Patent classifications
G03F7/22
EXPOSURE METHOD, METHOD OF FABRICATING PERIODIC MICROSTRUCTURE, METHOD OF FABRICATING GRID POLARIZING ELEMENT AND EXPOSURE APPARATUS
Disclosed herein an exposure apparatus capable of implementing a microfabrication onto a work with a higher throughput and a lower cost. The exposure apparatus generates interfering light by crossing two or more branched light beams branched from output light from a coherent light source at a predetermined interfering angle, and exposes the substrate by repeating an irradiation onto the substrate with the interfering light and a conveyance of the substrate. At this moment, the exposure apparatus shapes in interfering light irradiation region on the substrate onto which the interfering light is irradiated into a predetermined shape. Then, the exposure apparatus disposes a plurality of the interfering light irradiation regions in successive shots to be located adjacent to each other on the substrate in a direction of conveying the substrate without the interfering light irradiation regions being overlapped when exposing the substrate while conveying the substrate in a stepwise manner.
Determination method and apparatus, program, information recording medium, exposure apparatus, layout information providing method, layout method, mark detection method, exposure method, and device manufacturing method
A determination apparatus has a calculation section, where first and second direction pitches intersecting within a predetermined plane of a plurality of detection areas are D.sub.1 and D.sub.2, respectively, sizes in the first and second directions of each of a plurality of divided areas arranged two-dimensionally along the first and second directions on a substrate are W.sub.1 and W.sub.2, respectively, and first and second direction pitches of a plurality of marks arranged on the substrate are p.sub.1 and p.sub.2, respectively, calculates pitch p1 and pitch p.sub.2 of the plurality of marks that satisfy formulas (a) and (b) below, based on pitch D.sub.1, pitch D.sub.2, size W.sub.1, and size W.sub.2.
p.sub.1=D.sub.1/i (i denotes a natural number)=W.sub.1/m (m denotes a natural number) (a)
p.sub.2=D.sub.2/j (j denotes a natural number)=W.sub.2/n (n denotes a natural number) (b)
Determination method and apparatus, program, information recording medium, exposure apparatus, layout information providing method, layout method, mark detection method, exposure method, and device manufacturing method
A determination apparatus has a calculation section, where first and second direction pitches intersecting within a predetermined plane of a plurality of detection areas are D.sub.1 and D.sub.2, respectively, sizes in the first and second directions of each of a plurality of divided areas arranged two-dimensionally along the first and second directions on a substrate are W.sub.1 and W.sub.2, respectively, and first and second direction pitches of a plurality of marks arranged on the substrate are p.sub.1 and p.sub.2, respectively, calculates pitch p1 and pitch p.sub.2 of the plurality of marks that satisfy formulas (a) and (b) below, based on pitch D.sub.1, pitch D.sub.2, size W.sub.1, and size W.sub.2.
p.sub.1=D.sub.1/i (i denotes a natural number)=W.sub.1/m (m denotes a natural number) (a)
p.sub.2=D.sub.2/j (j denotes a natural number)=W.sub.2/n (n denotes a natural number) (b)
Movable body apparatus, moving method, exposure apparatus, exposure method, flat-panel display manufacturing method, and device manufacturing method
A movable body apparatus that moves a substrate equipped with: a substrate holder which can move in the X-axis and the Y-axis directions; a Y coarse movement stage can move in the Y-axis direction, a first measurement system acquiring position information on the substrate holder with heads provided at the substrate holder and a scale provided at the Y coarse movement stage; a second measurement system acquiring position information on the Y coarse movement stage with heads at the Y coarse movement stage and a scale; and a control system controlling the position of the substrate holder based on position information acquired by the first and the second measurement systems, and the first measurement system irradiates a measurement beam on the scale while moving the heads in the X-axis direction, and the second measurement system irradiates a measurement beam on the scale while moving the heads in the Y-axis direction.
Mask, exposure method and touch display panel
A mask is provided. The mask includes a plurality of light blocking strips configured to block light and bounding spaces through which light is allowed to pass. The plurality of light blocking strips are arranged in a mesh shape, and include first light blocking strips located in at least one side edge of the mask, and second light blocking strips, and each of the first light blocking strips has a greater width than each of the second light blocking strips. An exposure method using the mask, and a touch display panel manufactured by the exposure method are also provided.
