A computer-implemented method for writing to a printed memory device is disclosed. The computer-implemented method includes determining, by a microcontroller, a first encoding scheme from among a plurality of encoding schemes to write a first data portion from among a plurality of data portions, wherein the first encoding scheme comprises a first voltage and a first pulse width to be used to write the first data portion; providing, by the microcontroller, the first encoding scheme to an application-specific integrated circuit (ASIC); selecting, by the ASIC, a first target memory cell of the printed memory device corresponding to a first word line and a first bit line for the first data portion to be written; and writing, by the ASIC, the first data portion to the first target memory cell using the first encoding scheme.

Some embodiments include an assembly having a stack of first and second alternating levels. The first levels are insulative levels. The second levels are device levels having integrated devices. Each of the integrated devices has a transistor coupled with an associated capacitor, and the capacitor is horizontally offset from the transistor. The transistors have semiconductor channel material, and have transistor gates along the semiconductor channel material. Each of the transistors has a first source/drain region along one side of the semiconductor channel material and coupled with the associated capacitor, and has a second source/drain region. Wordlines extend horizontally along the device levels and are coupled with the transistor gates. Digit lines extend vertically through the device levels and are coupled with the second source/drain regions. Some embodiments include methods of forming integrated structures.

Some embodiments include an assembly having a stack of first and second alternating levels. The first levels are insulative levels. The second levels are device levels having integrated devices. Each of the integrated devices has a transistor coupled with an associated capacitor, and the capacitor is horizontally offset from the transistor. The transistors have semiconductor channel material, and have transistor gates along the semiconductor channel material. Each of the transistors has a first source/drain region along one side of the semiconductor channel material and coupled with the associated capacitor, and has a second source/drain region. Wordlines extend horizontally along the device levels and are coupled with the transistor gates. Digit lines extend vertically through the device levels and are coupled with the second source/drain regions. Some embodiments include methods of forming integrated structures.

According to one embodiment, a memory system includes memory cells capable of having data written therein at different write levels. A memory controller is configured to detect first data of the memory cells, then apply a first voltage that is lower than a voltage used for writing the data to the plurality of memory cells, detect second data of the memory cells after the first voltage has been applied, and estimate a write level for the data written to the memory cells based on a comparison of the first data and the second data.

A three dimensional memory includes a substrate, a plurality of source lines, a plurality of isolation structures, a plurality of drain lines, a plurality of bit lines, a plurality of charge storage structures, and a plurality of conductive layers. The source lines are located on the substrate. The isolation structures are respectively located between the source lines, so as to electrically isolate the source lines from each other. The drain lines are located on the source lines. Extending directions of the source lines and the drain lines are different. The bit lines extend from the source lines to the drain lines. The charge storage structures respectively surround the bit lines. The conductive layers respectively cover surfaces of the charge storage structures arranged along each of the source lines.

A semiconductor storage device includes a stack, a channel layer, a first charge storage portion, and a second charge storage portion. The stack includes a plurality of conductive layers and a plurality of insulating layers, and the plurality of conductive layers and the plurality of insulating layers are alternately stacked one by one in a first direction. The channel layer extends in the first direction in the stack. The first charge storage portion is provided between the channel layer and each of the plurality of conductive layers in a second direction intersecting with the first direction. The second charge storage portion includes a portion interposed between two adjacent conductive layers in the plurality of conductive layers in the first direction.

According to one embodiment, a memory system includes memory cells capable of having data written therein at different write levels. A memory controller is configured to detect first data of the memory cells, then apply a first voltage that is lower than a voltage used for writing the data to the plurality of memory cells, detect second data of the memory cells after the first voltage has been applied, and estimate a write level for the data written to the memory cells based on a comparison of the first data and the second data.

Some embodiments include an assembly having a stack of first and second alternating levels. The first levels are insulative levels. The second levels are device levels having integrated devices. Each of the integrated devices has a transistor coupled with an associated capacitor, and the capacitor is horizontally offset from the transistor. The transistors have semiconductor channel material, and have transistor gates along the semiconductor channel material. Each of the transistors has a first source/drain region along one side of the semiconductor channel material and coupled with the associated capacitor, and has a second source/drain region. Wordlines extend horizontally along the device levels and are coupled with the transistor gates. Digit lines extend vertically through the device levels and are coupled with the second source/drain regions. Some embodiments include methods of forming integrated structures.

Provided is a three dimensional memory including a substrate, a plurality of source lines, a plurality of isolation structures, a plurality of drain lines, a plurality of bit lines, a plurality of charge storage structures, and a plurality of conductive layers. The source lines are located on the substrate. The isolation structures are respectively located between the source lines, so as to electrically isolate the source lines from each other. The drain lines are located on the source lines. Extending directions of the source lines and the drain lines are different. The bit lines extend from the source lines to the drain lines. The charge storage structures respectively surround the bit lines. The conductive layer respectively cover surfaces of the charge storage structures arranged along each of the source lines.

An apparatus and/or system is described including a memory device or a controller to perform programming and verification operations including application of a shared voltage level to verify two program voltage levels of a multi-level cell device. For example, in embodiments, the control circuitry performs a program operation to program a memory cell and performs a verification operation by applying a single or shared verify voltage level to verify that the memory cell is programmed to a corresponding program voltage level. In embodiments, the program voltage level is one of two consecutive program voltage levels of a plurality of program voltage levels to be verified by application of the shared verify voltage. Other embodiments are disclosed and claimed.