The present invention provides improved methods that allow accurate monitoring and/or control of temperature changes in a microfluidic environment. An advantage of the present invention is that the temperature can be monitored and/or controlled at any location within a microfluidic device, especially where a preparation step, an amplification step and/or a detection step is performed. The invention further provides improved microfluidic devices for practicing the methods disclosed and claimed herein.

A heating platform for heating a wafer is provided. The heating platform includes a support carrier, a detection module and a first heating module. The wafer is supported by the support carrier. The detection module is configured to monitor a surface condition of the wafer supported by the support carrier. The first heating module is disposed at a side of the support carrier. The first heating module includes a plurality of heating units electrically connected to the detection module, and the heating units is arranged in an array. A thermal treatment and a manufacturing method are further provided.

The present disclosure relates to a heating, ventilation, and air conditioning (HVAC) system including a sensor system configured to detect heat indications within a plurality of areas of a conditioned space, wherein the sensor system comprise a thermal light detector, and a controller configured to receive feedback from the sensor system and, based on the feedback, control airflow distribution, via an airflow distribution system, such that airflow management for each of the plurality of areas is individually correlated to a heat indication detected for the respective area.

The present disclosure relates to a heating, ventilation, and air conditioning (HVAC) system including a sensor system configured to detect heat indications within a plurality of areas of a conditioned space, wherein the sensor system comprise a thermal light detector, and a controller configured to receive feedback from the sensor system and, based on the feedback, control airflow distribution, via an airflow distribution system, such that airflow management for each of the plurality of areas is individually correlated to a heat indication detected for the respective area.

A temperature control device for controlling a temperature of a temperature control object is provided. The temperature control device includes a heating mechanism having a heating source configured to heat the temperature control object, a cooling mechanism having a cooling source configured to cool the temperature control object, an infrared sensor configured to measure the temperature of the temperature control object, and a temperature controller configured to allow a control system including a sliding mode control to control the heating mechanism and the cooling mechanism based on a measurement signal from the infrared sensor and perform a feedback control of the temperature of the temperature control object.

A temperature control device for controlling a temperature of a temperature control object is provided. The temperature control device includes a heating mechanism having a heating source configured to heat the temperature control object, a cooling mechanism having a cooling source configured to cool the temperature control object, an infrared sensor configured to measure the temperature of the temperature control object, and a temperature controller configured to allow a control system including a sliding mode control to control the heating mechanism and the cooling mechanism based on a measurement signal from the infrared sensor and perform a feedback control of the temperature of the temperature control object.

A heating platform for heating a wafer is provided. The heating platform includes a support carrier, a detection module and a first heating module. The wafer is supported by the support carrier. The detection module is configured to monitor a surface condition of the wafer supported by the support carrier. The first heating module is disposed at a side of the support carrier. The first heating module includes a plurality of heating units electrically connected to the detection module, and the heating units is arranged in an array. A thermal treatment and a manufacturing method are further provided.

The present disclosure relates to a heating, ventilation, and air conditioning (HVAC) system including a sensor system configured to detect heat indications within a plurality of areas of a conditioned space, wherein the sensor system comprise a thermal light detector, and a controller configured to receive feedback from the sensor system and, based on the feedback, control airflow distribution, via an airflow distribution system, such that airflow management for each of the plurality of areas is individually correlated to a heat indication detected for the respective area.

The present disclosure relates to a heating, ventilation, and air conditioning (HVAC) system including a sensor system configured to detect heat indications within a plurality of areas of a conditioned space, wherein the sensor system comprise a thermal light detector, and a controller configured to receive feedback from the sensor system and, based on the feedback, control airflow distribution, via an airflow distribution system, such that airflow management for each of the plurality of areas is individually correlated to a heat indication detected for the respective area.

A set for controlling the temperature, characterised in that it comprises a source of electromagnetic waves (1), like a laser or a diode, or an ultrasound generator connected by wires to a specialised controller (3) with a microprocessor connected by wires to a thermal radiation detector (2), like a pyroelectric detector or a thermocouple detector, the source of electromagnetic waves and the thermal radiation detector being placed at an angle a between 0 and 180 with respect to each other, and a method for generating the profiles of radiation wavefronts and the use of the set to generate the profiles of temperature fields using the profiles of wavefronts.