Provided is a substrate treating composition. The substrate treating composition includes a first monomer, a second monomer and an acid. The first monomer is represented by Formula 1 and the second monomer is represented by Formula 7. The molecular weight of the solid content of the substrate treating composition including the first monomer, the second monomer and the acid is from about 1,000 g/mol to about 50,000 g/mol.

X—Si(R1).sub.2(R2)   [Formula 1]

Y—Si(R3).sub.3   [Formula 7]

The present invention, relates, to a process, for producing structured coatings, in which a coating composition comprising at least one inorganic binder, at least one oxide pigment which, after addition of a mixture consisting of 15 ml of 1 M oxalic acid and 15 ml of 20% aqueous hydrochloric acid based on 1 g of substance, under standard conditions, leads to a temperature rise of at least 4° C., and at least one solvent is applied to a substrate, the resulting coating composition film is partially coated with a photoresist and the substrate coated with the coating composition and the photoresist is treated with an acid, to the structured layers obtainable by the process and to the use thereof.

A method for manufacturing an electroconductive pattern 40, provided with: a lamination step for laminating an acid generation film 10 containing an acid proliferation agent and a photoacid generator on a polymer film 20 containing an electroconductive polymer formed on a substrate 21; a masking step for masking the top of the acid generation film 10; a light irradiation step for irradiating the laminate from the acid-generation-film 10 side; a doping step for doping the electroconductive polymer with an acid generated and proliferated in the acid generation film 10 by the light irradiation; and a releasing step for releasing the acid generation film 10 from the polymer film 20. This method makes it possible to provide an electroconductive film and a method for manufacturing an electroconductive pattern in which photoacid generation and acid proliferation effects are utilized.

The present invention is a substrate for a display, the substrate having a film B including a polysiloxane resin on at least one surface of a film A including a polyimide resin, wherein the film B contains inorganic oxide particles therein, and the present invention has an object to provide a substrate for a display: being able to be applied to a color filter, an organic EL element, or the like without the need to carry out any complex operations; allowing high-definition displays to be manufactured; and being provided with a low CTE, a low birefringence, and flexibility.

Provided is a photolithography method, including: a) forming a photoresist layer satisfying D=m*(λ/2n) (D is a thickness of the photoresist layer, n is a refractive index of the photoresist, λ is a wavelength of irradiated light at the time of exposure, and m is a natural number of 1 or more) on a substrate; and b) manufacturing a photoresist pattern having a ring shape by exposing the photoresist layer and developing the exposed photoresist layer using a photo mask including a transparent substrate and a plate-type metal dot contacting a light emitting surface of the transparent substrate.

The present invention provides a method for forming an organic film, including: forming a coating film by spin coating of an organic film-forming composition onto a substrate having an uneven pattern, and thereafter subjecting the substrate to a vibration treatment, and after or simultaneously with the vibration treatment, insolubilizing the coating film to an organic solvent to form the organic film. This provides a method for forming an organic film that can fill an uneven pattern on a substrate to highly flatten a substrate at low cost in a production step of a semiconductor apparatus, etc.

A coating composition which contains a fluorinated polymer having a unit (1) represented by —[CX.sup.1X.sup.2—CY.sup.1(Rf.sup.1—COOM.sup.1)]— and a fluorinated compound represented by CX.sup.3X.sup.4═CY.sup.2(Rf.sup.2—COOM.sup.2), wherein the content of the fluorinated compound is from 0.1 to 8.0 parts by mass per 100 parts by mass of the fluorinated polymer. X.sup.1, X.sup.2, X.sup.3 and X.sup.4 are H, F or Cl, Y.sup.1 and Y.sup.2 are H, F, Cl, a methyl group or a trifluoromethyl group, Rf.sup.1 and Rf.sup.2 are a perfluoroalkylene group which may contain an etheric oxygen atom between carbon-carbon atoms, or an oxyperfluoroalkylene group which may contain an etheric oxygen atom between carbon-carbon atoms, —COOM.sup.1 is —COOH or —COOZ.sup.1, and —COOM.sup.2 is —COOH or —COOZ.sup.2 (wherein Z.sup.1 and Z.sup.2 are an ammonium ion in which the hydrogen atom may be substituted). The coating composition is suitable for forming a thin antireflection coating layer without increasing its refractive index.

The present application relates to a block copolymer and its use. The present application can provides a block copolymer that has an excellent self assembling property or phase separation property and therefore can be used in various applications and its use.

The present application relates to a block copolymer and uses thereof. The present application can provide a block copolymer—which exhibits an excellent self-assembling property and thus can be used effectively in a variety of applications—and uses thereof.

Compositions including hard magnetic photoresists, soft photoresists, hard magnetic elastomers and soft magnetic elastomers are provided.