According to one embodiment, there is provided a nonvolatile semiconductor memory device including a cell array. The cell array includes an array of a plurality of string blocks. Among the plurality of local string blocks, one local string block includes a block selection transistor and remaining local string blocks do not include a block selection transistor. A gate terminal of the block selection transistor of the one local string block is connected to a block selection line. Signals of two word lines connected to two adjacent string blocks in the bit line direction are common signals. Signals of two block selection lines connected to the two adjacent string blocks are independent of each other.

A memory cell includes a first resistive memory element, a second resistive memory element electrically coupled with the first resistive memory element at a common node, and a switching element comprising an input terminal electrically coupled with the common node, the switching element comprising a driver configured to float during one or more operations.

A memory device includes a first cell block on a substrate at a first level, and a second cell block on the substrate at a second level different from the first level. Each of the first and second cell blocks includes a word line extending in a first direction that is parallel to a top surface of the substrate, a word line contact connected to a center point of the word line, a bit line extending in a second direction that is parallel to the top surface of the substrate and intersects the first direction, a bit line contact connected to a center point of the bit line, and a memory cell between the word and bit lines. The second cell block is offset from the first cell block in at least one of the first and second directions.

Provide a resistive random-access memory device having an optimized 3D construction. A resistive random-access memory includes a plurality of pillars, a plurality of bit lines, and a memory cell. The pillars extend vertically along the main surface of the substrate. The bit lines extend in a horizontal direction. The memory cell is formed at the intersection of the pillars and the bit lines. The memory cell includes a gate insulating film, a semiconductor film, and a resistive element. The gate insulating film is formed on the circumference of the pillar. The semiconductor film is formed on the circumference of gate insulating film and provides a channel area. The resistive element is formed on the circumference of the semiconductor film. A first electrode area on the circumference of the resistive element and a second electrode area facing the first electrode area are electrically connected to a pair of adjacent bit lines.

A semiconductor device includes a substrate and a gate structure disposed over the substrate. The gate structure includes at least one gate electrode layer and at least one interlayer insulating layer that are alternately stacked over the substrate. The semiconductor device includes a hole pattern penetrating the gate structure over the substrate, and a gate insulating layer, a channel layer, a resistor layer, and a resistance changing layer sequentially disposed on a sidewall surface of the gate structure within the hole pattern. Each of the resistor layer and the resistance changing layer is disposed opposite to the gate insulating layer, based on the channel layer.

Methods, systems, and devices for a capacitive pillar architecture for a memory array are described. An access line within a memory array may be, include, or be coupled with a pillar. The pillar may include an exterior electrode, such as a hollow exterior electrode, surrounding an inner dielectric material that may further surround an interior, core electrode. The interior electrode may be maintained at a voltage level during at least a portion of an access operation for a memory cell coupled with the pillar. Such a pillar structure may increase a capacitance of the pillar, for example, based on a capacitive coupling between the interior and exterior electrodes. The increased capacitance may provide benefits associated with operating the memory array, such as increased memory cell programming speed, programming reliability, and read disturb immunity.

A memory cell includes a first resistive memory element, a second resistive memory element electrically coupled with the first resistive memory element at a common node, and a switching element comprising an input terminal electrically coupled with the common node, the switching element comprising a driver configured to float during one or more operations.

A semiconductor memory device and methods of manufacturing and operating the same are set forth. The semiconductor memory device includes a stack structure including a plurality of interlayer insulating layers and a plurality of gate electrodes, which may be alternately stacked on a substrate, and a plurality of channel structures penetrating the stack structure in a vertical direction. Each of the plurality of channel structures includes a channel layer, a tunnel insulating layer, an emission preventing layer, and a charge storage layer, each of which vertically extends toward the substrate.

According to one embodiment, a memory device includes: a plurality of memory cells stacked in a first direction orthogonal to a substrate and each including a memory element having at least three resistance states and a selector coupled in parallel to the memory element; a bit line electrically coupled to the memory cells and extending in a second direction intersecting the first direction; and a sense amplifier configured to compare a voltage of the bit line with a plurality of reference voltages and sense data stored in the memory cells.

One embodiment includes: a substrate; a memory cell array that extends in a direction vertical to the substrate and includes a memory string having a plurality of series-coupled memory cells, and a selection transistor coupled to one end of the memory string; a wiring portion that includes a plurality of first conducting layers and a plurality of interlayer insulating films, the first conducting layers functioning as gate electrodes of the memory cell and the selection transistor, the interlayer insulating film being positioned between the first conducting layers in above and below directions; and a second conducting layer arranged on end portions of the plurality of first conducting layers of the selection transistor. The first conducting layers are electrically coupled in common to the second conducting layer.