R.sup.2, and R.sup.3 represents a fluorine atom or the like; and R.sup.4 and R.sup.5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R.sup.6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R.sup.6s represents a fluorine atom or the like; and R.sup.8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms.

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Disclosed are a compound represented by formula (I), a resin and a resist composition:

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wherein R.sup.1 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; L.sup.1 represents a single bond or —CO—O*; R.sup.3 represents an alkyl group, and —CH.sub.2— included in the group may be replaced by —O— or —CO; R.sup.4 represents a fluorine atom, an alkyl fluoride group or an alkyl group, and —CH.sub.2—included in the alkyl fluoride group and the alkyl group may be replaced by —O— or —CO—; R.sup.5 represents a hydrogen atom, an alkylcarbonyl group or an acid-labile group; m2 and m3 represent an integer of 1 to 3, m4 represents an integer of 0 to 2, and m5 represents 1 or 2, in which 3≤m2+m3+m4+m5≤5.

A salt represented by formula (I):

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In formula (I), R.sup.1, R.sup.2, R.sup.3 and R.sup.4 each independently represent a halogen atom or a perfluoroalkyl group having 1 to 6 carbon atoms, R.sup.5, R.sup.6 and R.sup.7 each independently represent a halogen atom, a hydroxy group, a fluorinated alkyl group having 1 to 6 carbon atoms or an alkyl group having 1 to 12 carbon atoms, and —CH.sub.2— included in the alkyl group may be replaced by —O— or —CO—, m5 represents an integer of 0 to 3, m6 represents an integer of 0 to 3, m7 represents an integer of 0 to 3, R.sup.8 and R.sup.9 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, and —CH.sub.2— included in the alkyl group may be replaced by —O— or —CO—, and AI.sup.− represents an organic anion.

The present invention relates to a fluorinated acrylate-based copolymer and to a photosensitive resin composition comprising the same. The copolymer can have excellent water repellency even with a relatively low content of fluorine by introducing a non-polar ring-containing unit, so that it can prevent coating imbalance and decreases in the pattern strength that may occur when the fluorine content is high.

A chemically amplified negative resist composition comprising an alcohol compound of specific structure as a crosslinker has a high sensitivity and dissolution contrast and forms a pattern of good profile with reduced values of LER and CDU.

Disclosed is a salt represented by formula (I): ##STR00001##
wherein, in formula (I), Q.sup.1 and Q.sup.2 each independently represent a fluorine atom or the like, R.sup.1 and R.sup.2 each independently represent a hydrogen atom or the like, Z represents an integer of 0 to 6, X.sup.1 represents *—CO—O— or the like, where * represents a bonding site to C(R.sup.1)(R.sup.2) or C(Q.sup.1)(Q.sup.2), L.sup.1 represents a single bond or a saturated hydrocarbon group, and —CH.sub.2— included in the saturated hydrocarbon group may be replaced by —O—, —S—, —SO.sub.2— or —CO—, A.sup.1 represents a divalent alicyclic hydrocarbon group which may have a substituent, R.sup.a represents a cyclic hydrocarbon group which may have a substituent, and Z.sup.+ represents an organic cation.

[Problem] Providing a thick film resist composition capable of reducing environmental impact. [Means for Solution] A thick film resist composition comprising polymer (A), a deprotecting agent (B), a photoreaction quencher (C) composed of a certain cation and an anion, and a solvent (D).

Provided is a polymer capable of forming a resist pattern in which pattern top loss is inhibited when used as a main chain scission-type positive resist. The polymer includes a monomer unit (A) represented by general formula (I), shown below, and a monomer unit (B) represented by general formula (II), shown below, and the proportion of components having a molecular weight of 100,000 or more in the polymer is 10% or more. In general formula (I), X is a fluorine, chlorine, bromine, iodine, or astatine atom, and R.sup.1 is an organic group including 3 to 7 fluorine atoms. In general formula (II), R.sup.2 is a hydrogen atom, fluorine atom, unsubstituted alkyl group, or fluorine atom-substituted alkyl group, R.sup.3 is a hydrogen atom, unsubstituted alkyl group, or fluorine atom-substituted alkyl group, p and q are integers of 0 to 5, and p+q=5.

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