A structure including a graphene electrode and a molecular monolayer, a flexible electronic device, and a method of production thereof are provided. The structure includes a first graphene electrode and a molecular monolayer disposed on the first graphene electrode and chemically or physically bound to the first graphene electrode.

Diazo-resin-containing photoresist compositions and methods of preparing the same are provided for solving the problem that existing diazo-resins cannot be applied in LCD photoresists because the storage periods of the diazo-resins themselves and the printed boards made thereby are both short due to poor thermal stability of the diazo-resins. The diazo-resins of the present invention have excellent thermal stability and exhibit strong resistance to dry etching when being used in negative photoresists, while high resolution can be achieved. Meanwhile, during exposure, portions of the diazo-resins can crosslink with hydrogen bonds on surface of SiO or SiON film forming a barrier layer or passivation layer, such that the adhesion between the photoresists and the film layer is increased, and the photoresists would not peel during development. Thus, the utilization of tackifiers for enhancing the adhesion between a photoresist and surface of SiO or SiON film before masking can be omitted.

A photosensitive resin composition which gives a cured film having high light shielding properties and enables stable curing by baking at low temperature, a cured film obtained by curing the composition, a display device provided with the cured film, and a pattern forming method using the composition. A light shielding film-forming process which does not impart thermal damage to a light-emitting element with respect to a substrate provided with a light-emitting element. In a photosensitive resin composition including a binder resin, a photopolymerizable compound, a photopolymerization initiator, a coloring agent, and a thermosetting compound, a carbon black and/or an inorganic black pigment, and an organic pigment are used in combination as the coloring agent, and a photosensitive resin composition in which T2/T1 is 0.80 or more is used.

A photoresist polymer comprising a first repeating unit including a halogen donor group and a second repeating unit including a protecting group connected by a sulfide bond.

A photoresist polymer comprising a first repeating unit including a halogen donor group and a second repeating unit including a protecting group connected by a sulfide bond.

A photoresist polymer comprising a first repeating unit including a halogen donor group and a second repeating unit including a protecting group connected by a sulfide bond.

A photoresist polymer comprising a first repeating unit including a halogen donor group and a second repeating unit including a protecting group connected by a sulfide bond.

A photoresist polymer comprising a first repeating unit including a halogen donor group and a second repeating unit including a protecting group connected by a sulfide bond.

A polymer, an organic layer composition, and a method of forming patterns, the polymer including a structural unit represented by Chemical Formula 1 or Chemical Formula 2:

##STR00001##

A polymer, an organic layer composition, and a method of forming patterns, the polymer including a structural unit represented by Chemical Formula 1 or Chemical Formula 2:

##STR00001##