According to one embodiment, a magnetic recording medium includes a silicon oxide underlayer having a recess pattern having a plurality of recesses, a nonmagnetic underlayer having a first hole pattern having a plurality of holes corresponding to the recess pattern, and a magnetic recording layer having a second hole pattern having a plurality of holes connected with the first hole pattern. The silicon oxide underlayer, the nonmagnetic underlayer, and the magnetic recording layer are formed in order on the substrate.

Provided herein is a method, including a) transferring an initial pattern of an initial template to a substrate; b) performing block copolymer self-assembly over the substrate with a density multiplication factor k; c) creating a subsequent pattern in a subsequent template with the density multiplication factor k; and d) repeating steps a)-c) with the subsequent template as the initial template until a design specification for the subsequent pattern with respect to pattern density and pattern resolution is met.

Provided herein is a method, including a) transferring an initial pattern of an initial template to a substrate; b) performing block copolymer self-assembly over the substrate with a density multiplication factor k; c) creating a subsequent pattern in a subsequent template with the density multiplication factor k; and d) repeating steps a)-c) with the subsequent template as the initial template until a design specification for the subsequent pattern with respect to pattern density and pattern resolution is met.

Provided herein is an apparatus, including a first region of a substrate corresponding to a data region in a patterned recording medium; a first set of protrusions etched out of the first region of the substrate, wherein the protrusions of the first set of protrusions are rectangle shaped; a second region of the substrate corresponding to a servo region in a patterned recording medium; and a second set of protrusions etched out of the second region of the substrate, wherein the second set of protrusions includes radial lines etched into the substrate across chevrons etched out of the substrate.

Provided herein is an apparatus, including a substrate; an etch stop layer overlying the substrate, wherein the etch stop layer is substantially resistant to etching conditions; and a patterned layer overlying the etch stop layer, wherein the patterned layer is substantially labile to the etching conditions, and wherein the patterned layer comprises a number of features including substantially consistent feature profiles among regions of high feature density and regions of low feature density.

Provided herein is an apparatus, including a substrate; an etch stop layer overlying the substrate, wherein the etch stop layer is substantially resistant to etching conditions; and a patterned layer overlying the etch stop layer, wherein the patterned layer is substantially labile to the etching conditions, and wherein the patterned layer comprises a number of features including substantially consistent feature profiles among regions of high feature density and regions of low feature density.

Provided herein is a method including forming a data zone guiding pattern and forming a servo zone guiding pattern. A servo pattern and a data pattern are simultaneously formed. Directed self-assembly of block copolymers is guided by the data zone guiding pattern and the servo zone guiding pattern.

Provided herein is a method including forming a data zone guiding pattern and forming a servo zone guiding pattern. A servo pattern and a data pattern are simultaneously formed. Directed self-assembly of block copolymers is guided by the data zone guiding pattern and the servo zone guiding pattern.

To provide a heating device capable of heating a surface of a workpiece having a disk shape with a hole in the center at high productivity and uniformity, a heating device for heating a workpiece by irradiating workpiece with light has a feature that I.sub.1/I.sub.2 is 1.00 or less, and I.sub.3/I.sub.2 is 0.90 or more 1.50 or less, where I.sub.1 represents average amount of light irradiation on first region in which the hole of the workpiece is formed, I.sub.2 represents average amount of light irradiation on second region surrounding first region from outer side, I.sub.3 represents average amount of light irradiation on third region extending from outer periphery of second region to outer periphery of workpiece, provided that the radius of outer periphery of second region is 0.30R.sub.H+0.70R.sub.W, where R.sub.H represents the radius of the hole, and R.sub.W represents the radius of outer periphery of the workpiece and third region.

To provide a heating device capable of heating a surface of a workpiece having a disk shape with a hole in the center at high productivity and uniformity, a heating device for heating a workpiece by irradiating workpiece with light has a feature that I.sub.1/I.sub.2 is 1.00 or less, and I.sub.3/I.sub.2 is 0.90 or more 1.50 or less, where I.sub.1 represents average amount of light irradiation on first region in which the hole of the workpiece is formed, I.sub.2 represents average amount of light irradiation on second region surrounding first region from outer side, I.sub.3 represents average amount of light irradiation on third region extending from outer periphery of second region to outer periphery of workpiece, provided that the radius of outer periphery of second region is 0.30R.sub.H+0.70R.sub.W, where R.sub.H represents the radius of the hole, and R.sub.W represents the radius of outer periphery of the workpiece and third region.