A method for generating a circuit layout includes generating a plurality of symbols. Each of the plurality of symbols identifies one of multiple versions of code describing a circuit layout. The method also includes loading the plurality of symbols into a design platform used to compile the code describing the circuit layout. The design platform has evaluators for the multiple versions of the code. The method further includes generating the circuit layout described by the code using the design platform.

Embodiments of the invention include protecting against antenna violations in a macro having a clock mesh. Aspects include obtaining a design of the macro, the design including a clock layer having a plurality of clock pins and determining a longest vertical wire and a longest horizontal wire allowed based on a design of the clock mesh. Aspects also include identifying, based at least in part on the longest vertical wire and the longest horizontal wire, a plurality of checkbox regions for a clock pin of the plurality of clock pins and calculating a total diffusion area for each of the plurality of checkbox regions. Aspects further include adding, to the design of the macro, an antenna diode to the clock pin based on a determination that the total diffusion area for any of the plurality of checkbox regions is less than a threshold value.

Embodiments of the invention include protecting against antenna violations in a macro having a clock mesh. Aspects include obtaining a design of the macro, the design including a clock layer having a plurality of clock pins and determining a longest vertical wire and a longest horizontal wire allowed based on a design of the clock mesh. Aspects also include identifying, based at least in part on the longest vertical wire and the longest horizontal wire, a plurality of checkbox regions for a clock pin of the plurality of clock pins and calculating a total diffusion area for each of the plurality of checkbox regions. Aspects further include adding, to the design of the macro, an antenna diode to the clock pin based on a determination that the total diffusion area for any of the plurality of checkbox regions is less than a threshold value.

Computer-implemented systems and methods for eliminating geometrical design rule violations, maintaining mask layout electrical connectivity, reliability verification, and design for manufacturing structural correctness of a mask layout block are provided. Exemplary systems and methods include comparing a feature dimension in a mask layout data file with a design rule in a reference rule file and identifying a design rule violation of a mask layout block if the feature dimension does not match the design rule. Methods may further include automatically correcting the design rule violation by modifying the feature dimension so the feature dimension matches the design rule. A design rule auto-correction tool may be provided and be configured to compare a feature dimension in a mask layout data file with a design rule in a reference rule file and correct the design rule violation. Disclosed embodiments advantageously correct all design rules including dependency rules.

Computer-implemented systems and methods for eliminating geometrical design rule violations, maintaining mask layout electrical connectivity, reliability verification, and design for manufacturing structural correctness of a mask layout block are provided. Exemplary systems and methods include comparing a feature dimension in a mask layout data file with a design rule in a reference rule file and identifying a design rule violation of a mask layout block if the feature dimension does not match the design rule. Methods may further include automatically correcting the design rule violation by modifying the feature dimension so the feature dimension matches the design rule. A design rule auto-correction tool may be provided and be configured to compare a feature dimension in a mask layout data file with a design rule in a reference rule file and correct the design rule violation. Disclosed embodiments advantageously correct all design rules including dependency rules.

A method in certain embodiments includes using a computer system that includes an EDA tool to generate a layout of an IC device; searching, using a statistical method such as Bayesian optimization process, for one or more input variable parameters, such as the dimensions of the IC device and the dimensions of the voltage areas in the IC device, that results in an optimal characteristic, such as power, performance or area (PPA) of the IC device. A computer system including one or more EDAs configured to perform the method is also disclosed.

A method in certain embodiments includes using a computer system that includes an EDA tool to generate a layout of an IC device; searching, using a statistical method such as Bayesian optimization process, for one or more input variable parameters, such as the dimensions of the IC device and the dimensions of the voltage areas in the IC device, that results in an optimal characteristic, such as power, performance or area (PPA) of the IC device. A computer system including one or more EDAs configured to perform the method is also disclosed.

Systems and methods for improving design performance of a layout design through placement of functional and spare cells by leveraging layout dependent effect (LDE) is disclosed. The method includes the steps of: importing a plurality of technology files associated with the layout design into an EDA system; importing a netlist associated with the layout design into the EDA system; importing a standard cell library containing pattern-S timing information of the functional cells and the spare cells; performing floorplan and spare cell insertion, wherein the spare cells are distributed uniformly across the floorplan; and conducting placement and optimization through re-placement of the at least one functional cells and the spare cells to form pattern-S with at least one timing critical cells to improve an overall timing performance of the layout design. According to some embodiments, conducting placement and optimization further includes: moving the at least one spare cells to locations to abut the at least one timing critical cells to form pattern-S for each of the at least one timing critical cells.

Embodiments include herein are directed towards a method for static timing analysis. Embodiments included herein may include providing, using at least one processor, a database of predefined script tags and causing a display of a script at a graphical user interface. Embodiments may also include receiving an insertion of at least one tag from the database within the script and generating one or more timing reports based upon, at least in part, the script and the at least one tag.

Embodiments include herein are directed towards a method for static timing analysis. Embodiments included herein may include providing, using at least one processor, a database of predefined script tags and causing a display of a script at a graphical user interface. Embodiments may also include receiving an insertion of at least one tag from the database within the script and generating one or more timing reports based upon, at least in part, the script and the at least one tag.