A method for fabricating a flexographic printing plate for printing image patterns including one or more uniform image regions includes defining a repeating tile having a plurality of different feature shapes positioned in a pattern of pseudo-random feature locations. A plate formation pattern corresponding to the image pattern is determined wherein the repeating tile is applied in a tiled arrangement to the uniform image regions. The plate formation pattern is used to form a flexographic printing plate, wherein regions of the flexographic printing plate corresponding to the uniform image regions of the image pattern include a pattern of raised features in positions corresponding to the feature positions in the repeating tile.

A method for fabricating a flexographic printing plate for printing image patterns including one or more uniform image regions includes defining a repeating tile having a pattern of feature shapes positioned at pseudo-random feature locations. A plate formation pattern corresponding to the image pattern is determined wherein the repeating tile is applied in a tiled arrangement to the uniform image regions. The plate formation pattern is used to form a flexographic printing plate, wherein regions of the flexographic printing plate corresponding to the uniform image regions of the image pattern include a pattern of raised features in positions corresponding to the feature positions in the repeating tile.

Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.

Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.

The overall mechanism for creating the exposure may comprise a table having an outer frame 1110 that holds a transparent (e.g. glass) inner portion 1112. The upper 1120 and lower 1122 linear radiation sources (e.g. banks of LED point sources, optionally mounted inside a reflective housing) are mounted on a gantry system or carriage 1130. The radiation sources are connected to a power source, such as an electrical power cord having sufficient slack to extend the full range of motion of the carriage. Tracks (not shown) disposed on the outer frame portion provide a defined path for the gantry system or carriage to traverse. The carriage may be moved on the tracks by any drive mechanism known in the art (also coupled to the power supply and the controller), including a chain drive, a spindle drive, gear drive, or the like. The drive mechanism for the carriage may comprise one or more components mounted within the carriage, one or more components fixed to the table, or a combination thereof. A position sensor (not shown) is preferably coupled to the carriage to provide feedback to the controller regarding the precise location of the carriage at any given time. The control signal output from the controller for operating the radiation sources and for controlling motion of the carriage may be supplied via a wired or wireless connection. The controller may be mounted in a fixed location, such as connected to the table with a control signal cable attached to the sources similar to the power cable, or may be mounted in or on the carriage. The control system and drive mechanism cooperate to cause back/forth relative motion in a transverse direction between the light from the radiation sources and the plate. It should be understood that other embodiments may be devised in which the drive mechanism is configured to move the portion of the table containing the plate past stationary upper and lower linear radiation sources, as well as embodiments in which the radiation sources cover less than the full width of the plate and are movable in both the transverse and longitudinal direction to provide total plate coverage (or the plate is movable in both directions, or the plate is movable in one of the two directions and the sources are movable in the other direction to provides the full range of motion required to cover the entire plate).

The overall mechanism for creating the exposure may comprise a table having an outer frame 1110 that holds a transparent (e.g. glass) inner portion 1112. The upper 1120 and lower 1122 linear radiation sources (e.g. banks of LED point sources, optionally mounted inside a reflective housing) are mounted on a gantry system or carriage 1130. The radiation sources are connected to a power source, such as an electrical power cord having sufficient slack to extend the full range of motion of the carriage. Tracks (not shown) disposed on the outer frame portion provide a defined path for the gantry system or carriage to traverse. The carriage may be moved on the tracks by any drive mechanism known in the art (also coupled to the power supply and the controller), including a chain drive, a spindle drive, gear drive, or the like. The drive mechanism for the carriage may comprise one or more components mounted within the carriage, one or more components fixed to the table, or a combination thereof. A position sensor (not shown) is preferably coupled to the carriage to provide feedback to the controller regarding the precise location of the carriage at any given time. The control signal output from the controller for operating the radiation sources and for controlling motion of the carriage may be supplied via a wired or wireless connection. The controller may be mounted in a fixed location, such as connected to the table with a control signal cable attached to the sources similar to the power cable, or may be mounted in or on the carriage. The control system and drive mechanism cooperate to cause back/forth relative motion in a transverse direction between the light from the radiation sources and the plate. It should be understood that other embodiments may be devised in which the drive mechanism is configured to move the portion of the table containing the plate past stationary upper and lower linear radiation sources, as well as embodiments in which the radiation sources cover less than the full width of the plate and are movable in both the transverse and longitudinal direction to provide total plate coverage (or the plate is movable in both directions, or the plate is movable in one of the two directions and the sources are movable in the other direction to provides the full range of motion required to cover the entire plate).

A system for preparing a photopolymer printing plate includes an imager, a plate unloader configured to automatically unload the plate from the imager and deliver the plate to an exposure unit comprising a plurality of UV LEDs, and a controller configured to operate the imager, the plate unloader, and the exposure unit. The imager has a rotatable drum configured to rotate while laser beams ablate portions of an ablatable layer of the printing plate in accordance with imaging data. The UV LEDs include a back array and a front array configured to expose the front of the UV-curable plate, at least one of which is configured to emit UV radiation toward the plate during relative motion between the plate and the array.

A system for preparing a photopolymer printing plate includes an imager, a plate unloader configured to automatically unload the plate from the imager and deliver the plate to an exposure unit comprising a plurality of UV LEDs, and a controller configured to operate the imager, the plate unloader, and the exposure unit. The imager has a rotatable drum configured to rotate while laser beams ablate portions of an ablatable layer of the printing plate in accordance with imaging data. The UV LEDs include a back array and a front array configured to expose the front of the UV-curable plate, at least one of which is configured to emit UV radiation toward the plate during relative motion between the plate and the array.

A method of manufacturing a fine pattern using the following steps of: (1) coating a resist composition containing a novolak resin having an alkali dissolution rate of 100 to 3,000 Å on a substrate to form a resist composition layer; (2) subjecting said resist composition layer to exposure; (3) developing said resist composition layer to form a resist pattern; (4) subjecting said resist pattern to flood exposure; (5) coating a fine pattern forming composition on the surface of said resist pattern to form a fine pattern forming composition layer; (6) heating said resist pattern and said fine pattern forming composition layer to cure the regions of said fine pattern forming composition layer in the vicinity of said resist pattern and to form an insolubilized layer; and (7) removing uncured regions of said fine pattern forming composition layer.

A method of manufacturing a fine pattern using the following steps of: (1) coating a resist composition containing a novolak resin having an alkali dissolution rate of 100 to 3,000 Å on a substrate to form a resist composition layer; (2) subjecting said resist composition layer to exposure; (3) developing said resist composition layer to form a resist pattern; (4) subjecting said resist pattern to flood exposure; (5) coating a fine pattern forming composition on the surface of said resist pattern to form a fine pattern forming composition layer; (6) heating said resist pattern and said fine pattern forming composition layer to cure the regions of said fine pattern forming composition layer in the vicinity of said resist pattern and to form an insolubilized layer; and (7) removing uncured regions of said fine pattern forming composition layer.