A positive resist composition is provided comprising (A) an acid generator in the form of a sulfonium salt consisting of a fluorine-containing sulfonate anion and a fluorine-containing sulfonium cation, (B) a quencher in the form of a sulfonium salt containing at least two fluorine atoms in its cation or containing at least 5 fluorine atoms in its anion and cation, and (C) a base polymer comprising repeat units (a1) having a carboxy group whose hydrogen is substituted by an acid labile group and/or repeat units (a2) having a phenolic hydroxy group whose hydrogen is substituted by an acid labile group. The resist composition exhibits a high sensitivity, high resolution and improved LWR or CDU.

The present invention provides an alkali-soluble resin with which a cured film having high extensibility, reduced stress, high adhesion to a metal, and high heat resistance can be obtained, and a photosensitive resin composition containing the alkali-soluble resin, and the present invention is an alkali-soluble resin (A) including a structure represented by a general formula (1) wherein X.sup.1 represents a divalent organic group having 2 to 100 carbon atoms, Y.sup.1 and Y.sup.2 each represent a divalent to hexavalent organic group having 2 to 100 carbon atoms, X.sup.2 represents a tetravalent organic group having 2 to 100 carbon atoms, p and q each represent an integer in a range of 0 to 4, and n.sup.1 and n.sup.2 each represent an integer in a range of 5 to 100,000, wherein (I) and (II) described below are satisfied: (I) an organic group having an aliphatic chain having 8 to 30 carbon atoms is contained as X.sup.1 of the general formula (1) at a content of 30 to 70 mol % based on 100 mol % of a total of X.sup.1 and X.sup.2, and (II) an organic group having a diphenyl ether structure is contained as Y.sup.1 of the general formula (1) at a content of 1 to 30 mol % based on 100 mol % of a total of Y.sup.1 and Y.sup.2.

The present invention is a negative photosensitive resin composition including: (A) an alkali-soluble resin containing at least one or more structures selected from a polyimide structure, a polybenzoxazole structure, a polyamide-imide structure, and a precursor structure thereof; (B) a crosslinkable polymer compound containing a structural unit represented by the following general formula (1) and having a group crosslinked with the component (A); (C) a compound that generates an acid by light; and (D) a heat crosslinking agent. An object of the present invention is to provide a negative photosensitive resin composition that enables formation of a fine pattern with high rectangularity and high resolution, has excellent mechanical characteristics even when cured at low temperatures, and furthermore, has no degradation in adhesive force between before and after a high temperature and high humidity test.

##STR00001##

A color photoresist comprises a curable resin, a polyfunctional monomer, an initiator, a solvent, a colorant, and an additive, wherein the additive is a non-metal catalyst catalyzing a cross-coupling photoreaction to be performed among compounds having a carbon-carbon single bond, compounds having a carbon-oxygen single bond, and compounds having a carbon-nitrogen single bond under ultraviolet light. The present disclosure further provides a color filter manufactured by the above color photoresist and a manufacturing method thereof.

The present invention relates to a photosensitive resin composition that is excellent in adhesiveness and sensitivity. Specifically, the photosensitive resin composition is capable of providing a cured film that is excellent in transparency, sensitivity, chemical resistance, and adhesiveness upon immersion in a stripper. Thus, the cured film can be effectively used in a liquid crystal display, an organic EL display, and the like.

An alternating copolymer including a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a0-2) represented by general formula (a0-2) in which Rp.sup.01 represents a hydrogen atom or the like; Vp.sup.01 represents a single bond or a divalent linking group; Rp.sup.02 and Rp.sup.03 each independently represents a hydrocarbon group which may have a substituent, or Rp.sup.02 and Rp.sup.03 are mutually bonded to form a ring; Rp.sup.04 represents a hydrogen atom, a C1-C5 alkyl group or a C1-C5 halogenated alkyl group; Rp.sup.05 represents an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a cyano group or a hydroxy group; Rp.sup.06 represents a linear or branched aliphatic hydrocarbon group; and m represents an integer of 0 to 4

##STR00001##

A photosensitive resin composition contains (A) an ethylenically unsaturated group- and carboxyl group-containing photoreactive resin, (B) an epoxy compound, (C) a polyfunctional epoxy compound, and (D) a photopolymerization initiator.

A photosensitive resin composition contains (A) an ethylenically unsaturated group- and carboxyl group-containing photoreactive resin, (B) an epoxy compound, (C) a polyfunctional epoxy compound, and (D) a photopolymerization initiator.

Described is a recording element which is suitable for the production of high-resolution flexographic printing plates by means of digital information transmission that can be imaged with actinic laser radiation and comprises or consists of the following layers: (A) a carrier film, (B) a photopolymerizable layer/relief forming polymer layer which is cross-linkable by actinic radiation, (C) an actinic radiation transparent intermediate layer composite, comprising at least two polymer comprising composite layers lying on top of each other, a first composite layer (C1) acting as blocking layer or barrier layer and a second composite layer (C2) acting as adhesion modulator against the relief forming polymer layer, (D) a recordable template layer comprising a monomeric diazonium compound, and (E1) optionally a peelable protective film or cover film on the recordable template layer (D).

Described is a recording element which is suitable for the production of high-resolution flexographic printing plates by means of digital information transmission that can be imaged with actinic laser radiation and comprises or consists of the following layers: (A) a carrier film, (B) a photopolymerizable layer/relief forming polymer layer which is cross-linkable by actinic radiation, (C) an actinic radiation transparent intermediate layer composite, comprising at least two polymer comprising composite layers lying on top of each other, a first composite layer (C1) acting as blocking layer or barrier layer and a second composite layer (C2) acting as adhesion modulator against the relief forming polymer layer, (D) a recordable template layer comprising a monomeric diazonium compound, and (E1) optionally a peelable protective film or cover film on the recordable template layer (D).