An example device in accordance with an aspect of the present disclosure includes a memory module having a voltage regulator module (VRM) to receive input power and deliver output power to components of the memory module at a first power plane. At least one stitching capacitor is to couple the first power plane to a second power plane.

A memory device occupying a small area is provided. In a memory cell including a reading transistor, a writing transistor, and a capacitor, the writing transistor is provided above the reading transistor. Alternatively, the reading transistor is provided above the writing transistor. An oxide semiconductor is used for a semiconductor layer where a channel of the writing transistor is formed. An oxide semiconductor is used for a semiconductor layer where a channel of the reading transistor is formed. Memory cells are arranged in a matrix.

A memory device occupying a small area is provided. In a memory cell including a reading transistor, a writing transistor, and a capacitor, the writing transistor is provided above the reading transistor. Alternatively, the reading transistor is provided above the writing transistor. An oxide semiconductor is used for a semiconductor layer where a channel of the writing transistor is formed. An oxide semiconductor is used for a semiconductor layer where a channel of the reading transistor is formed. Memory cells are arranged in a matrix.

The embodiments of the present disclosure belong to the technical field of semiconductor manufacturing, and relate to a semiconductor structure and a method for manufacturing a semiconductor structure. Each of a plurality of storage structures in the semiconductor structure includes a plurality of capacitor structures stacked in a direction perpendicular to a substrate, each of the plurality of capacitor structures includes a bottom plate and an top plate which are arranged opposite to each other, and a first dielectric layer located between the bottom plate and the top plate, and the bottom plate and the top plate are both parallel to the substrate, all bottom plates in each of the plurality of storage structures are electrically connected, and all top plates in each of the plurality of storage structures are electrically connected; the bottom plate and the top plate extend in a plane parallel to the substrate.

The embodiments of the present disclosure belong to the technical field of semiconductor manufacturing, and relate to a semiconductor structure and a method for manufacturing a semiconductor structure. Each of a plurality of storage structures in the semiconductor structure includes a plurality of capacitor structures stacked in a direction perpendicular to a substrate, each of the plurality of capacitor structures includes a bottom plate and an top plate which are arranged opposite to each other, and a first dielectric layer located between the bottom plate and the top plate, and the bottom plate and the top plate are both parallel to the substrate, all bottom plates in each of the plurality of storage structures are electrically connected, and all top plates in each of the plurality of storage structures are electrically connected; the bottom plate and the top plate extend in a plane parallel to the substrate.

Various implementations described herein are directed to a circuit for memory applications. The circuit may include a data storage structure having column multiplexor transistors coupled to complementary bitlines. The circuit may include a wordline shape enhancer having a pair of passgate transistors coupled between the complementary bitlines and a capacitive load.

Various implementations described herein are directed to a circuit for memory applications. The circuit may include a data storage structure having column multiplexor transistors coupled to complementary bitlines. The circuit may include a wordline shape enhancer having a pair of passgate transistors coupled between the complementary bitlines and a capacitive load.

A memory bank includes at least one storage module, each storage module including a read-write control circuit, a column decoding circuit and a plurality of storage arrays, the plurality of storage arrays being divided into a first unit and a second unit; a first decoding selective signal line, electrically connected to the column decoding circuit and the storage arrays in the first unit; a second decoding selective signal line, electrically connected to the column decoding circuit and the storage arrays in the second unit; a first data signal line; and a second data signal line.

A memory bank includes at least one storage module, each storage module including a read-write control circuit, a column decoding circuit and a plurality of storage arrays, the plurality of storage arrays being divided into a first unit and a second unit; a first decoding selective signal line, electrically connected to the column decoding circuit and the storage arrays in the first unit; a second decoding selective signal line, electrically connected to the column decoding circuit and the storage arrays in the second unit; a first data signal line; and a second data signal line.

The memory capacity of a DRAM is enhanced. A semiconductor memory device includes a driver circuit including part of a single crystal semiconductor substrate, a multilayer wiring layer provided over the driver circuit, and a memory cell array layer provided over the multilayer wiring layer. That is, the memory cell array overlaps with the driver circuit. Accordingly, the integration degree of the semiconductor memory device can be increased as compared to the case where a driver circuit and a memory cell array are provided in the same plane of a substrate containing a singe crystal semiconductor material.