[Object] To provide a transfer apparatus that can shorten a cycle time and improve processing capability. [Solving Means] A transfer apparatus according to an embodiment of the present technology includes a work table, a transfer robot, and at least one mounting unit. The work table supports at least one electronic device. The transfer robot transfers a work to be mounted to the electronic device. The mounting unit includes a support and a driving unit. The support supports the work transferred by the transfer robot. The driving unit transfers the support toward the electronic device on the work table.

A method for taking, placing and conveying materials includes taking materials: a clamping device of a mechanical gripper is controlled by a control cabinet to move onto a storage cabinet to open a storage unit and to take materials away; placing the materials: the control cabinet controls processing units of a processing bin to open, the clamping device places the materials on the processing units, and the processing units are closed; processing the materials: the materials are processed by the processing units; and collecting the materials: the control cabinet controls the processing units of the processing bin to open, and the materials on the processing units are taken away by the clamping device and are placed back into the storage unit of the storage cabinet. The method for taking, placing and conveying materials is highly automated low in labor intensity, and high in work efficiency.

Durable seamless replication tools are disclosed for replication of seamless relief patterns in desired media, for example in optical recording or data storage media. Methods of making such durable replication tools are disclosed, including preparing a recording substrate on the inner surface of a support cylinder, recording and developing a relief pattern in the substrate, creating a durable negative relief replica of the pattern, extracting the resulting durable tool sleeve from a processing cell, and mounting the tool sleeve on a mounting fixture. Apparatus are disclosed for fabricating such seamless replication tools, including systems for recording a desired relief pattern on a photosensitive layer on an inner surface of a support cylinder. Also disclosed are electrodeposition cells for forming a durable tool sleeve having a desired relief pattern. The replication tool relief features may have critical dimensions down to the micron and nanometer regime.

Durable seamless replication tools are disclosed for replication of seamless relief patterns in desired media, for example in optical recording or data storage media. Methods of making such durable replication tools are disclosed, including preparing a recording substrate on the inner surface of a support cylinder, recording and developing a relief pattern in the substrate, creating a durable negative relief replica of the pattern, extracting the resulting durable tool sleeve from a processing cell, and mounting the tool sleeve on a mounting fixture. Apparatus are disclosed for fabricating such seamless replication tools, including systems for recording a desired relief pattern on a photosensitive layer on an inner surface of a support cylinder. Also disclosed are electrodeposition cells for forming a durable tool sleeve having a desired relief pattern. The replication tool relief features may have critical dimensions down to the micron and nanometer regime.

An SbTe-based alloy sintered compact sputtering target having Sb and Te as main components and which contains 0.1 to 30 at % of carbon or boron and comprises a uniform mixed structure of SbTe-based alloy particles and fine carbon (C) or boron (B) particles is provided. An average grain size of the SbTe-based alloy particles is 3 m or less and a standard deviation thereof is less than 1.00. An average grain size of the C or B particles is 0.5 m or less and a standard deviation thereof is less than 0.20. When the average grain size of the SbTe-based alloy particles is X and the average grain size of the carbon or boron particles is Y, Y/X is within a range of 0.1 to 0.5. This provides an improved SbTe-based alloy sputtering target that inhibits generation of cracks in the sintered target and prevents generation of arcing during sputtering.

Provided is an optical recording medium including two or more recording layers, and a light irradiation surface that is irradiated with light for recording an information signal on the two or more recording layers. Among the two or more recording layers, at least one layer other than a layer located on the deepest side from the light irradiation surface includes an oxide of a metal A, an oxide of a metal B, and an oxide of a metal C. The metal A is at least one kind among W, Mo, and Zr, the metal B is Mn, and the metal C is at least one kind among Cu, Ag, and Ni. Ratios of the metal A, the metal B, and the metal C satisfy a relationship of 0.46x1 (provided that, x1=a/(b+0.8c), a representing an atomic ratio [atom %] of the metal A with respect to the sum of the metal A, the metal B, and the metal C, b representing an atomic ratio [atom %] of the metal B with respect to the sum of the metal A, the metal B, and the metal C, and c representing an atomic ratio [atom %] of the metal C with respect to the sum of the metal A, the metal B, and the metal C.

Provided is an optical recording medium including two or more recording layers, and a light irradiation surface that is irradiated with light for recording an information signal on the two or more recording layers. Among the two or more recording layers, at least one layer other than a layer located on the deepest side from the light irradiation surface includes an oxide of a metal A, an oxide of a metal B, and an oxide of a metal C. The metal A is at least one kind among W, Mo, and Zr, the metal B is Mn, and the metal C is at least one kind among Cu, Ag, and Ni. Ratios of the metal A, the metal B, and the metal C satisfy a relationship of 0.46x1 (provided that, x1=a/(b+0.8c), a representing an atomic ratio [atom %] of the metal A with respect to the sum of the metal A, the metal B, and the metal C, b representing an atomic ratio [atom %] of the metal B with respect to the sum of the metal A, the metal B, and the metal C, and c representing an atomic ratio [atom %] of the metal C with respect to the sum of the metal A, the metal B, and the metal C.

A method for manufacturing a glass plate includes processing for irradiating an inner circumferential edge surface extending along an inner hole in an annular glass plate with a laser beam along the inner circumferential edge surface. When the inner circumferential edge surface is irradiated with the laser beam, the laser beam is concentrated by a condenser lens and formed into diffused light, and the inner circumferential edge surface is irradiated with the diffused light from a direction inclined with respect to a main surface of the glass plate.

Provided is an optical recording medium capable of shortening tact time. The optical recording medium includes at least one recording layer. The recording layer contains an oxide of Bi.

Provided is an optical recording medium capable of shortening tact time. The optical recording medium includes at least one recording layer. The recording layer contains an oxide of Bi.