This method includes a step of imaging, by an imaging apparatus in a substrate treatment system, a reference substrate which is a reference for condition setting and acquiring a captured image of the reference substrate; and a step of imaging, by the imaging apparatus, a treated substrate on which the predetermined treatment has been performed under a current treatment condition and acquiring a captured image of the treated substrate. A deviation amount in color information between the captured image of the treated substrate and the captured image of the reference substrate is calculated. A correction amount of the treatment condition is calculated based on a correlation model acquired in advance and on the deviation amount in the color information. Also included is a step of setting the treatment condition based on the correction amount and performing the treatment on a target substrate based on the set treatment condition.

A method of thermal development of flexographic printing elements, having steps of: fixing a relief precursor a movable support; repeatedly moving the support in a multitude of movement cycles; heating the relief precursor to a temperature sufficient to cause the uncured portions of the photopolymer layer to soften or liquefy; contacting with a development medium; Single movement cycles are carried out with different heating powers and different contacting with the developing medium such that one may improve the registration accuracy of the printing element, ease removal of functional layers, smoothen the relief plate precursor surface, and address heat build-up problem.

A first object of the present invention is to provide a transfer film that is capable of forming a resist pattern having excellent resolution. In addition, a second object of the present invention is to provide a transfer film that is capable of forming a resin pattern having excellent planarity. Further, a third object of the present invention is to provide a manufacturing method for a laminate, a manufacturing method for a circuit wire, and a manufacturing method for an electronic device, using the above-described transfer film.

The transfer film of the present invention is a transfer film having a temporary support and a composition layer disposed on the temporary support, in which the composition layer includes a photosensitive resin layer and a water-soluble resin layer, where the transfer film is obtained by laminating the temporary support, the water-soluble resin layer, and the photosensitive resin layer in this order or obtained by laminating the temporary support, the photosensitive resin layer, and the water-soluble resin layer in this order.

The water-soluble resin layer contains a compound A having a group represented by General Formula (1).

##STR00001##

In the formula, * represents a bonding position.

A first object of the present invention is to provide a transfer film that is capable of forming a resist pattern having excellent resolution. In addition, a second object of the present invention is to provide a transfer film that is capable of forming a resin pattern having excellent planarity. Further, a third object of the present invention is to provide a manufacturing method for a laminate, a manufacturing method for a circuit wire, and a manufacturing method for an electronic device, using the above-described transfer film.

The transfer film of the present invention is a transfer film having a temporary support and a composition layer disposed on the temporary support, in which the composition layer includes a photosensitive resin layer and a water-soluble resin layer, where the transfer film is obtained by laminating the temporary support, the water-soluble resin layer, and the photosensitive resin layer in this order or obtained by laminating the temporary support, the photosensitive resin layer, and the water-soluble resin layer in this order.

The water-soluble resin layer contains a compound A having a group represented by General Formula (1).

##STR00001##

In the formula, * represents a bonding position.

Materials and methods to immobilize photoacid generators on semiconducting substrates are provided. PAG-containing monomers are copolymerized with monomers to allow the polymer to bind to a surface, and optionally copolymerized with monomers to enhance solubility to generate PAG-containing polymers. The PAG-containing monomers can be coated onto a surface, where the immobilized PAGs can then be used to pattern materials coated on top of the immobilized PAGs, allowing direct patterning without the use of a photoresist, thereby reducing process steps and cost. The disclosed materials and processes can be used to produce conformal coatings of controlled thicknesses.

Materials and methods to immobilize photoacid generators on semiconducting substrates are provided. PAG-containing monomers are copolymerized with monomers to allow the polymer to bind to a surface, and optionally copolymerized with monomers to enhance solubility to generate PAG-containing polymers. The PAG-containing monomers can be coated onto a surface, where the immobilized PAGs can then be used to pattern materials coated on top of the immobilized PAGs, allowing direct patterning without the use of a photoresist, thereby reducing process steps and cost. The disclosed materials and processes can be used to produce conformal coatings of controlled thicknesses.

The present disclosure relates to a photoresist composition, a method for preparing the same, and a patterning method. The photoresist composition includes: 1 wt % to 10 wt % of a photosensitizer; 10 wt % to 20 wt % of a phenolic resin; 0.1 wt % to 5.5 wt % of an additive; and 75 wt % to 88 wt % of a solvent, based on the total weight of the photoresist composition, in which the photosensitizer includes: 20 wt % to 70 wt % of a first photosensitive compound represented by formula (1), 20 wt % to 70 wt % of a second photosensitive compound represented by formula (2), and 1 wt % to 35 wt % of a third photosensitive compound represented by formula (3), based on the total weight of the photosensitizer. The photoresist composition of the present disclosure simultaneously guarantees high resolution and high sensitivity, and can meet actual production requirements.

The present disclosure relates to a photoresist composition, a method for preparing the same, and a patterning method. The photoresist composition includes: 1 wt % to 10 wt % of a photosensitizer; 10 wt % to 20 wt % of a phenolic resin; 0.1 wt % to 5.5 wt % of an additive; and 75 wt % to 88 wt % of a solvent, based on the total weight of the photoresist composition, in which the photosensitizer includes: 20 wt % to 70 wt % of a first photosensitive compound represented by formula (1), 20 wt % to 70 wt % of a second photosensitive compound represented by formula (2), and 1 wt % to 35 wt % of a third photosensitive compound represented by formula (3), based on the total weight of the photosensitizer. The photoresist composition of the present disclosure simultaneously guarantees high resolution and high sensitivity, and can meet actual production requirements.

Provided are a washing device and a washing method that achieve prevention of development scum adhesion, development uniformity, and development speed at the same time. This washing device performs development using a washing solution while transporting the flexographic printing plate precursor after imagewise exposure. The washing device includes a transport unit that transports the flexographic printing plate precursor along a predetermined transport path and a development unit that performs development on the flexographic printing plate precursor. The development unit includes a brush which is used for the development and a driving unit which controls rotation of the brush around a rotation axis and movement of the brush. The brush removes an unexposed portion of the flexographic printing plate precursor to perform the development, and the rotation axis of the brush is a fixed axis passing through one point in the brush. The driving unit rotates the brush in a state in which the rotation axis of the brush passes through a surface of the flexographic printing plate precursor, and moves the rotation axis of the brush in at least one direction intersecting the rotation axis.

Provided are a washing device and a washing method that achieve prevention of development scum adhesion, development uniformity, and development speed at the same time. This washing device performs development using a washing solution while transporting the flexographic printing plate precursor after imagewise exposure. The washing device includes a transport unit that transports the flexographic printing plate precursor along a predetermined transport path and a development unit that performs development on the flexographic printing plate precursor. The development unit includes a brush which is used for the development and a driving unit which controls rotation of the brush around a rotation axis and movement of the brush. The brush removes an unexposed portion of the flexographic printing plate precursor to perform the development, and the rotation axis of the brush is a fixed axis passing through one point in the brush. The driving unit rotates the brush in a state in which the rotation axis of the brush passes through a surface of the flexographic printing plate precursor, and moves the rotation axis of the brush in at least one direction intersecting the rotation axis.