This disclosure relates to dielectric film forming composition containing at least one fully imidized polyimide polymer; at least one inorganic filler; at least one metal-containing (meth)acrylate compound; and at least one catalyst. The dielectric film formed by such a composition can have a relatively low coefficient of thermal expansion (CTE) and a relatively high optical transparency.

This disclosure relates to dielectric film forming compositions containing a) at least one fully imidized polyimide polymer; b) at least one metal-containing (meth)acrylates; c) at least one catalyst; and d) at least one solvent, as well as related processes and related products. The compositions can form a dielectric film that generates substantially no debris when the dielectric film is patterned by laser ablation process.

This disclosure enables direct 3D printing of preceramic polymers, which can be converted to fully dense ceramics. Some variations provide a preceramic resin formulation comprising a molecule with two or more CX double bonds or CX triple bonds, wherein X is selected from C, S, N, or O, and wherein the molecule further comprises at least one non-carbon atom selected from Si, B, Al, Ti, Zn, P, Ge, S, N, or O; a photoinitiator; a free-radical inhibitor; and a 3D-printing resolution agent. The disclosed preceramic resin formulations can be 3D-printed using stereolithography into objects with complex shape. The polymeric objects may be directly converted to fully dense ceramics with properties that approach the theoretical maximum strength of the base materials. Low-cost structures are obtained that are lightweight, strong, and stiff, but stable in the presence of a high-temperature oxidizing environment.

This disclosure enables direct 3D printing of preceramic polymers, which can be converted to fully dense ceramics. Some variations provide a preceramic resin formulation comprising a molecule with two or more CX double bonds or CX triple bonds, wherein X is selected from C, S, N, or O, and wherein the molecule further comprises at least one non-carbon atom selected from Si, B, Al, Ti, Zn, P, Ge, S, N, or O; a photoinitiator; a free-radical inhibitor; and a 3D-printing resolution agent. The disclosed preceramic resin formulations can be 3D-printed using stereolithography into objects with complex shape. The polymeric objects may be directly converted to fully dense ceramics with properties that approach the theoretical maximum strength of the base materials. Low-cost structures are obtained that are lightweight, strong, and stiff, but stable in the presence of a high-temperature oxidizing environment.

The invention relates to a method for the preparation of a coating comprising at least one coating layer on a substrate, the method comprising the steps of a. providing monomers of the type R(N).sub.x-(L).sub.m-(CC).sub.n-(L).sub.o-(N).sub.yR, wherein R is a head moiety, R is a tail moiety, (CC).sub.n is an oligoyne moiety, L and L are linker moieties, N and N independently are branched or unbranched optionally substituted C.sub.1-C.sub.25 alkyl moieties optionally containing 1 to 5 heteroatoms, x, m, o, and y are independently 0 or 1, n is 4 to 12, and wherein the head moiety allows for an interaction with the surface of the substrate; b. bringing the monomers into contact with the substrate wherein the interaction of the head moieties of the monomers with the surface of the substrate induces at least a part of the monomers to align in a defined manner thereby forming a film on the surface and bringing the oligoyne moieties of the monomers into close contact with each other; c. inducing a reaction between oligoyne moieties by providing an external stimulus so as to at least partially cross-link the aligned monomers, thereby forming a coating layer on the substrate. The invention further relates to a coating obtainable according to the method of the invention, the use of a coating obtainable according to the method of the invention, a substrate comprising a coating obtainable according to the invention and the use of solid substrate. The invention further relates to a method for the synthesis of the monomers according to the invention.

According to several embodiments, a composition of matter includes: a three-dimensional structure comprising photo polymerized molecules. At least some of the photo polymerized molecules further comprise one or more protected click-chemistry compatible functional groups; and at least portions of one or more surfaces of the three-dimensional structure are functionalized with one or more of the protected click-chemistry compatible functional groups.

According to several embodiments, a composition of matter includes: a three-dimensional structure comprising photo polymerized molecules. At least some of the photo polymerized molecules further comprise one or more protected click-chemistry compatible functional groups; and at least portions of one or more surfaces of the three-dimensional structure are functionalized with one or more of the protected click-chemistry compatible functional groups.

Provided is a material composition and method for that includes providing a substrate and forming a resist layer over the substrate. In various embodiments, the resist layer includes a metal complex including a radical generator, an organic core, and an organic solvent. By way of example, the organic core includes at least one cross-linker site. In some embodiments, an exposure process is performed to the resist layer. After performing the exposure process, the exposed resist layer is developed to form a patterned resist layer.

In order to simulate properties of an optical production system, use is made of an optical measurement system comprising an illumination optical unit for an object to be imaged having a pupil stop in the region of an illumination pupil and an imaging optical unit for imaging the object. In order to optimize a pupil stop shape of the pupil stop, firstly a starting stop shape of the pupil stop is predefined as an initial design candidate for the simulation. The starting stop shape is modified and at least one fabrication boundary condition of the corresponding modification stop shape is checked. The steps modifying and checking are repeated until the checking reveals compliance with the boundary conditions. A match quality between the properties of the optical production system and those of the optical measurement system is determined and the steps modifying, checking and determining are repeated until the match quality attains a predefined optimization criterion, which is queried. A target stop shape resulting from the target stop shape that occurred with the smallest merit function value E in the optimization is fabricated as an optimized pupil stop shape after attaining the optimization criterion. This results in simulationas free of deviations as possibleof the illumination and imaging properties of the optical production system during the illumination and imaging of the object by use of the optical measurement system.

In order to simulate properties of an optical production system, use is made of an optical measurement system comprising an illumination optical unit for an object to be imaged having a pupil stop in the region of an illumination pupil and an imaging optical unit for imaging the object. In order to optimize a pupil stop shape of the pupil stop, firstly a starting stop shape of the pupil stop is predefined as an initial design candidate for the simulation. The starting stop shape is modified and at least one fabrication boundary condition of the corresponding modification stop shape is checked. The steps modifying and checking are repeated until the checking reveals compliance with the boundary conditions. A match quality between the properties of the optical production system and those of the optical measurement system is determined and the steps modifying, checking and determining are repeated until the match quality attains a predefined optimization criterion, which is queried. A target stop shape resulting from the target stop shape that occurred with the smallest merit function value E in the optimization is fabricated as an optimized pupil stop shape after attaining the optimization criterion. This results in simulationas free of deviations as possibleof the illumination and imaging properties of the optical production system during the illumination and imaging of the object by use of the optical measurement system.