A positive photosensitive resin composition may include (a) polysiloxane, and (b) a naphthoquinone diazide compound represented by formula (1):

##STR00001##

(in the formula (1), R.sup.1 is an alkyl group having 1 to 8 carbon atoms; Q is a naphthoquinone diazide sulfonyl group represented by the structure shown below or a hydrogen atom, and at least one of all Qs in the formula (1) is a naphthoquinone diazide sulfonyl group: n is an integer of 0 to 4; m is an integer of 4 to 8; and X is a tetravalent to octavalent organic group having 4 to 30 carbon atoms)

##STR00002##

(in the above structure, * represents a binding site).

According to one exemplary embodiment, a method includes exposing one or more portions of an additive manufacturing resin to light; where the light includes a wavelength configured to cause a photo polymerizable compound in the additive manufacturing resin to polymerize; and the one or more portions of the additive manufacturing resin are defined by a three-dimensional pattern. Moreover, a method of forming an additive manufacturing resin suitable for fabricating a click-chemistry compatible composition of matter includes: reacting a compound comprising a terminal alkyne group or a terminal azide group with a protecting reagent to form a protected reactive diluent precursor, reacting the precursor with a second compound to form a protected reactive diluent; and mixing the protected reactive diluent with a photo polymerizable compound.

According to one exemplary embodiment, a method includes exposing one or more portions of an additive manufacturing resin to light; where the light includes a wavelength configured to cause a photo polymerizable compound in the additive manufacturing resin to polymerize; and the one or more portions of the additive manufacturing resin are defined by a three-dimensional pattern. Moreover, a method of forming an additive manufacturing resin suitable for fabricating a click-chemistry compatible composition of matter includes: reacting a compound comprising a terminal alkyne group or a terminal azide group with a protecting reagent to form a protected reactive diluent precursor, reacting the precursor with a second compound to form a protected reactive diluent; and mixing the protected reactive diluent with a photo polymerizable compound.

A material for forming a superfine pattern, a photosensitive resin composition, a pattern treatment composition and a formation method of superfine pattern are provided. The material for forming a superfine pattern includes a first layer and a second layer. The first layer includes a photosensitive resin composition (I). The photosensitive resin composition (I) includes an alkali-soluble phenol formaldehyde resin (A), a sensitizer (B), a hydroxyl-containing additive (C) and an organic solvent (D). The second layer includes a pattern treatment composition (II). The pattern treatment composition (II) includes a crosslinking agent (M), a water-soluble resin (N), a thermal acid generator (P) and water (Q). The hydroxyl-containing additive (C) includes a compound represented by following Formula (C-1). The crosslinking agent (M) includes a melamine-based crosslinking agent.

##STR00001##

In Formula (C-1), the definition of R.sup.1 to R.sup.4 is the same as defined in the detailed description.