A device and method for producing light-exposed structures on a workpiece having a light-sensitive surface. An optical unit includes a light source and a diffraction grating for producing a strip-shaped illumination pattern having strips extending in a longitudinal direction and having a pattern width extending transversely. A device moves the surface of the workpiece and optical unit relative to each other according to a path sequence, which includes movement longitudinal paths to produce a first and second light-exposed structure having strips, which is oriented parallel to each other on the workpiece surface. The movement paths are mutually spaced apart by less than the pattern width and the light-exposed structures overlap in such a way that strips of the light-exposed structures lie on each other. To obtain good light exposure of the surface by the illumination pattern, the diffraction grating is set oblique to the surface of the workpiece that is light-exposed by the illumination pattern.

Provided is a method of laser interference lithography, including: performing an interference exposure on a wafer coated with a photoresist; and performing a patterned flood exposure on the interference-exposed wafer, wherein the performing the flood exposure includes: determining a first light field distribution in the interference-exposed wafer; determining a light field distribution of the floodlight source as a second light field distribution based on the first light field distribution, an expected pattern distribution, and parameters of the floodlight source used for the flood exposure; and patterning the light field distribution of the floodlight source based on the second light field distribution, and controlling the floodlight source having the patterned light field distribution to perform the flood exposure on the interference-exposed wafer, so as to form the expected pattern distribution in the flood-exposed wafer.

Direct pixel-by-pixel phase engineering in a SLM is an effective method for the holographic fabrication of graded photonic super-quasi-crystals with desired disorder and graded photonic super-crystals with rectangular unit-cells. Multiple levels of filling fractions of dielectric in the crystal have been created in the graded regions. Fabrication of these graded photonic super-crystals and super-quasi-crystals with small feature size is possible, using a laser projection system consisting of integrated spatial light modulator and reflective optical element.

A system comprises a plurality of laser generators, each generating a coherent beam, the plurality of laser generators arranged such that at least two of the generated coherent beams intersect with each other. The system further comprises an anti-refraction prism. The anti-refraction prism has a plurality of incident surfaces. The anti-refraction prism also has an egress surface facing a photosensitive film layer, with the coherent beams interfering within the anti-refraction prism and exiting at the egress surface to create an interference exposure pattern at an exposure region of the photosensitive film layer. Furthermore, the anti-refraction prism has a refraction index within a threshold range of the refraction index of the photosensitive film layer, and wherein the anti-refraction prism reduces a change in angle of each coherent beam in the photosensitive film layer due to refraction.

Cascaded metasurfaces can control the phase, amplitude and polarization of an electromagnetic beam, shaping it in three dimensional configuration not achievable with other methods. Each cascaded metasurface has dielectric or metallic scatterers arranged in a period array. The shape of the scatterers determines the three dimensional configuration of the output beam and is determined with iterative calculations through computational simulations.

A method of fabricating a metasurface comprises coating a photoresist film onto a substrate and loading the coated substrate into a laser interference lithography setup, exposing the photoresist film via a laser with a first interference pattern, the first interference pattern having a first period and a first exposure energy, subsequently exposing the coated substrate with a second interference pattern, the second interference pattern having a second period and a second exposure energy, developing the exposed portions of the photoresist film to form a periodic pattern in the photoresist, and transferring the periodic pattern into the substrate, the substrate supporting an appropriate film system that embodies the final metasurface device.

A device for producing a master diffraction grating includes a light source unit and a reflecting member 11. The light source unit forms a first interference fringe by irradiating a substrate surface of a master substrate 101 with light. The reflecting member 11 reflects the light from the light source unit reflected on the substrate surface of the master substrate 101 and guides the light again to the substrate surface side to form a second interference fringe. A resist pattern based on the first interference fringe and the second interference fringe is formed on the substrate surface of the master substrate 101.

A light irradiation method includes splitting light from a coherent light source, which outputs the light at a wavelength equal to or less than 300 nm, into a plurality of branch beams. A wavefront of the light is shaped before splitting the light. The light irradiation method also includes causing the branch beams to intersect at an interference angle equal to or less than 20 to generate interfered light, and irradiating a substrate with the interfered light while continuously conveying the substrate relative to the interfered light.

A system and method for patterning of a substrate at sub-micron length scales using interference lithography that includes a substrate; a chuck that promotes substrate motion; at least two EM beams; a beam phase controller, wherein the phase controller modifies phases of the EM beams with respect to each other creating an interference pattern; a displacement sensor that measures the substrate displacement; and a feedback control mechanism configured to monitor and synchronize the substrate motion with the interference pattern using the beam phase controller and the displacement sensor.

A vector partially coherent source (VPCS) generator includes a laser that emits coherent light; an interferometer consisting of polarizing beam splitters (PBSs) to split the laser light into its vertical and horizontal polarization components;] first and second spatial light modulators (SLMs) that respectively control the vertical and horizontal polarization components; and a control system communicatively coupled to the first and second SLMs to adjust beam shape and coherence without physically moving or removing optical elements in the interferometer.