An exposure device or tool and a method for preparing circuits on curved surfaces, belonging to the technical field of exposure devices and tools, are disclosed. By expanding the designed pattern on the curved surface into multiple, continuous pattern blocks, the original curved pattern is converted into a flat pattern. Based on the flat pattern, a corresponding mask is designed, with the pattern areas retained. Subsequently, using the exposure device or tool, a photoresist on the curved surface is selectively exposed to light, thereby transferring the pattern from the mask to the curved surface. In this exposure process, rotation of the sample stage and horizontal movement of the mask, combined with the light from a light source, allow for the transfer of the pattern from the mask onto the curved sample or workpiece.

An exposure device or tool and a method for preparing circuits on curved surfaces, belonging to the technical field of exposure devices and tools, are disclosed. By expanding the designed pattern on the curved surface into multiple, continuous pattern blocks, the original curved pattern is converted into a flat pattern. Based on the flat pattern, a corresponding mask is designed, with the pattern areas retained. Subsequently, using the exposure device or tool, a photoresist on the curved surface is selectively exposed to light, thereby transferring the pattern from the mask to the curved surface. In this exposure process, rotation of the sample stage and horizontal movement of the mask, combined with the light from a light source, allow for the transfer of the pattern from the mask onto the curved sample or workpiece.

The colored photosensitive resin composition of the present invention maintains excellent resolution, visibility, and the like while it has excellent reflectance R.sub.SCI measured by the SCI (specular component included) method, reflectance R.sub.SCE measured by the SCE (specular component excluded) method, and the ratio between them (R.sub.SCE/R.sub.SCI), and has a uniform film thickness in an appropriate range. Thus, it can be formed into a multilayer cured film that simultaneously satisfies such physical properties as a high reflectance and a high light-shielding property. In addition, when a cured film is formed from the composition, it is possible to form a pattern on a multilayer film in a single development process. Thus, it can be advantageously used for a quantum dot display device.

The colored photosensitive resin composition of the present invention maintains excellent resolution, visibility, and the like while it has excellent reflectance R.sub.SCI measured by the SCI (specular component included) method, reflectance R.sub.SCE measured by the SCE (specular component excluded) method, and the ratio between them (R.sub.SCE/R.sub.SCI), and has a uniform film thickness in an appropriate range. Thus, it can be formed into a multilayer cured film that simultaneously satisfies such physical properties as a high reflectance and a high light-shielding property. In addition, when a cured film is formed from the composition, it is possible to form a pattern on a multilayer film in a single development process. Thus, it can be advantageously used for a quantum dot display device.