A multi-beam volumetric resin curing system and method for whole-volume additive manufacturing of an object includes a bath containing a photosensitive resin, a light source for producing a light beam, and a spatial light modulator which produces a phase- or intensity-modulated light beam by impressing a phase profile or intensity profile of an image onto a light beam received from the light source. The system and method also include projection optics which then produces multiple sub-image beams from the modulated light beam which are projected to intersect each other in the photosensitive resin to cure select volumetric regions of the resin in a whole-volume three-dimensional pattern representing the object.

A system and method may utilize holography to facilitate fabrication techniques such as 3D printing and lithography. The system may include a light source, a hologram of an original object or lithographic pattern recorded in a holographic medium, and a target such as a reservoir of photosensitive material or a photosensitive material attached to a substrate. Illuminating the hologram with the appropriate light source may cause a holographic image of the original object or lithographic pattern to form on the photosensitive material within the reservoir or on the substrate. Formation of the holographic image may result in the formation of a new object from the photosensitive material, or may facilitate removal or retention of photosensitive material as part of a lithographic process.

A method and a device for compensating a surface error of a holographic grating substrate based on scanning and exposure technology relates to a technical field of grating development. The method and the device adopt surface error compensation technology based on phase modulation of interference fringes of a scanning beam interference lithography system. The method and the device solve a poor grating diffraction wavefront quality caused by a surface processing error in a field of holographic grating research and improves full-aperture diffraction wavefront quality of a grating. Through coordination between feedback of the displacement measurement apparatus for the position of the two-dimensional worktop and the modulation of the scanning beam interference lithography system, full-aperture compensation of the surface error of the holographic grating substrate is achieved, which not only reduces processing accuracy requirements for the holographic grating substrate, but also improves the full-aperture diffraction wavefront quality of the grating.

A high-resolution PSL system and method incorporating one or more of the following features with a standard PSL system using a SLM projected digital image to form components in a stereolithographic bath: a far-field superlens for producing sub-diffraction-limited features, multiple spatial light modulators (SLM) to generate spatially-controlled three-dimensional interference holograms with nanoscale features, and the integration of microfluidic components into the resin bath of a PSL system to fabricate microstructures of different materials.

Proposed is a method of static scaling of an image in holographic lithography. The method consists of generating a final virtual digital hologram of the original pattern through a sequence of mathematical calculations with participation of a virtual coherent light source having a predetermined wavelength .sub.1 and producing an actual hologram on the basis of the virtual digital hologram of the original pattern. The obtained hologram can be used for forming an actual original pattern in a predetermined size. When it is necessary to produce the original pattern in another size, this can be done by static scaling by merely selecting another wavelength for the laser source with adjustable wavelength. The method allows determining the wavelength range in which scalability is possible with substantially homothetic transformation of the image.

A system for surface patterning using a three dimensional holographic mask includes a light source configured to emit a light beam toward the holographic mask. The holographic mask can be formed as a topographical pattern on a transparent mask substrate. A semiconductor substrate can be positioned on an opposite site of the holographic mask as the light source and can be spaced apart from the holographic mask. The system can also include a base for supporting the semiconductor substrate.

A hologram data generation system is a system that generates hologram data for realizing a hologram used for light modulation in a spatial light modulator, and includes an acquisition unit configured to acquire target information indicating an emitted light intensity distribution that is a target of emitted light from a hologram, a determination unit configured to determine a generation method used for generating the hologram data according to a type of intensity distribution indicated by the target information acquired by the acquisition unit, and a generation unit configured to generate the hologram data from the target information acquired by the acquisition unit by the generation method determined by the determination unit.

A method for manufacturing a radial or azimuthal polarization conversion component comprises the steps of: placing a holographic recording material between two right-angle prisms, wherein the holographic recording material is divided into at least four sector-shaped areas and is partially shielded, and only one of the sector-shaped areas is exposed each time; allowing a recording light to pass through the right-angle prisms and the exposed sector-shaped area of the holographic recording material and to interfere with a reflected object light on the holographic recording material; rotating the holographic recording material to expose the other sector-shaped areas one by one to be constructed for manufacturing volume holograms with diffraction angles of 48.19 degrees, 60 degrees or about 85 degrees.

A method and a device for compensating a surface error of a holographic grating substrate based on scanning and exposure technology relates to a technical field of grating development. The method and the device adopt surface error compensation technology based on phase modulation of interference fringes of a scanning beam interference lithography system. The method and the device solve a poor grating diffraction wavefront quality caused by a surface processing error in a field of holographic grating research and improves full-aperture diffraction wavefront quality of a grating. Through coordination between feedback of the displacement measurement apparatus for the position of the two-dimensional worktop and the modulation of the scanning beam interference lithography system, full-aperture compensation of the surface error of the holographic grating substrate is achieved, which not only reduces processing accuracy requirements for the holographic grating substrate, but also improves the full-aperture diffraction wavefront quality of the grating.

Provided herein are methods and systems for improving performance of three-dimensional printing systems, which may include: printing a first portion of the 3D object using a first parameter set and a first light beam, wherein the first parameter set includes at least one first parameter corresponding to a first optical property of the first light beam; and printing a second portion of the 3D In object different from the first portion using a second parameter set and a second light beam, wherein the second parameter set includes at least one second parameter corresponding to a second optical property of the second light beam, wherein the second parameter set is different from the first parameter set, wherein the second optical property is different from the first optical property, to yield at least at least a portion of the 3D object comprising the first portion and the second portion.