To control initialization of a nonvolatile memory device, before assembling a memory system including a first nonvolatile memory device and a second nonvolatile memory device, information data for initialization of the first nonvolatile memory device are stored in the first nonvolatile memory device. After assembling the memory system, the information data are moved from the first nonvolatile memory device to the second nonvolatile memory device. The first nonvolatile memory device is initialized based on the information data stored in the second nonvolatile memory device. An initialization time of the first nonvolatile memory device is reduced efficiently by moving the information data from the first nonvolatile memory device to the second nonvolatile memory device having the rapid speed of the reading operation and using the information data read from the second nonvolatile memory device.

An electronic storage memory device is disclosed. The memory device includes a first conductive layer, and also includes a memory layer connected to the first conductive layer, where the memory layer has a variable resistance, and where no amorphous layer exists between the first conductive layer and the memory layer.

A RRAM array and its manufacturing method are provided. The RRAM array includes a substrate having an array region which has a first region and a second region. The RRAM array includes a bottom electrode layer on the substrate, an oxygen ion reservoir layer on the bottom electrode layer, a diffusion barrier layer on the oxygen ion reservoir layer, a resistance switching layer on the diffusion barrier layer, and a top electrode layer on the resistance switching layer. The diffusion barrier layer in the first region is different from the diffusion barrier layer in the second region.

A nonvolatile memory cell resistance change type nonvolatile memory cell configured to store information by changing an electrical resistance according to application of electrical stress is provided and a nonvolatile memory device including the nonvolatile memory cell is provided. The resistance change type nonvolatile memory cell includes a resistance change material layer including a resistance change material; a ferroelectric layer on a first side of the resistance change material layer, the ferroelectric layer configured to change an electrical resistance of the resistance change material layer according to a polarization direction and polarization size of a ferroelectric therein; a first electrode on the ferroelectric layer and configured to control the polarization direction and the polarization size of the ferroelectric based on an applied voltage; and a second electrode and a third electrode on the resistance change material layer with the first electrode therebetween.

A nonvolatile memory cell resistance change type nonvolatile memory cell configured to store information by changing an electrical resistance according to application of electrical stress is provided and a nonvolatile memory device including the nonvolatile memory cell is provided. The resistance change type nonvolatile memory cell includes a resistance change material layer including a resistance change material; a ferroelectric layer on a first side of the resistance change material layer, the ferroelectric layer configured to change an electrical resistance of the resistance change material layer according to a polarization direction and polarization size of a ferroelectric therein; a first electrode on the ferroelectric layer and configured to control the polarization direction and the polarization size of the ferroelectric based on an applied voltage; and a second electrode and a third electrode on the resistance change material layer with the first electrode therebetween.

A RRAM array and its manufacturing method are provided. The RRAM array includes a substrate having an array region which has a first region and a second region. The RRAM array includes a bottom electrode layer on the substrate, an oxygen ion reservoir layer on the bottom electrode layer, a diffusion barrier layer on the oxygen ion reservoir layer, a resistance switching layer on the diffusion barrier layer, and a top electrode layer on the resistance switching layer. The diffusion barrier layer in the first region is different from the diffusion barrier layer in the second region.

To control initialization of a nonvolatile memory device, before assembling a memory system including a first nonvolatile memory device and a second nonvolatile memory device, information data for initialization of the first nonvolatile memory device are stored in the first nonvolatile memory device. After assembling the memory system, the information data are moved from the first nonvolatile memory device to the second nonvolatile memory device. The first nonvolatile memory device is initialized based on the information data stored in the second nonvolatile memory device. An initialization time of the first nonvolatile memory device is reduced efficiently by moving the information data from the first nonvolatile memory device to the second nonvolatile memory device having the rapid speed of the reading operation and using the information data read from the second nonvolatile memory device.

Memory systems and memory programming methods are described. According to one aspect, a memory system includes program circuitry configured to provide a program signal to a memory cell to program the memory cell from a first memory state to a second memory state, detection circuitry configured to detect the memory cell changing from the first memory state to the second memory state during the provision of the program signal to the memory cell to program the memory cell, and wherein the program circuitry is configured to alter the program signal as a result of the detection and to provide the altered program signal to the memory cell to continue to program the memory cell from the first memory state to the second memory state.

Solid-state memory having a non-linear current-voltage (I-V) response is provided. By way of example, the solid-state memory can be a selector device. The selector device can be formed in series with a non-volatile memory device via a monolithic fabrication process. Further, the selector device can provide a substantially non-linear I-V response suitable to mitigate leakage current for the non-volatile memory device. In various disclosed embodiments, the series combination of the selector device and the non-volatile memory device can serve as one of a set of memory cells in a 1-transistor, many-resistor resistive memory cell array.

A memory device is disclosed. The memory device includes a bottom contact and a memory layer connected to the bottom contact. The memory layer has a variable resistance. The memory device also includes a top electrode on the memory layer, where the top electrode and the memory layer cooperatively form a heterojunction memory structure. The memory device also includes a top contact on the top electrode; and a barrier layer, configured to substantially prevent conduction of ions or vacancies therethrough, wherein the barrier layer has a resistivity less than 1E-4 Ohm-m, where the barrier layer is between one of: A) the top electrode and the top contact, and B) the memory layer and the bottom contact.