Methods and systems for predictively determining tool drift in a digital lithography tool for early warning, and/or adjusting the tool in-situ to mitigate the effects of drift. Drift is measured during manufacturing by measuring alignment marks from eye-to-eye a bridge-to-bridge, among other methods. Measured drift is decomposed into three components: trend—trending drift over time, increment—rate of change of drift over time, and remaining—the difference between the drift, the trend, and the increment. Each component is provided to a machine learning engine, that predicts the next measurement of each component. Predicted measurements may be provided to the tool for use as adjustment parameters to modify how an eye module shoots a pattern onto a substrate, and/or as an early warning when predicted parameters are outside of a desired processing parameter window.

A calibration system includes: an exposure head support part that supports an exposure head so that a beam for exposure is incident on an exposure region on the substrate at the time of exposure; a sensor unit including an optical sensor; a sensor unit support part that supports the sensor unit so that, at the time of exposure, a light-receiving surface of the optical sensor is parallel to an exposure surface in the exposure region and the sensor unit support part is installed slidably relative to the exposure head support part; a movement mechanism that moves the exposure head support part and the sensor unit support part; and a control part that moves, at the time of calibration, the exposure head support part and the sensor unit support part so as to arrange the light-receiving surface at a position corresponding to the exposure surface.

Methods of producing grating materials with variable height fins are provided. In one example, a method may include providing a mask layer atop a substrate, the mask layer including a first opening over a first processing area and a second opening over a second processing area. The method may further include etching the substrate to recess the first and second processing areas, forming a grating material over the substrate, and etching the grating material in the first and second processing areas to form a plurality of structures oriented at a non-zero angle with respect to a vertical extending from a top surface of the substrate.

Embodiments described herein relate to methods of printing features within a lithography environment. The methods include determining a mask pattern. The mask pattern includes auxiliary features to be provided with main features to a maskless lithography device in a lithography process. The auxiliary features are determined with a rule-based process flow or a lithography model process flow.

The present disclosure relates to a film formed with a tantalum-based precursor, as well as methods for forming and employing such films. The film can be employed as a photopatternable film or a radiation-sensitive film. In non-limiting embodiments, the radiation can include extreme ultraviolet (EUV) or deep ultraviolet (DUV) radiation.

Embodiments described herein relate to methods of printing double exposure patterns in a lithography environment. The methods include determining a second exposure pattern to be exposed with a first exposure pattern in a lithography process. The second exposure pattern is determined with a rule-based process flow or a lithography model process flow.

A digital masking system includes a supporting structure for supporting a material, and a pattern imaging apparatus. The pattern imaging apparatus includes a light source device, multiple imaging devices that convert light from the light source device into a plurality of light beams each representing an image, and a combiner that combines the light beams into a single light beam which is projected toward a material.

Methods and apparatus for fabricating high-resolution thin-layer metal patterns and 3D Metal structures are provided. The methods and apparatus operate via photo-(stereo)lithography at room temperature. The printed metal patterns, for example silver patterns, exhibit high electrical conductivity, comparable to or better than the conductivity of the silver printed by current laser sintering or thermal annealing at high temperature.

There is provided a manufacturing method for a cured substance, which makes it possible to obtain a cured substance having excellent breaking elongation, a manufacturing method for a laminate, including the manufacturing method for a cured substance, a manufacturing method for a semiconductor device, including the manufacturing method for a cured substance or the manufacturing method for a laminate, and there is provided a treatment liquid that is used in the manufacturing method for a cured substance.

The manufacturing method for a cured substance includes a film forming step of applying a resin composition containing a precursor of a cyclization resin onto a base material to form a film, a treatment step of bringing a treatment liquid into contact with the film, and a heating step of heating the film after the treatment step, in which the treatment liquid contains at least one compound selected from the group consisting of a basic compound having an amide group and a base generator having an amide group.

A grating structure, a manufacturing method thereof and a display device are provided. The method of manufacturing the grating structure includes: forming a photosensitive material layer on a substrate; patterning the photosensitive material layer to form a grating transition pattern, where the grating transition pattern includes multiple grating units, the multiple grating units each include a first portion and a second portion which are symmetric, and at least one of the first portion and the second portion includes multiple subunits to have a stepped structure; and curing the grating transition pattern to form the grating structure.