G03H2240/11

Spectrometers having a fringe tilted grating
12345949 · 2025-07-01 · ·

The technology provides a spectroscopy system having a fringe tilted grating that varies a refractive index to diffract light. The diffracting mechanism may be formed by modulating a refractive index to produce fringe planes that are oriented relative to each other through a depth of the grating material The spectroscopy system includes a detector that converts optical signals into electrical signals to render spectral data. The spectroscopy system employs the fringe tilted grating to minimize fictitious Raman peaks that correspond to a fluorescence response signature.

SPECTROMETERS HAVING A CUSTOM SLIT WIDTH
20250306336 · 2025-10-02 ·

The technology provides a method and apparatus for standardizing spectral resolution across multiple spectrometers using custom input slit dimensions. A plate with a slit may be replaced to provide various slit widths to obtain desired spectrometer resolution. Alternatively, the plate may include an adjustable slit width that is mechanically adjusted over a desired range of values. The slit width may be adjusted by discrete increment amounts determined based on an end application. A resolution of a tunable spectrometer may be calibrated to match a reference spectrometer by customizing a slit width value. The technology enhances the accuracy of spectral classification algorithms by minimizing variability of Raman spectra introduced by spectrometer component differences in lenses, gratings, and detectors, for example.

MANUFACTURING METHOD, APPARATUS AND HOLOGRAM PLATE
20260029750 · 2026-01-29 ·

In one embodiment, a method for manufacturing a holographic plate includes providing recording geometry optics, providing a photopolymer and illuminating the photopolymer simultaneously with a first laser beam and a second laser beam thereby generating a holographic pattern in a pattern area of the photopolymer, wherein the illuminated photopolymer results in the holographic plate.

Thin film optics
12560751 · 2026-02-24 · ·

A method of manufacturing a thin film optical apparatus includes providing a substrate and applying an alignment layer over the substrate. The alignment layer ranges from about 50 to 100 nm in thickness. The method includes imprinting a hologram with a desired optic pattern onto the alignment layer and applying at least one layer of mesogen material over the alignment layer.