The present disclosure is directed to a patterning process that includes providing a composite dry film resist on a surface, in which the composite dry film resist includes a base film, a barrier layer and a resist layer, in which the base film is disposed over the barrier layer and the barrier layer is disposed over the resist layer. In another aspect, the patterning process includes removing the base film from the barrier layer and exposing the barrier layer to form an exposure precursor, which has a first area and a second area, further exposing the first area of the exposure precursor to electromagnetic irradiation, which passes through the barrier layer and the resist layer in the exposed first area becomes water-insoluble, and removing the barrier layer and the unexposed second area to form a pattern template.

The invention relates to a method for producing a structure with spatial encoded functionality, the method comprising: providing in a volume (114) a first photosensitive material (116) that is two-photon crosslinking compatible, generating in the volume (114) a framework of crosslinked first photo-sensitive material (116), the generating of the framework comprising exposing the first photosensitive material (116) with a first focused laser beam (118) according to a first pattern for specifically initiating a two-photon crosslinking of the first photosensitive material (116) in accordance with the first pattern, removing from the volume (114) any remaining non-crosslinked portions of the first photosensitive material (116), providing to the volume (114) a second photosensitive material (116) that is two-photon crosslinking compatible, generating in the volume (114) the structure, the generating of the structure comprising exposing the second photosensitive material (116) with a second focused laser beam (118) according to a second pattern for specifically initiating a two-photon crosslinking of predefined surface portions of the framework and the second photosensitive material (116) in accordance with the second pattern, removing from the volume (114) any remaining non-crosslinked portions of the second photosensitive material (116).

The invention provides a development method, including steps of providing a substrate, a first photoresist layer being after an exposure treatment disposed on the substrate, the first photoresist layer having an exposed area and an unexposed area; uniformly coating a developer on the first photoresist layer to form a first developer layer; applying a first development; applying a second development; and removing a remaining developer on the substrate after the second development is finished.

A material for forming an organic film, including: a polymer having a structure shown by the following general formula (1A) as a partial structure; and an organic solvent, where in the general formula (1A), W1 represents a tetravalent organic group, W2 represents a single bond or a linking group shown by the following formula (1B), R1 represents a hydrogen atom or a monovalent organic group having 1 to 10 carbon atoms, n1 represents an integer of 0 or 1, and n2 and n3 satisfy 0≤n2≤6, 0≤n3≤6, and 1≤n2+n3≤6, and where R2 and R3 each independently represent hydrogen or an organic group having 1 to 30 carbon atoms, and the organic group R2 and the organic group R3 optionally bond to each other within a molecule to form a cyclic organic group.

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A method of forming a cured layer on a substrate can include applying on the exterior surface of the substrate a first liquid film and subjecting the first liquid film to actinic radiation in at least one first region of the film. The actinic radiated region can modify the substrate surface such that the drop spreading of a region not subjected to actinic radiation is larger than the drop spreading in a region subjected to actinic radiation.

A micro-structure transfer system may include a printhead and a pressure control device to control a pressure of fluid coupled with the printhead. The pressure control device forms a meniscus of fluid at a number of nozzles defined within the printhead to pick up a number of micro-structures. A printhead for transferring micro-structures includes a number of fluid chambers, a number of nozzles defined in an orifice plate through which fluid may exit the chambers, and a pressure control device to control a pressure of fluid within each of the chambers. The pressure control device forms a meniscus of the fluid at a number of nozzles defined within the printhead to pick up a number of micro-structures.

Dry stereolithography using solid thermoplastic photopolymer plates/sheets/films provides a new technique to make 3D printed objects. In this new additive manufacturing process, objects are built layer-wise using thermoplastic photopolymers and actinic radiation. The thermoplastic photopolymer compositions consist of a thermoplastic photopolymer layer sandwiched between a transparent flexible base without an anchoring layer and a release film. Uncrosslinked portions of the 3D printed object are removed by heat. Preferred method of radiation exposure is digital light processing (DLP).

A method of producing a substrate provided with a shaped graphene material electrically conductive region is described, the method comprising applying a photoresist material to a substrate, shaping the photoresist material to cover at least part of the substrate that is not to be electrically conductive, depositing a graphene material onto the substrate over the shaped photoresist material, and subsequently removing the photoresist material. Also described are devices such as touch sensors and shaped light emitting devices manufactured using the method.

A panel and a manufacturing method thereof are provided. The panel includes a base substrate, and a black matrix layer, a first organic insulating layer and a second organic insulating layer, which are sequentially disposed on the base substrate. The black matrix layer includes a first groove penetrating through the black matrix layer; the first organic insulating layer includes a second groove penetrating through the first organic insulating layer; the second organic insulating layer includes a third groove penetrating through the second organic insulating layer; and the first groove, the second groove and the third groove are interpenetrated with one another.

To provide a laminate which enables pattern formation with excellent opening shape even in the case where a chemically amplified negative type resist material is used, and a pattern forming method in which the laminate is used. The laminate includes a chemically amplified negative type resist layer, and a basic resin coat layer thereon that contains 0.001 to 10% by weight of a basic compound having a molecular weight of up to 10,000.