Mask, exposure method and touch display panel
A mask is provided. The mask includes a plurality of light blocking strips configured to block light and bounding spaces through which light is allowed to pass. The plurality of light blocking strips are arranged in a mesh shape, and include first light blocking strips located in at least one side edge of the mask, and second light blocking strips, and each of the first light blocking strips has a greater width than each of the second light blocking strips. An exposure method using the mask, and a touch display panel manufactured by the exposure method are also provided.
Method for manufacturing large-scale touch sensing pattern
The method includes the steps of: a) dividing a large-scale touch sensing pattern to be manufactured into multiple divisional patterns and producing multiple photomasks corresponding to the multiple divisional patterns; b) providing a substrate with a conductive layer; c) disposing a photoresist layer on the conductive layer; d) a first exposure process: forming an exposing divisional pattern and multiple first targets the photoresist layer; e) an adjacent exposure process: forming an adjacent exposing divisional pattern and multiple second targets, and adjacently connecting the adjacent exposing divisional pattern and the exposing divisional pattern originally on the photoresist layer; f) repeating the adjacent exposure process to form multiple adjacent exposing divisional patterns until a complete exposing pattern has been assembled; g) performing a developing process to the photoresist layer; and h) etching the conductive layer to form the large-scale touch sensing pattern on the conductive layer.
POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION, METHOD FOR PRODUCING POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION
A polycyclic polyphenolic resin having repeating units derived from at least one monomer selected from the group consisting of aromatic hydroxy compounds represented by the formulas (1A) and (1B); or a polycyclic polyphenolic resin having repeating units derived from an aromatic hydroxy compound represented by the formula (C-1A), wherein the repeating units are linked to each other by a direct bonding between aromatic rings:
##STR00001##
wherein in the formula (1A), R.sup.1 is a 2n-valent group having 1 to 60 carbon atoms or a single bond, each R.sup.2 is independently an alkyl group having 1 to 40 carbon atoms and optionally having a substituent, an aryl group having 6 to 40 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkynyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 40 carbon atoms and optionally having a substituent, a halogen atom, a thiol group, an amino group, a nitro group, a cyano group, a nitro group, a heterocyclic group, a carboxyl group or a hydroxy group, and each m is independently an integer of 0 to 3; each n is independently an integer of 1 to 4; and in the formula (1B), R.sup.2 and m are as defined in the formula (1A), and
##STR00002##
wherein in the formula (C-1A), R.sup.1 is a 2n-valent group having 1 to 60 carbon atoms or a single bond, each R.sup.2 is independently an alkyl group having 1 to 40 carbon atoms and optionally having a substituent, an aryl group having 6 to 40 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkynyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 40 carbon atoms and optionally having a substituent, a halogen atom, a thiol group, an amino group, a nitro group, a cyano group, a nitro group, a heterocyclic group, a carboxyl group or a hydroxy group, and each m is independently an integer of 0 to 9; and n is an integer of 1 to 4, and each p is independently an integer of 0 to 3.
POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, RESIST PATTERN FORMATION METHOD, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION
A polymer having repeating units derived from at least one monomer selected from the group consisting of aromatic hydroxy compounds represented by the formulas (1A) and (1B), wherein the repeating units are linked to each other by direct bonding between aromatic rings:
##STR00001##
wherein each R is independently an alkyl group having 1 to 40 carbon atoms and optionally having a substituent, an aryl group having 6 to 40 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 40 carbon atoms and optionally having a substituent, an alkynyl group having 2 to 40 carbon atoms, an alkoxy group having 1 to 40 carbon atoms and optionally having a substituent, a halogen atom, a thiol group, an amino group, a nitro group, a cyano group, a nitro group, a heterocyclic group, a carboxyl group, or a hydroxy group, at least one R is a group containing a hydroxy group, and each m is independently an integer of 1 to 10.
Method and apparatus for collecting information used in image-error compensation
A method for collecting information in image-error compensation is provided. The method includes providing a reticle having a first image structure and a second image structure; moving a light shading member to control a first exposure field; projecting a light over the first exposure field; recording an image of the first image structure after the light is projected; moving the light shading member to control a second exposure field; projecting the light over the second exposure field; and recording an image of the second image structure after the light is projected.