Patent classifications
G11B5/855
Microstructure patterned surfaces for integrated lead disk drive head suspensions
Disk drive head suspension components having microstructured surfaces and a method for making the components. One embodiment of the method includes depositing a layer of photoimageable polymer having an associated set of process parameters including a minimum resolution and exposing the photoimageable polymer through a photomask having a microstructure-producing region with features below the minimum resolution for the photoimageable polymer. The exposed photoimageable polymer is developed to produce a layer of polymer having a thickness and a microstructured surface region with depressions that are less than the thickness of the polymer. In one embodiment the photomask has a microstructure-producing region with features sized and spaced between about 1 m and 10 m. Microstructured surfaces on structures such as flying leads, flying termination pads, cover coat layers and at insulating layer-trace interfaces and insulating layer-cover coat interfaces can be manufactured.
Imprint method
The present invention provides an imprint apparatus comprising a deforming unit configured to deform a pattern surface by applying a force to a mold, a measuring unit configured to measure a deformation amount of the pattern surface, a control unit configured to control the measuring unit to measure the deformation amount in each of a plurality of states in which a plurality of the forces are applied to the mold, a calculation unit configured to calculate a rate of change in the deformation amount as a function of a change in the force applied to the mold, and a calibration unit configured to calibrate a control profile describing a time in the imprint process, and the force applied to the mold, based on the rate of change in the deformation amount.
Imprint method
The present invention provides an imprint apparatus comprising a deforming unit configured to deform a pattern surface by applying a force to a mold, a measuring unit configured to measure a deformation amount of the pattern surface, a control unit configured to control the measuring unit to measure the deformation amount in each of a plurality of states in which a plurality of the forces are applied to the mold, a calculation unit configured to calculate a rate of change in the deformation amount as a function of a change in the force applied to the mold, and a calibration unit configured to calibrate a control profile describing a time in the imprint process, and the force applied to the mold, based on the rate of change in the deformation amount.
Density multiplication and improved lithography by directed block copolymer assembly
Methods to pattern substrates with dense periodic nanostructures that combine top-down lithographic tools and self-assembling block copolymer materials are provided. According to various embodiments, the methods involve chemically patterning a substrate, depositing a block copolymer film on the chemically patterned imaging layer, and allowing the block copolymer to self-assemble in the presence of the chemically patterned substrate, thereby producing a pattern in the block copolymer film that is improved over the substrate pattern in terms feature size, shape, and uniformity, as well as regular spacing between arrays of features and between the features within each array compared to the substrate pattern. In certain embodiments, the density and total number of pattern features in the block copolymer film is also increased. High density and quality nanoimprint templates and other nanopatterned structures are also provided.
Density multiplication and improved lithography by directed block copolymer assembly
Methods to pattern substrates with dense periodic nanostructures that combine top-down lithographic tools and self-assembling block copolymer materials are provided. According to various embodiments, the methods involve chemically patterning a substrate, depositing a block copolymer film on the chemically patterned imaging layer, and allowing the block copolymer to self-assemble in the presence of the chemically patterned substrate, thereby producing a pattern in the block copolymer film that is improved over the substrate pattern in terms feature size, shape, and uniformity, as well as regular spacing between arrays of features and between the features within each array compared to the substrate pattern. In certain embodiments, the density and total number of pattern features in the block copolymer film is also increased. High density and quality nanoimprint templates and other nanopatterned structures are also provided.
All-nanoparticle concave diffraction grating fabricated by self-assembly onto magnetically-recorded templates
Methods for magnetic recording are provided. The method can include: assembling a plurality of nanoparticles into a pattern on a disc; applying a polymer composition onto the pattern of nanoparticles; curing the polymer composition to form a polymer film on the disc, wherein the plurality of nanoparticles are immobilized in the pattern within the polymer film upon curing; and removing the polymer film containing the plurality of nanoparticles in the pattern. Diffraction gratings are also provided that can include a polymeric film comprising a plurality of nanoparticles immobilized in a pattern, wherein the polymer film defines a curvature.
All-nanoparticle concave diffraction grating fabricated by self-assembly onto magnetically-recorded templates
Methods for magnetic recording are provided. The method can include: assembling a plurality of nanoparticles into a pattern on a disc; applying a polymer composition onto the pattern of nanoparticles; curing the polymer composition to form a polymer film on the disc, wherein the plurality of nanoparticles are immobilized in the pattern within the polymer film upon curing; and removing the polymer film containing the plurality of nanoparticles in the pattern. Diffraction gratings are also provided that can include a polymeric film comprising a plurality of nanoparticles immobilized in a pattern, wherein the polymer film defines a curvature.
Structures and methods for templated growth of high areal density heat assisted magnetic recording media
Methods are disclosed for increasing areal density in Heat Assisted Magnetic Recording (HAMR) data storage systems by controlling the media layer grain size, grain size distribution, and pitch via templating techniques that are compatible with the high temperature HAMR media deposition. Embodiments include using current HAMR media seed layers as well as additionally introduced interlayers for the templating process. Topographic as well as chemical templating methods are disclosed that may employ nanoimprint technology or nanoparticle self-assembly among other patterning techniques.
Structures and methods for templated growth of high areal density heat assisted magnetic recording media
Methods are disclosed for increasing areal density in Heat Assisted Magnetic Recording (HAMR) data storage systems by controlling the media layer grain size, grain size distribution, and pitch via templating techniques that are compatible with the high temperature HAMR media deposition. Embodiments include using current HAMR media seed layers as well as additionally introduced interlayers for the templating process. Topographic as well as chemical templating methods are disclosed that may employ nanoimprint technology or nanoparticle self-assembly among other patterning techniques.
Imprint apparatus and method of manufacturing article
An imprint apparatus includes a nozzle including a discharge outlet which discharges imprint material onto the substrate, a supply unit configured to supply a gas which accelerates filling of a pattern of a mold with the imprint material, and a gas unit provided with the nozzle. The gas unit performs gas supply or exhaust with respect to a second space around a first space between the nozzle and a portion of the substrate which faces the nozzle and is conveyed under the nozzle in order to suppress the gas from flowing into the first space.