A memory cell including a memory element comprising an electrolytic insulator in contact with a conductive metal oxide (CMO) is disclosed. The CMO includes a crystalline structure and can comprise a pyrochlore oxide, a conductive binary oxide, a multiple B-site perovskite, and a Ruddlesden-Popper structure. The CMO includes mobile ions that can be transported to/from the electrolytic insulator in response to an electric field of appropriate magnitude and direction generated by a write voltage applied across the electrolytic insulator and CMO. The memory cell can include a non-ohmic device (NOD) that is electrically in series with the memory element. The memory cell can be positioned between a cross-point of conductive array lines in a two-terminal cross-point memory array in a single layer of memory or multiple vertically stacked layers of memory that are fabricated over a substrate that includes active circuitry for data operations on the array layer(s).

An integrated chip has an array of memory cells disposed over a semiconductor substrate and a driver circuit. The driver circuit provides the array with a read voltage that varies in relation to an approximate temperature of the memory array to ameliorate temperature dependencies in read currents. The driver circuit may vary the read voltage in an inverse relationship with temperature. The read voltage may be varied continuous or stepwise and the driver circuit may use a table lookup. Optionally, the driver circuit measures a current and modulates the read voltage until the current is within a target range. The memory cells may be multi-level phase change memory cells that include a plurality phase change element disposed between a bottom electrode and a top electrode. Modulating the read voltage to reduce temperature-dependent current variations is particularly useful for multi-level cells.

A memory device may be provided, including first, second and third electrodes, first and second mask elements and a switching layer. The first mask element may be arranged over a portion of and laterally offset from the first electrode. The second electrode may be arranged over the first mask element. The second mask element may be arranged over the second electrode. The third electrode may be arranged over a portion of and laterally offset from the second mask element. The switching layer may be arranged between the first electrode and the third electrode, along a first side surface of the first mask element, a first side surface of the second electrode and a first side surface of the second mask element.

A memory device may include a substrate having conductivity regions and a channel region. A first voltage line may be arranged over the channel region. Second, third, and fourth voltage lines may each be electrically coupled to a conductivity region. Resistive units may be arranged between the third voltage line and the conductivity region electrically coupled to the third voltage line, and between the fourth voltage line and the conductivity region electrically coupled to the fourth voltage line. A resistance adjusting element may have at least a portion arranged between one of the resistive units and one of the conductivity regions. An amount of the resistance adjusting element between the first resistive unit and the conductivity region electrically coupled to the third voltage line may be different from that between the second resistive unit and the conductivity region electrically coupled to the fourth voltage line.

Disclosed herein are related to a circuit and a method of reading or sensing multiple bits of data stored by a multi-level cell. In one aspect, a first reference circuit is selected from a first set of reference circuits, and a second reference circuit is selected from a second set of reference circuits. Based at least in part on the first reference circuit and the second reference circuit, one or more bits of multiple bits of data stored by a multi-level cell can be determined. According to the determined one or more bits, a third reference circuit from the first set of reference circuits and a fourth reference circuit from the second set of reference circuits can be selected. Based at least in part on the third reference circuit and the fourth reference circuit, additional one or more bits of the multiple bits of data stored by the multi-level cell can be determined.

Structures including non-volatile memory elements and methods of fabricating a structure including non-volatile memory elements. First, second, and third non-volatile memory elements each include a first electrode, a second electrode, and a switching layer between the first electrode and the second electrode. A first bit line is coupled to the first electrode of the first non-volatile memory element and to the first electrode of the second non-volatile memory element. A second bit line is coupled to the first electrode of the third non-volatile memory element.

Disclosed herein are related to a circuit and a method of reading or sensing multiple bits of data stored by a multi-level cell. In one aspect, a first reference circuit is selected from a first set of reference circuits, and a second reference circuit is selected from a second set of reference circuits. Based at least in part on the first reference circuit and the second reference circuit, one or more bits of multiple bits of data stored by a multi-level cell can be determined. According to the determined one or more bits, a third reference circuit from the first set of reference circuits and a fourth reference circuit from the second set of reference circuits can be selected. Based at least in part on the third reference circuit and the fourth reference circuit, additional one or more bits of the multiple bits of data stored by the multi-level cell can be determined.

Use of a NAND array architecture to realize a binary neural network (BNN) allows for matrix multiplication and accumulation to be performed within the memory array. A unit synapse for storing a weight of a BNN is stored in a pair of series connected memory cells. A binary input is applied as a pattern of voltage values on a pair of word lines connected to the unit synapse to perform the multiplication of the input with the weight by determining whether or not the unit synapse conducts. The results of such multiplications are determined by a sense amplifier, with the results accumulated by a counter.

Semiconductor memory is provided wherein a memory cell includes a capacitorless transistor having a floating body configured to store data as charge therein when power is applied to the cell. The cell further includes a nonvolatile memory comprising a resistance change element configured to store data stored in the floating body under any one of a plurality of predetermined conditions. A method of operating semiconductor memory to function as volatile memory, while having the ability to retain stored data when power is discontinued to the semiconductor memory is described.

A method of operating a resistive memory device to increase a read margin includes applying a write pulse to a memory cell such that the memory cell is programmed to a target resistance state, and applying a post-write pulse to the memory cell to increase a resistance of the memory cell that is in the target resistance state, the post-write pulse being applied as a single pulse having at least n stepped voltage levels, n being an integer equal to or more than 2, and an n-th stepped voltage level of the post-write pulse is set to be lower than a minimum threshold voltage level of the target resistance state that is changed by an (n−1)-th stepped voltage level of the post-write pulse.