Provided is a photosensitive element including a support film, and a photosensitive layer provided on the support film and formed from a photosensitive resin composition, in which the surface roughness of the surface of the support film that is in contact with the photosensitive layer is 200 to 4,000 nm.

A method for the exposure of image points of a photosensitive layer comprising a photosensitive material on a substrate by means of an optical system. The method including continuously moving the image points with respect to the optical system; and controlling a plurality of secondary beams by means of the optical system individually for individual exposures of each image point, whereby the secondary beams are put either into an ON state or into an OFF state, wherein a) secondary beams in the ON state produce an individual exposure of the image point assigned to the respective secondary beam and b) secondary beams in the OFF state do not produce any individual exposure of the image point assigned to the respective secondary beam; wherein, for the generation of image points with grey tones n>1, individual exposures are carried out by different secondary beams with individual doses D.

The invention provides a development method, including steps of providing a substrate, a first photoresist layer being after an exposure treatment disposed on the substrate, the first photoresist layer having an exposed area and an unexposed area; uniformly coating a developer on the first photoresist layer to form a first developer layer; applying a first development; applying a second development; and removing a remaining developer on the substrate after the second development is finished.

A method of producing a cell culture chip, in which a first adhesive is film-formed on a first substrate having transparency such that a first adhesive layer and a recessed portion on which one or more cell culture flow paths are formed face each other, and a second adhesive is film-formed on the first substrate such that a second adhesive layer and a flat portion around the recessed portion face each other, thereby obtaining a cell culture flow path substrate, the first adhesive containing a polyester-based resin having a glass transition temperature of 5° C. or higher, and the second adhesive containing a polyester-based resin having a glass transition temperature of lower than 5° C.

Maskless lithography apparatus including a chassis supporting a substrate onto which it is desired to write, an optical writing head, the optical writing head operating at at least one of a plurality of at least partially different wavelength/intensity ranges, a displacement subsystem for providing desired relative displacement between the substrate and the optical writing head and a writing controller operative to cause the optical writing head to sequentially write a plurality of different patterns at correspondingly different ones of the at least one of a plurality of at least partially different wavelength/intensity ranges.

The present invention discloses a digital photolithography method for a fiber optic device (FOD) based on a DMD combination. In this method, reflected light modulated by two DMDs is simultaneously projected onto a same position on an optical fiber end surface through one reduction projection lens. The two DMDs form a primary and secondary digital mask for joint control of an exposure dose distribution formed when patterns are shrunk and projected onto the optical fiber end surface. After the optical fiber end surface coated with photoresist is subject to this dose of exposure, developing, fixing, and etching are conducted, to form a micro-optic device on the optical fiber end surface. In the present invention, distribution of the exposure dose jointly modulated by a digital mask combination formed by the primary and secondary DMD exceeds an order of modulation of an exposure dose by a single DMD.

A method for photon induced material deposition includes providing a first solution, which contains metallate or metal ions, providing a second solution, which contains light sensitive reducing agent, such as semiconductor nanoparticles, mixing the first solution and the second solution to form a reagent on a substrate, and focusing a light source on the reagent to form a mechanically rigid deposition in the focus of the light source.

In one embodiment, a method of fabricating a device having at least two features of differing heights comprises: depositing a resist over a substrate; determining a topography pattern for the at least two features of the device; determining an exposure pattern for the at least two features of the device; exposing a first area of the resist with a first dose of light, the first area corresponding to a first feature of the at least two features; exposing a second area of the resist with a second dose of light that is different from the first dose of light, the second area corresponding to a second feature of the at least two features; and developing the resist.

A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structures, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures, and a detection means is provided to verify the data as written.

The invention relates to a method for exposing at least one stored image (21) on a light-sensitive recording medium (14), with an exposure device (11), which picks up at least one recording medium (14) on a support (12), with at least one exposure head (16, 17), which is moved above the support (12) along a guiding axis (18) in the X direction and the guiding axis (18) and/or the support (12) are moved in the Y direction, with a control system, by which a traversing movement of the at least one exposure head (16, 17) is operated for exposing the at least one image (21) of the recording medium (14) and/or the recording medium (14), wherein the position of the recording medium (14) and/or the position of the at least one image (21) on the recording medium (14) are detected with at least one linear image acquisition device (25), which extends at least partially in the X direction.