A memory array arranged as a plurality of memory cells. The memory cells are configured to operate at a determined voltage. A memory management circuitry coupled to the plurality of memory cells tags a first set of the plurality of memory cells as low-voltage cells and tags a second set of the plurality of memory cells as high-voltage cells. A power source provides a low voltage to the first set of memory cells and provides a high voltage to the second set of memory cells based on the tags.

A semiconductor device, the device including: a first level overlaid by a first memory level, where the first memory level includes a first thinned single crystal substrate; a second memory level, the second memory level disposed on top of the first memory level, where the second memory level includes a second thinned single crystal substrate; and a memory control level disposed on top of the second memory level, where the memory control level is bonded to the second memory level, and where the bonded includes oxide to oxide and conductor to conductor bonding.

The present invention relates to a system level test device for memory. A memory module system level tester device according to the present invention makes the motherboard and the memory modules be in contact with each other by using the test tray, thereby minimizing a time required for attaching and detaching the memory modules and omitting an additional configuration for attaching and detaching the memory modules. Accordingly, space limitations can be minimized, and as a result, test units can be arranged in two or more stages in the vertical direction to configure a compact layout to thereby increase space efficiency.

An integrated memory assembly comprises a memory die and a control die bonded to the memory die. The memory die includes a memory structure of non-volatile memory cells. The control die is configured to program user data to and read user data from the memory die based on one or more operational parameters. The control die is configured to calibrate the one or more operational parameters for the memory die. The control die is also configured to perform testing of the memory die using the calibrated one or more operational parameters.

A method for trimming analog temperature sensors. First, raise a temperature of a temperature sensor to a highest temperature of a qualification temperature range. Then, trim the temperature sensor such that a high temperature code generated by the temperature sensor represents an actual temperature reported by the temperature sensor at the highest temperature. Next, lower the temperature of the temperature sensor to a lowest temperature of the qualification temperature range. Determine a slope error between the high temperature code and a low temperature code generated by the temperature sensor at the lowest temperature. Finally, determine a correction function that compensates for the slope error of measured temperature codes generated by the temperature sensor for temperatures across the qualification temperature range.

One aspect of this description relates to a memory cell including a first layer including a first gate structure, a second gate structure, a third gate structure, and a fourth gate structure. The memory cell includes a second layer including a first active structure and a second active structure. The first gate structure overlaps the first active structure to form a first access transistor, the second gate structure overlaps the first active structure to form a first pull-down transistor, the third gate structure overlaps the first active structure to form a second pull-down transistor, and the fourth gate structure overlaps the first active structure to form a second access transistor. The second gate structure overlapping the second active structure to form a first pull-up transistor, the third gate structure overlapping the second active structure to form a second pull-up transistor.

A method includes specifying a target memory macro, and determining failure rates of function-blocks in the target memory macro based on an amount of transistors and area distributions in a collection of base cells. The method also includes determining a safety level of the target memory macro, based upon a failure-mode analysis of the target memory macro, from a memory compiler, based on the determined failure rate.

A memory system includes: a plurality of nonvolatile memories; a controller connected to the plurality of nonvolatile memories via a plurality of channels that includes a plurality of memory physical layer circuits arranged corresponding to the plurality of channels, respectively, one or more pads for calibration corresponding to the plurality of memory physical layer circuits, and a processor that controls the plurality of memory physical layer circuits. A single reference resistor is connected to the plurality of memory physical layer circuits via the pad. An output based on a ZQ calibration of the plurality of memory physical layer circuits is wired-OR connected to the single reference resistor via the one or more pads. The processor performs a calibration for each of the plurality of memory physical layer circuits in a time division manner using the single reference resistor.

A fractured semiconductor die is disclosed, together with a semiconductor device including the fractured semiconductor die. During fabrication of the semiconductor dies in a wafer, the wafer may be scored in a series of parallel scribe lines through portions of each row of semiconductor dies. The scribe lines then propagate through the full thickness of the wafer to fracture off a portion of each of the semiconductor dies. It may happen that electrical traces such as bit lines in the memory cell arrays short together during the die fracture process. These electrical shorts may be cleared by running a current through each of the electrical traces.

A method of testing a non-volatile memory (NVM) array includes heating the NVM array to a target temperature. While the NVM array is heated to the target temperature, a current distribution is obtained by measuring a plurality of currents of a subset of NVM cells of the NVM array, each NVM cell of the NVM array is programmed to one of a logically high state or a logically low state, and first and second pass/fail (P/F) tests on each NVM cell of the NVM array are performed. A bit error rate is calculated based on the current distribution and the first and second P/F tests.