In a mass flow control system which comprises a first apparatus that is a mass flow controller, an external sensor that is at least one detection means constituting a second apparatus that is an apparatus disposed outside said first apparatus and at least one control section prepared in either one or both of housings of said first apparatus and said second apparatus, and is configured so as to control a flow rate of fluid flowing through a channel, the control section is configured such that opening of a flow control valve can be controlled based on at least an external signal that is a detection signal output from the external sensor.

An apparatus, method and system providing for calibration and/or control of a liquid dispensing system is disclosed. The hand-held calibration auditing tool includes a flow meter (36-37) with inlets adapted for quick connection to one or more liquid inputs and/or liquid outputs of a liquid dispensing system (10). A sensor (94-95) having a data output of liquid flow information for a liquid input to the dispensing system (10) is operably connected to a controller (12) to receive the liquid flow information for the liquid input. The controller (12) provides a dilution rate and other liquid flow information for a liquid product input to a dispenser. The tool may include any number of flow meters, and may also include a flow meter connected to an outlet of a dispenser (22) for providing flow information.

Disclosed is a method for the batch-based manufacture of a flowable coating material, in particular water-based or solvent-containing paint, from a plurality of components. The method includes feeding batch components into a process mixing container, mixing the components in the process mixing container to form a mixture having a preliminary composition, transferring at least part of the mixture having the preliminary composition from the process mixing container into a reception container, ascertaining an actual state of the mixture having the preliminary composition during transfer into the reception container, determining a deviation of the actual state of the mixture having the preliminary composition from a predefined setpoint state, ascertaining an adjustment quantity for the components required to reach the setpoint state, and topping up the adjustment quantity of the components into the preliminary mixture, while the preliminary mixture is being transferred from the process mixing container into the reception container.

Implementations of the present disclosure generally relate to one or more flow ratio controllers and one or more gas injection inserts in the semiconductor processing chamber. In one implementation, an apparatus includes a first flow ratio controller including a first plurality of flow controllers, a second flow ratio controller including a second plurality of flow controllers, and a gas injection insert including a first portion and a second portion. The first portion includes a first plurality of channels and the second portion includes a second plurality of channels. The apparatus further includes a plurality of gas lines connecting the first and second pluralities of flow controllers to the first and second pluralities of channels. One or more gas lines of the plurality of gas lines are each connected to a channel of the first plurality of channels and a channel of the second plurality of channels.

Implementations of the present disclosure generally relate to one or more flow ratio controllers and one or more gas injection inserts in the semiconductor processing chamber. In one implementation, an apparatus includes a first flow ratio controller including a first plurality of flow controllers, a second flow ratio controller including a second plurality of flow controllers, and a gas injection insert including a first portion and a second portion. The first portion includes a first plurality of channels and the second portion includes a second plurality of channels. The apparatus further includes a plurality of gas lines connecting the first and second pluralities of flow controllers to the first and second pluralities of channels. One or more gas lines of the plurality of gas lines are each connected to a channel of the first plurality of channels and a channel of the second plurality of channels.

A system and method provides a more precise mole delivery amount of a process gas, for each pulse of a pulse gas delivery, by measuring a concentration of the process gas and controlling the amount of gas mixture delivered in a pulse of gas flow based on the received concentration of the process gas. The control of mole delivery amount for each pulse can be achieved by adjusting flow setpoint, pulse duration, or both.

The present disclosure provides a method for generating a solution, comprising receiving a solution order. The solution order may comprise one or more order parameters for the solution. The solution order may be inputted into a trained algorithm that outputs one or more solution parameters for the solution. The one or more solution parameters may be used to generate the solution comprising a liquid from a plurality of liquids and a solid from a plurality of solids. The solution can meet the one or more order parameters at an accuracy of at least 90%. The solution may be dispensed.

Semiconductor processing systems and methods are provided in which an amount or concentration of a chemical in a chemical mixture contained in a tank is automatically controlled based on a sensed properties of the chemical mixture. In some embodiments, a semiconductor processing system includes a processing tank that is configured to contain a chemical mixture. A chemical sensor is configured to sense one or more properties of the chemical mixture. The system further includes an electrically controllable valve that is configured to adjust an amount of the first chemical in the chemical mixture based on the sensed one or more properties of the chemical mixture.

Semiconductor processing systems and methods are provided in which an amount or concentration of a chemical in a chemical mixture contained in a tank is automatically controlled based on a sensed properties of the chemical mixture. In some embodiments, a semiconductor processing system includes a processing tank that is configured to contain a chemical mixture. A chemical sensor is configured to sense one or more properties of the chemical mixture. The system further includes an electrically controllable valve that is configured to adjust an amount of the first chemical in the chemical mixture based on the sensed one or more properties of the chemical mixture.

A method for controlling a system pressure within a closed system includes sending a signal to a pressure control valve corresponding to a pressure set point and actuating the pressure control valve to vary a pilot pressure of a control fluid contained within a pressure control line that is fluidly connected to a pressure regulator. A diaphragm of the pressure regulator is disposed between the pressure control line and a system line and acts on a fluid with the system line to modify the system pressure.