Embodiments provide improved memory bitcells, memory arrays, and memory architectures. In an embodiment, a memory array includes a plurality of memory cells to store data bits. Each of the plurality of memory cells includes a transistor having drain, source, and gate terminals, and a plurality of program nodes, each of the program nodes charged to a predetermined voltage and coupled to a respective one of a plurality of bit lines. For each memory cell in a subset of the plurality of memory cells, none of the plurality of program nodes is coupled to the drain terminal of the transistor to program the each memory cell in the subset of the plurality of memory cells to store at least one data bit, the at least one data bit is most occurred between the data bits.

The invention provides a multi-Vt vertical power device and a method of making the same. Through patterning a contact mask, a contact structure array having a shared trench gate structure may be formed, and different traversal gaps between an edge of a contact portion of a second conductivity type and an edge of a trench may be formed in the contact structure array. As such, multi-Vt vertical states may be implemented for storing information. The present invention allows making a multi-Vt vertical power device having different Vt's to be capable to store information without additional process steps. Therefore, with respect to the present invention, the process is simple, cost is low, and application field is wide; number of Vt varies to store multi-bit digital information or analog information in the power device; the built-in multi-Vt power MOSFET and IGBT are adapted not only for the high power applications but also for information storage.

This invention provides a multi-Vt vertical power device and a method of making the same. Through a contact mask, a contact structure array having a shared trench gate structure may be formed, the same traversal gaps between an edge of a contact portion of a second conductivity type of the same set and an edge of a trench may be formed in the contact structure array, and different traversal gaps between an edge of the contact portion of the second conductivity type of different sets and an edge of the trench may be formed in the contact structure array. As such, multi-Vt states may be implemented for storing digital information. The present invention allows making a multi-Vt vertical power device having a number of Vt's to be capable of storing same number of bits digital information without additional process steps. Therefore, the built-in multi-Vt power MOSFET and IGBT are adapted not only for the high power applications but also for information storage; simultaneous reading multi-bit information stored in the multi-Vt vertical power device is provided with scanning a voltage of a shared gate and constructing a transconductance.

A circuit includes an array of OTP cells, an array of NVM cells, an amplifier coupled to each of the array of OTP cells and the array of NVM cells, and a control circuit configured to generate one or more control signals. Responsive to the one or more control signals, the amplifier is configured to generate an output voltage based on a current received from the array of OTP cells in a first configuration, and generate the output voltage based on a voltage received from the array of NVM cells in a second configuration.

The present disclosure is drawn to, among other things, an antifuse circuit. The antifuse circuit includes a plurality of antifuse bitcells and a reference resistor. Each antifuse bitcell includes two or more memory bits and a reference resistor. The two or more memory bits are configured to be in a programmed state and at least one unprogrammed state.

The disclosed embodiments provide gradual breakdown memory cell having multiple different dielectrics. In some embodiments, a multi-level one-time-programmable memory cell, comprises: a top electrode; a bottom electrode; and a plurality of dielectric layers disposed between the top and bottom electrodes, wherein at least one of the following is true: at least two of the dielectric layers are of different dielectric materials; and the multi-level one-time-programmable memory cell comprises at least one metal layer, wherein each metal layer is disposed between two of the dielectric layers.

A non-volatile memory includes a cell array, a current supply circuit, a path selecting circuit and a judging circuit. The cell array includes plural multi-level memory cells in an mxn array. The cell array is connected with m word lines and n lines. The current supply circuit provides one of plural reference currents according to a current control value. The path selecting circuit is connected with the current supply circuit and the n bit lines. The judging circuit is connected with the path selecting circuit, and generates n output data. A first path selector of the path selecting circuit is connected with a path selecting circuit and a first bit line. A first judging device of the judging circuit is connected with the first path selector and generates a first output data.

A non-volatile memory includes a cell array, a current supply circuit, a path selecting circuit and a verification circuit. The cell array includes plural multi-level memory cells in an m×n array. The cell array is connected with m word lines and n lines. Each of the plural multi-level memory cells is in one of X storage states. The current supply circuit provides plural reference currents. The path selecting circuit is connected with the current supply circuit and the n bit lines. The verification circuit is connected with the path selecting circuit, and generates n verification signals. A first path selector of the path selecting circuit is connected with a path selecting circuit and a first bit line. A first verification device of the verification circuit is connected with the first path selector and generates a first verification signal.

The present invention discloses a multi-bit-per-cell three-dimensional resistive random-access memory (3D-RRAM.sub.MB). It comprises a plurality of RRAM cells stacked above a semiconductor substrate. Each RRAM cell comprises a RRAM layer, which is switched from a high-resistance state to a low-resistance state during programming. By adjusting the programming current, the programmed RRAMs have different resistances.

Provided is a read-only memory (ROM) device. The ROM device comprises a substrate that has a plurality of vertical transport field effect transistors (VFETs). The ROM device further comprises an un-activated semiconductor layer provided on each VFET. The un-activated semiconductor layer includes implanted dopants that have not been substantially activated.