A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

A photopolymerizable composition comprises at least a polymerizable resin, a photosensitizer, an annihilator, and a photoinitiator. The photosensitizer is formulated to absorb an excitation light signal received in a first range of wavelengths. The annihilator is formulated to emit a light signal in a second range of wavelengths different from the first. During the absorption of light by the photosensitizer in the first range of wavelengths, the annihilator emits a light signal in the second range, a photon energy of the emitted light signal being greater than a photon energy of the light signal received by the photosensitizer. The annihilator is also formulated to implement an energy transfer mechanism to excite the photoinitiator for polymerization of the resin. The excited photoinitiator is formulated to generate at least one polymerizable initiator to cause the polymerization reaction. Related methods, such as three-dimensional printing methods, and materials are also disclosed.

Disclosed are a photomask, an exposure apparatus, and a method of fabricating a three-dimensional semiconductor memory device using the same. The photomask may include a mask substrate, a first mask pattern on the mask substrate, and an optical path modulation substrate. The optical path modulation substrate may include a first region on a portion of the first mask pattern, and a second region on another portion of the first mask pattern. The second region has a thickness that is less than a thickness of the first region.

The present application discloses a display panel, a manufacturing method of a display panel and a mask used thereof. The manufacturing method of the display panel comprises the following steps: doping a photo-initiator in photoresist for manufacturing photo spacers; coating the photoresist on the substrates to form photo spacers, and arranging a shade on the same layer; and respectively irradiating corresponding photo spacers by at least two types of light rays of different wavelengths, to control the photo-initiator so as to enable different photo spacers to have different shrinkages.

A real time inspection and correction system and method for additive manufacturing process is described. The method may include operating a direct writing device configured to deposit material on a substrate through a tip to provide a portion of a product according to initial parameter values, receiving a hyperspectral image frame including a plurality of spectral images of the deposited material, processing the received hyperspectral image frame to determine a characteristic of the deposited material comparing the determined characteristic with a target characteristic determining at least one corrective parameter value to conform the determined characteristic to the target characteristic updating at least one of the initial parameter values with the corrective parameter values, and operating the direct writing device to deposit additional material on the substrate according to the corrective parameter value.

A system including a container for holding a photosensitive medium adapted to change states upon exposure to a light source, an optical imaging system, configured to move above the container holding the photosensitive medium, and having the light source, and a control system configured to: slice a digital model of a three-dimensional object into a slice having a cross-section, generate a build cross-section by filling a two-dimensional image with one or more copies of the cross-section, add to the build cross-section a conformal lattice to fill space in the build cross-section around the one or more copies of the cross-section, and control movement of the optical imaging system above the container to cure a portion of the photosensitive medium corresponding to the build cross-section to produce a layer of a three-dimensional object.

An exposure method is provided. The exposure method includes coating a photo-curable material on a substrate, and exposing a portion of the photo-curable material by providing a first light source through an optical fiber to form a first photo-cured material. The optical fiber includes a light output end and a cone portion that tapers toward the light output end. The photo-curable material not exposed by the first light source is removed while leaving the first photo-cured material. Exposure equipment for performing the exposure method and a 3-dimensional structure formed thereby are also described.

A stereolithography apparatus (1) for generating a three-dimensional object (2), comprising: an optical unit (4) for projecting an image towards the photocurable substance (3) for hardening the photocurable substance (3) deposited in the focus layer (5); a control unit (6), characterized by further comprising: a detection unit (7) which comprises: a detection means (8) movably arranged in a detection region (9) for detecting during the generation process or in a generation-pause the image projected by the optical unit (4) and for outputting a detection signal; and a first driving means (10) for moving the detection means (8) into or out of the detection region (9), wherein the optical unit (4) comprises: a second driving means (11) linked to the optical unit (4) for moving the focus layer (5) into or out of the detection region (9), wherein the control unit (6) adjusts the optical unit (4) and/or modifies the image to be projected based on the signal indicative of the detected image.

Systems and methods are provided that combine an amplitude modulation SLM with a phase modulating SLM in the same optical illumination system. The combination of the amplitude modulation SLM and the phase modulation SLM allows the optical illumination to compensate for the limitations of amplitude modulation SLM by using phase modulating SLM and conversely to compensate for the limitations of phase modulation SLM by using amplitude modulating SLM.

A smart pacifier that performs various functions via smart device connection and application is disclosed. In all of its iterations, there is the ability to put the parent in Bluetooth or other iteration of wireless connection with the pacifier so that each of the features of the pacifier can be accessed through a smart device application, permitting each of them to be operated while the parent is out of sight of the child, and for the pacifier to shut down remotely based on direct sensory interaction with the child.